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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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L. Behnke, E.J. Salumbides, G. Göritz, Y. Mostafa, D.J. Engels, W.M.G. Ubachs and O.O. Versolato,
High-energy parametric oscillator and amplifier pulsed light source at 2-μm
, Opt. Express
31
, (15), 24142-24156 (2023)
J. Guo, Y. Liu, L. Duan, F. Zhang and C. Xiao,
Towards a deeper understanding of temperature-dependent material removal of single-crystal AlN: An atomistic study
, Tribol.Int.
185
, 108575: 1-10 (2023)
B. Liu, R.A. Meijer, W. Li, J. Hernandez-Rueda, H. Gelderblom and O.O. Versolato,
Mass partitioning in fragmenting tin sheets
, Phys. Rev. Appl.
20
, (1), 014048: 1-18 (2023)
C. Xiao, S. van Vliet, R. Bliem, B. Weber and S.E. Franklin,
Electrochemically-stimulated nanoscale mechanochemical wear of silicon
, Friction
11
, (2023)
W. Li, K. Abrashitova and L.V. Amitonova,
Super-resolution multimode fiber imaging with an untrained neural network
, Opt. Lett.
48
, (13), 3363-3366 (2023)
N. Sadegh, Q. Evrard, N. Mahne, A. Giglia, S. Nannarone and A.M. Brouwer,
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists
, J. Photopolym. Sci. Technol.
36
, (5), 373-378 (2023)
F. Cassin, R. Hahury, T. Lançon, S.E. Franklin and B. Weber,
The nucleation, growth, and adhesion of water bridges in sliding nano-contacts
, J. Chem. Phys.
158
, (22), 224703: 1-8 (2023)
P.C.M. Laan, F.J. de Zwart, E.M. Wilson, A. Troglia, O.C.M. Lugier, J.G. Norbert, R. Bliem, J.N.H. Reek, B. de Bruin, G. Rothenberg and N. Yan,
Understanding the Oxidative Properties of Nickel Oxyhydroxide in Alcohol Oxidation Reactions
, ACS Catal.
13
, (13), 8467-8476 (2023)
M. Adhikary, T. van Gardingen-Cromwijk, de Wit, S. Witte, J.F. de Boer and A.J. den Boef,
Illumination spot profile correction in digital holographic microscopy for overlay metrology
, J. Micro/Nanopattern. Mats. Metro
22
, (2), 024001: 1-14 (2023)
T.J. van den Hooven and P.C.M. Planken,
Surface-plasmon-enhanced strain-wave-induced optical diffraction changes from a segmented grating
, Photoacoustics
31
, 100497: 1-13 (2023)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
More
More
People
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Events
Repository
Contact & Directions
ARCNL Newsletter