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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • Articles
  • Bachelor Thesis
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  • Theses
  • P. van Essen, Z. Nie, B. de Keijzer and P.M. Kraus, Toward Complete All-Optical Intensity Modulation of High-Harmonic Generation from Solids, ACS Photonics 11, (5), 1832-1843 (2024)

  • L. Cruciani, M. Vreugdenhil, S. van Vliet, E. Abram, D. van Oosten, R. Bliem, K. van Druten and P.C.M. Planken, Direct laser patterning of ruthenium below the optical diffraction limit, Appl. Phys. Lett. 124, (17), 171902 : 1-7 (2024)

  • S.R. Totorica, K. Lezhnin, D.J. Hemminga, J. Gonzales Muñoz, J. Sheil, A. Diallo, A. Hyder and W. Fox, Acceleration mechanisms of energetic ion debris in laser-driven tin plasma EUV sources, Appl. Phys. Lett. 124, (17), 174101: 1-8 (2024)

  • M. Lipp, W. Li, K. Abrashitova, P. Forré and L.V. Amitonova, Lightweight super-resolution multimode fiber imaging with regularized linear regression, Opt. Express 32, (9), 15147-15155 (2024)

  • G. D’Auria, R. Hoekstra, T.G. Lucas and et. al, The CompactLight Design Study, Eur. Phys. J. Spec. Top. 233, 1-208 (2024)

  • C. Wang, P. Sombut, L. Puntscher, Z. Jakub, M. Meier, J. Pavelec, R. Bliem, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, CO‐Induced Dimer Decay Responsible for Gem‐Dicarbonyl Formation on a Model Single‐Atom Catalyst, Angew. Chem. Int. Ed. 63, (16), e202317347: 1-8 (2024)

  • L.V. Amitonova, Multimode fiber endoscopes for computational brain imaging, Neurophotonics 11, (S1), S11509: 1-7 (2024)

  • K. Mongey, S.J.J. de Lange, R. Brady, D.J. Hemminga, B. Delaney, M.M. Basko, E. Sokell, F. O'Reilly and J. Sheil, Characterization of experimental and simulated micrometer-scale soft x-ray-emitting laser plasmas: Toward predictive radiance calculations, Appl. Phys. Lett. 124, (10), 102104 : 1-7 (2024)

  • N. Sadegh, Q. Evrard, P.M. Kraus and A.M. Brouwer, XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist, J. Phys. Chem. C 128, (9), 3965-3974 (2024)

  • B. Demirkurt, D. Petrova, D.K. Sharma, M. Vacha, B. Weber, D. Bonn and A.M. Brouwer, Resolving Multi-Asperity Contacts at the Nanoscale through Super-Resolution Fluorescence Imaging, J. Phys. Chem. Lett. 15, (7), 1936-1942 (2024)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter