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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • K. Mongey, S.J.J. de Lange, R. Brady, D.J. Hemminga, B. Delaney, M.M. Basko, E. Sokell, F. O'Reilly and J. Sheil, Characterization of experimental and simulated micrometer-scale soft x-ray-emitting laser plasmas: Toward predictive radiance calculations, Appl. Phys. Lett. 124, (10), 102104 : 1-7 (2024)

  • N. Sadegh, Q. Evrard, P.M. Kraus and A.M. Brouwer, XUV Absorption Spectroscopy and Photoconversion of a Tin-Oxo Cage Photoresist, J. Phys. Chem. C 128, (9), 3965-3974 (2024)

  • B. Demirkurt, D. Petrova, D.K. Sharma, M. Vacha, B. Weber, D. Bonn and A.M. Brouwer, Resolving Multi-Asperity Contacts at the Nanoscale through Super-Resolution Fluorescence Imaging, J. Phys. Chem. Lett. 15, (7), 1936-1942 (2024)

  • K. Bijlsma, L. Oltra, E. de Wit, L. Assink, I. Rabadán, L. Méndez and R. Hoekstra, Electron Capture from Molecular Hydrogen by Metastable Sn2+* Ions, Atoms 12, (2), 9: 1-12 (2024)

  • E. Abram, I. Milov, N. Orlov, K. van Druten, E.C. Garnett and P.C.M. Planken, Pre-ablation regime light-induced optical changes in nanometer thick metal films, Opt. Express 32, (3), 4564-4587 (2024)

  • J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, I. Bespalov, R. Lindblad, M. Timm, C. Bülow, V. Zamudio-Bayer, J.T. Lau, B. von Issendorff, R. Hoekstra, K. Witte, B. Watts, T. Schlathölter and A.M. Brouwer, Soft X-ray absorption and fragmentation of tin-oxo cage photoresists, Phys. Chem. Chem. Phys. 26, (7), 5986-5998 (2024)

  • Y.M. Fan, E. Olsson, B. Johannessen, A.M. D'Angelo, L. Thomsen, B. Cowie, L. Smillie, G.M. Liang, Y. Lei, Y. Zhao, W.K. Pang, Q. Cai and Z. Guo, Manipulation of Transition Metal Migration via Cr-Doping for Better-Performance Li-Rich, Co-Free Cathodes, ACS Energy Lett. 9, (2), 487-496 (2024)

  • J. Cottom, L. Hückmann, E. Olsson and J. Meyer, From Jekyll to Hyde and Beyond: Hydrogen’s Multifaceted Role in Passivation, H-Induced Breakdown, and Charging of Amorphous Silicon Nitride, J. Phys. Chem. Lett. 15, (3), 840-848 (2024)

  • P. Juergens, S.D.C. Roscam Abbing, M. Mero, C.L. Garcia, G.G. Brown, M.J.J. Vrakking, A. Mermillod-Blondin, P.M. Kraus and A. Husakou, Linking High-Harmonic Generation and Strong-Field Ionization in Bulk Crystals, ACS Photonics 11, (1), 247-256 (2024)

  • T. van Gardingen-Cromwijk, S. Konijnenberg, W. Coene, M. Adhikary, T. Tukker, S. Witte, J.F. de Boer and A.J. den Boef, Non-isoplanatic lens aberration correction in dark-field digital holographic microscopy for semiconductor metrology, Light adv. manuf. 4, (4), 453-465 (2023)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter