Publications - Articles - ARCNL

D.J. Hemminga, O.O. Versolato and J. Sheil, Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μm range for their characterization as future extreme ultraviolet light sources, Phys. Plasmas 30, (3), 033301: 1-9 (2023)
ZP. Lyu, K. Abrashitova, J.F. de Boer, E.R. Andresen, R. Hervé and L.V. Amitonova, Sub-diffraction computational imaging via a flexible multicore-multimode fiber, Opt. Express 31, (7), 11249-11260 (2023)
M.J. Mekkering, J. Biemolt, de Graaf, Y.A. Lin, N.P. van Leest, A. Troglia, R. Bliem, B. de Bruin, G. Rothenberg and N. Yan, Dry reforming of methane over single-atom Rh/Al2O3 catalysts prepared by exsolution, Catal. Sci. Technol. 13, (7), 2255-2260 (2023)
C. Xiao, L. Peng, C. Leriche, F.-C. Hsia, B. Weber and S.E. Franklin, Capillary adhesion governs the friction behavior of electrochemically corroded polycrystalline diamond, Carbon 205, 345-352 (2023)
J. Du, S.E. Franklin and B. Weber, A force controlled tribometer for pre-sliding measurements at the nanometer scale, Front. Mech. Eng. 9, 1019979: 1-7 (2023)
S. Rai, K. Bijlsma, L. Poirier, E. de Wit, L. Assink, A.C. Lassise, I. Rabadán, L. Méndez, J. Sheil, O.O. Versolato and R. Hoekstra, Evidence of production of keV Sn⁺ ions in the H₂ buffer gas surrounding an Sn-plasma EUV source, Plasma Sources Sci. Technol. 32, (3), 035006: 1-9 (2023)
C.-C. Hsu, L. Peng, F.-C. Hsia, B. Weber, D. Bonn and A.M. Brouwer, Molecular Probing of the Stress Activation Volume in Vapor Phase Lubricated Friction, ACS Appl. Mater. Interfaces 15, (9), 12603-12608 (2023)
M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Loetgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte, High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams, Optica 10, (2), 255-263 (2023)
T.-D. Terwisscha-Dekker, T. Hogenelst, R. Bliem, B. Weber and D. Bonn, Why Teflon is so slippery while other polymers are not, Phys. Rev. E 107, (2), 024801: 1-6 (2023)
G.Z. Li, C. Xiao, S. Zhang, S. Luo, Y. Chen and Y. Wu, Study of the humidity-controlled CeO2 fixed-abrasive chemical mechanical polishing of a single crystal silicon wafer, Tribol.Int. 178, 108087: 1-13 (2023)

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