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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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F.-C. Hsia, C.-C. Hsu, L. Peng, F.M. Elam, C. Xiao, S.E. Franklin, D. Bonn and B. Weber,
Contribution of Capillary Adhesion to Friction at Macroscopic Solid–Solid Interfaces
, Phys. Rev. Appl.
17
, (3), 034034: 1-11 (2022)
J. Hernandez-Rueda, B. Liu, D.J. Hemminga, Y. Mostafa, R.A. Meijer, D. Kurilovich, M.M. Basko, H. Gelderblom, J. Sheil and O.O. Versolato,
Early-time hydrodynamic response of a tin droplet driven by laser-produced plasma
, Phys. Rev. Res.
4
, (1), 013142: 1-14 (2022)
N. Thakur, M. Vockenhuber, Y. Ekinci, B. Watts, A. Giglia, N. Mahne, S. Nannarone, S. Castellanos Ortega and A.M. Brouwer,
Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance
, ACS Mater. Au
2
, (3), 343-355 (2022)
T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor
, J. Micro/Nanopattern. Mats. Metro
21
, (1), 014001: 1-10 (2022)
L. Poirier, A. Bayerle, A.C. Lassise, F. Torretti, R. Schupp, L. Behnke, Y. Mostafa, W.M.G. Ubachs, O.O. Versolato and R. Hoekstra,
Cross-calibration of a combined electrostatic and time-of-flight analyzer for energy- and charge-state-resolved spectrometry of tin laser-produced plasma
, Appl. Phys. B- Lasers O
128
, (3), 39: 1-11 (2022)
G. de Haan, E. Abram, T.J. van den Hooven and P.C.M. Planken,
Plasmonic enhancement of photoacoustic strain-waves on gold gratings
, AIP Advances
12
, (2), 025227: 1-8 (2022)
C.D. Dieleman, J.S. van den Burgt, N. Thakur, E.C. Garnett and B. Ehrler,
Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography
, ACS Appl. Energy Mater.
5
, (2), 1672-1680 (2022)
van Eden, D. Verheijde and J. Verhoeven,
Secondary electron emission yield measurements of dielectrics based on a novel collector-only method
, Nucl. Instrum. Methods. Phys. Res., Sect B
511
, 6-11 (2022)
F.-C. Hsia, S.E. Franklin, P. Audebert, A.M. Brouwer, D. Bonn and B. Weber,
Rougher is more slippery: How adhesive friction decreases with increasing surface roughness due to the suppression of capillary adhesion
, Phys. Rev. Res.
3
, (4), 043204: 1-9 (2021)
Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W.M.G. Ubachs, R. Hoekstra, M. Bayraktar and O.O. Versolato,
The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range
, AIP Advances
11
, (12), 125003: 1-9 (2021)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
More
More
People
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Events
Repository
Contact & Directions
ARCNL Newsletter