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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Du, S.E. Franklin and B. Weber,
A force controlled tribometer for pre-sliding measurements at the nanometer scale
, Front. Mech. Eng.
9
, 1019979: 1-7 (2023)
S. Rai, K. Bijlsma, L. Poirier, E. de Wit, L. Assink, A.C. Lassise, I. Rabadán, L. Méndez, J. Sheil, O.O. Versolato and R. Hoekstra,
Evidence of production of keV Sn
+
ions in the H
2
buffer gas surrounding an Sn-plasma EUV source
, Plasma Sources Sci. Technol.
32
, (3), 035006: 1-9 (2023)
C.-C. Hsu, L. Peng, F.-C. Hsia, B. Weber, D. Bonn and A.M. Brouwer,
Molecular Probing of the Stress Activation Volume in Vapor Phase Lubricated Friction
, ACS Appl. Mater. Interfaces
15
, (9), 12603-12608 (2023)
M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Loetgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte,
High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams
, Optica
10
, (2), 255-263 (2023)
T.-D. Terwisscha-Dekker, T. Hogenelst, R. Bliem, B. Weber and D. Bonn,
Why Teflon is so slippery while other polymers are not
, Phys. Rev. E
107
, (2), 024801: 1-6 (2023)
G.Z. Li, C. Xiao, S. Zhang, S. Luo, Y. Chen and Y. Wu,
Study of the humidity-controlled CeO2 fixed-abrasive chemical mechanical polishing of a single crystal silicon wafer
, Tribol.Int.
178
, 108087: 1-13 (2023)
Y.H. Liu, H. Zhang, Y. Luo, L. Wang and C. Xiao,
Probing the low friction mechanism of hydrogen-free DLC film in oxygen and nitrogen environments by first-principles calculations and molecular dynamics simulation
, Surf. Coat. Technol.
455
, 129219: 1-11 (2023)
Y.M. Fan, E. Olsson, G.M. Liang, Z.J. Wang, A.M. D'Angelo, B. Johannessen, L. Thomsen, B. Cowie, L. Jingxi, F. Zhang, Y. Zhao, W.K. Pang, Q. Cai and Z. Guo,
Stabilizing Cobalt‐free Li‐rich Layered Oxide Cathodes through Oxygen Lattice Regulation by Two‐phase Ru Doping
, Angew. Chem. Int. Ed.
62
, (5), e20221380: 1-9 (2023)
S. van Vliet, A. Troglia, E. Olsson and R. Bliem,
Identifying silicides via plasmon loss satellites in photoemission of the Ru-Si system
, Appl. Surf. Sci.
608
, 155139: 1-6 (2023)
T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W. Coene, S. Witte, J.F. de Boer and A.J. den Boef,
Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology
, Opt. Express
31
, (1), 411-425 (2023)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
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ARCNL Newsletter