Publications - Articles - ARCNL

Y.H. Liu, H. Zhang, Y. Luo, L. Wang and C. Xiao, Probing the low friction mechanism of hydrogen-free DLC film in oxygen and nitrogen environments by first-principles calculations and molecular dynamics simulation, Surf. Coat. Technol. 455, 129219: 1-11 (2023)
Y.M. Fan, E. Olsson, G.M. Liang, Z.J. Wang, A.M. D'Angelo, B. Johannessen, L. Thomsen, B. Cowie, L. Jingxi, F. Zhang, Y. Zhao, W.K. Pang, Q. Cai and Z. Guo, Stabilizing Cobalt‐free Li‐rich Layered Oxide Cathodes through Oxygen Lattice Regulation by Two‐phase Ru Doping, Angew. Chem. Int. Ed. 62, (5), e20221380: 1-9 (2023)
S. van Vliet, A. Troglia, E. Olsson and R. Bliem, Identifying silicides via plasmon loss satellites in photoemission of the Ru-Si system, Appl. Surf. Sci. 608, 155139: 1-6 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W.M.J. Coene, S. Witte, J.F. de Boer and A.J. den Boef, Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology, Opt. Express 31, (1), 411-425 (2023)
B. Weber, J. Scheibert, M.P. de Boer and A. Dhinojwala, Experimental insights into adhesion and friction between nominally dry rough surfaces, MRS Bulletin 47, (12), 1237-1246 (2022)
L. Peng, F.-C. Hsia, S. Woutersen, M. Bonn, B. Weber and D. Bonn, Nonmonotonic Friction due to Water Capillary Adhesion and Hydrogen Bonding at Multiasperity Interfaces, Phys. Rev. Lett. 129, (25), 256101: 1-6 (2022)
A.M. Brouwer, Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists, J. Photopolym. Sci. Technol. 35, (1), 81-86 (2022)
Q. Evrard, N. Sadegh, Y. Ekinci, M. Vockenhuber, N. Mahne, A. Giglia, S. Nannarone, T. Goya, T. Sugioka and A.M. Brouwer, Influence of Counteranions on the Performance of Tin-based EUV Photoresists, J. Photopolym. Sci. Technol. 35, (1), 95-100 (2022)
Y. Huo, M.K. Espinoza Cangahuala, M. Goulart, V. Zamudio-Bayer, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter, Soft-x-ray spectroscopy of coronene+ and (coronene+H)+ cations: The influence of hydrogenation on electronic structure and photofragmentation, Phys. Rev. A 106, (6), 063104: 1-11 (2022)
A. Troglia, Victor Vollema, S. Cassanelli, E. van Heumen, J. van de Groep, A. de Visser and R. Bliem, Tuning material properties via disorder: From crystalline alloy to metallic glass, Mater. Today Phys. 29, 100893: 1-8 (2022)

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