Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications - Articles

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • G.Z. Li, C. Xiao, S. Zhang, S. Luo, Y. Chen and Y. Wu, Study of the humidity-controlled CeO2 fixed-abrasive chemical mechanical polishing of a single crystal silicon wafer, Tribol.Int. 178, 108087: 1-13 (2023)

  • Y.H. Liu, H. Zhang, Y. Luo, L. Wang and C. Xiao, Probing the low friction mechanism of hydrogen-free DLC film in oxygen and nitrogen environments by first-principles calculations and molecular dynamics simulation, Surf. Coat. Technol. 455, 129219: 1-11 (2023)

  • Y.M. Fan, E. Olsson, G.M. Liang, Z.J. Wang, A.M. D'Angelo, B. Johannessen, L. Thomsen, B. Cowie, L. Jingxi, F. Zhang, Y. Zhao, W.K. Pang, Q. Cai and Z. Guo, Stabilizing Cobalt‐free Li‐rich Layered Oxide Cathodes through Oxygen Lattice Regulation by Two‐phase Ru Doping, Angew. Chem. Int. Ed. 62, (5), e20221380: 1-9 (2023)

  • S. van Vliet, A. Troglia, E. Olsson and R. Bliem, Identifying silicides via plasmon loss satellites in photoemission of the Ru-Si system, Appl. Surf. Sci. 608, 155139: 1-6 (2023)

  • T. van Gardingen-Cromwijk, M. Adhikary, C. Messinis, S. Konijnenberg, W. Coene, S. Witte, J.F. de Boer and A.J. den Boef, Field-position dependent apodization in dark-field digital holographic microscopy for semiconductor metrology, Opt. Express 31, (1), 411-425 (2023)

  • B. Weber, J. Scheibert, M.P. de Boer and A. Dhinojwala, Experimental insights into adhesion and friction between nominally dry rough surfaces, MRS Bulletin 47, (12), 1237-1246 (2022)

  • L. Peng, F.-C. Hsia, S. Woutersen, M. Bonn, B. Weber and D. Bonn, Nonmonotonic Friction due to Water Capillary Adhesion and Hydrogen Bonding at Multiasperity Interfaces, Phys. Rev. Lett. 129, (25), 256101: 1-6 (2022)

  • A.M. Brouwer, Chemical Mechanisms of Metal-Based Extreme Ultraviolet Resists, J. Photopolym. Sci. Technol. 35, (1), 81-86 (2022)

  • Q. Evrard, N. Sadegh, Y. Ekinci, M. Vockenhuber, N. Mahne, A. Giglia, S. Nannarone, T. Goya, T. Sugioka and A.M. Brouwer, Influence of Counteranions on the Performance of Tin-based EUV Photoresists, J. Photopolym. Sci. Technol. 35, (1), 95-100 (2022)

  • Y. Huo, M.K. Espinoza Cangahuala, M. Goulart, V. Zamudio-Bayer, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter, Soft-x-ray spectroscopy of coronene+ and (coronene+H)+ cations: The influence of hydrogenation on electronic structure and photofragmentation, Phys. Rev. A 106, (6), 063104: 1-11 (2022)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 10
  • 11
  • 12
  • 13
  • 14
  • …
  • 31
  • 32
  • 33
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter