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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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S. Rai, K. Bijlsma, I. Rabadán, L. Méndez, P.A.J. Wolff, M. Salverda, O.O. Versolato and R. Hoekstra,
Charge exchange in collisions of 1–100-keV Sn3+ ions with H2 and D2
, Phys. Rev. A
106
, (1), 012804: 1-10 (2022)
A. Goyal, M. van der Laan, A. Troglia, M. Lin, H. Agrawal, J. van de Groep, R. Bliem, J.M.J. Paulusse, P. Schall and K. Dohnalová,
Microscopic Proof of Photoluminescence from Mechanochemically Synthesized 1-Octene-Capped Quantum-Confined Silicon Nanoparticles: Implications for Light-Emission Applications
, ACS Omega
7
, (28), 24881-24887 (2022)
B. Lochocki, J.M. Hoozemans, J.F. de Boer and L.V. Amitonova,
Epi-fluorescence imaging of the human brain through a multimode fiber
, APL Photonics
7
, (7), 071301: 1-7 (2022)
L. Poirier, A.C. Lassise, Y. Mostafa, L. Behnke, N. Braaksma, L. Assink, R. Hoekstra and O.O. Versolato,
Energy- and charge-state-resolved spectrometry of tin laser-produced plasma using a retarding field energy analyzer
, Appl. Phys. B- Lasers O
128
, (7), 135: 1-7 (2022)
C. Leriche, S.E. Franklin and B. Weber,
Measuring multi-asperity wear with nanoscale precision
, Wear
498-499
, 204284: 1-5 (2022)
R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte,
Nanosecond laser ablation threshold of liquid tin microdroplets
, Appl. Phys. A
128
, (7), 570: 1-8 (2022)
S.D.C. Roscam Abbing, R. Kolkowski, Z.-Y. Zhang, F. Campi, L. Loetgering, A.F. Koenderink and P.M. Kraus,
Extreme-ultraviolet shaping and imaging by high-harmonic generation from nanostructured silica
, Phys. Rev. Lett.
128
, (22), 223902: 1-7 (2022)
Z. Lyu, G. Osnabrugge, P.W.H. Pinkse and L.V. Amitonova,
Focus quality in raster-scan imaging via a multimode fiber
, Appl. Opt.
61
, (15), 4363-4369 (2022)
C. Messinis, M. Adhikary, T. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef,
Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects
, Opt. Continuum
1
, (5), 1202-1217 (2022)
X. Yao, E. Olsson, M. Wang, J.A. Wang, Q. Cai, N.H. Peng, R. Webb and Y. Zhao,
Xenon Ion Implantation Induced Surface Compressive Stress for Preventing Dendrite Penetration in Solid‐State Electrolytes
, Small, 2108124: 1-9 (2022)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter