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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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M. Adhikary, T. van Gardingen-Cromwijk, de Wit, S. Witte, J.F. de Boer and A.J. den Boef,
Illumination spot profile correction in digital holographic microscopy for overlay metrology
, J. Micro/Nanopattern. Mats. Metro
22
, (2), 024001: 1-14 (2023)
T.J. van den Hooven and P.C.M. Planken,
Surface-plasmon-enhanced strain-wave-induced optical diffraction changes from a segmented grating
, Photoacoustics
31
, 100497: 1-13 (2023)
B. Lochocki, A. Ivanina, A. Bandhoe, J.F. de Boer and L.V. Amitonova,
Swept-source multimode fiber imaging
, Sci. Rep
13
, (1), 8071: 1-9 (2023)
J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte,
Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics
, Appl. Phys. B- Lasers O
129
, 91: 1-11 (2023)
Y. Huo, M.K. Espinoza Cangahuala, V. Zamudio-Bayer, M. Goulart, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter,
An X-ray spectroscopy study of structural stability of superhydrogenated pyrene derivatives
, MNRAS
523
, (1), 865-875 (2023)
L. Loetgering, M. Du, D.E. Boonzajer Flaes, T. Aidukas, F. Wechsler, D. Penagos Molina, M. Rose, A. Pelekanidis, W. Eschen, J. Hess, T. Wilhein, R. Heintzmann, J. Rothhardt and S. Witte,
PtyLab.m/py/jl: a cross-platform, open-source inverse modeling toolbox for conventional and Fourier ptychography
, Opt. Express
31
, (9), 13763-13797 (2023)
D.J. Hemminga, O.O. Versolato and J. Sheil,
Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μm range for their characterization as future extreme ultraviolet light sources
, Phys. Plasmas
30
, (3), 033301: 1-9 (2023)
Z. Lyu, K. Abrashitova, J.F. de Boer, E.R. Andresen, R. Hervé and L.V. Amitonova,
Sub-diffraction computational imaging via a flexible multicore-multimode fiber
, Opt. Express
31
, (7), 11249-11260 (2023)
M.J. Mekkering, J. Biemolt, de Graaf, Y.A. Lin, N.P. van Leest, A. Troglia, R. Bliem, B. de Bruin, G. Rothenberg and N. Yan,
Dry reforming of methane over single-atom Rh/Al2O3 catalysts prepared by exsolution
, Catal. Sci. Technol.
13
, (7), 2255-2260 (2023)
C. Xiao, L. Peng, C. Leriche, F.-C. Hsia, B. Weber and S.E. Franklin,
Capillary adhesion governs the friction behavior of electrochemically corroded polycrystalline diamond
, Carbon
205
, 345-352 (2023)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter