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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • Bachelor Thesis
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  • L. Loetgering, M. Du, D.E. Boonzajer Flaes, T. Aidukas, F. Wechsler, D. Penagos Molina, M. Rose, A. Pelekanidis, W. Eschen, J. Hess, T. Wilhein, R. Heintzmann, J. Rothhardt and S. Witte, PtyLab.m/py/jl: a cross-platform, open-source inverse modeling toolbox for conventional and Fourier ptychography, Opt. Express 31, (9), 13763-13797 (2023)

  • D.J. Hemminga, O.O. Versolato and J. Sheil, Simulations of plasmas driven by laser wavelengths in the 1.064—10.6 μm range for their characterization as future extreme ultraviolet light sources, Phys. Plasmas 30, (3), 033301: 1-9 (2023)

  • Z. Lyu, K. Abrashitova, J.F. de Boer, E.R. Andresen, R. Hervé and L.V. Amitonova, Sub-diffraction computational imaging via a flexible multicore-multimode fiber, Opt. Express 31, (7), 11249-11260 (2023)

  • M.J. Mekkering, J. Biemolt, de Graaf, Y.A. Lin, N.P. van Leest, A. Troglia, R. Bliem, B. de Bruin, G. Rothenberg and N. Yan, Dry reforming of methane over single-atom Rh/Al2O3 catalysts prepared by exsolution, Catal. Sci. Technol. 13, (7), 2255-2260 (2023)

  • C. Xiao, L. Peng, C. Leriche, F.-C. Hsia, B. Weber and S.E. Franklin, Capillary adhesion governs the friction behavior of electrochemically corroded polycrystalline diamond, Carbon 205, 345-352 (2023)

  • J. Du, S.E. Franklin and B. Weber, A force controlled tribometer for pre-sliding measurements at the nanometer scale, Front. Mech. Eng. 9, 1019979: 1-7 (2023)

  • S. Rai, K. Bijlsma, L. Poirier, E. de Wit, L. Assink, A.C. Lassise, I. Rabadán, L. Méndez, J. Sheil, O.O. Versolato and R. Hoekstra, Evidence of production of keV Sn+ ions in the H2 buffer gas surrounding an Sn-plasma EUV source, Plasma Sources Sci. Technol. 32, (3), 035006: 1-9 (2023)

  • C.-C. Hsu, L. Peng, F.-C. Hsia, B. Weber, D. Bonn and A.M. Brouwer, Molecular Probing of the Stress Activation Volume in Vapor Phase Lubricated Friction, ACS Appl. Mater. Interfaces 15, (9), 12603-12608 (2023)

  • M. Du, X. Liu, A. Pelekanidis, F. Fengling, L. Loetgering, P. Konold, C.L. Porter, P. Smorenburg, K.S.E. Eikema and S. Witte, High-resolution wavefront sensing and aberration analysis of multi-spectral extreme ultraviolet beams, Optica 10, (2), 255-263 (2023)

  • T.-D. Terwisscha-Dekker, T. Hogenelst, R. Bliem, B. Weber and D. Bonn, Why Teflon is so slippery while other polymers are not, Phys. Rev. E 107, (2), 024801: 1-6 (2023)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter