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    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • R.A. Meijer, D. Kurilovich, B. Liu, Z. Mazzotta, J. Hernandez-Rueda, O.O. Versolato and S. Witte, Nanosecond laser ablation threshold of liquid tin microdroplets, Appl. Phys. A 128, (7), 570: 1-8 (2022)

  • S.D.C. Roscam Abbing, R. Kolkowski, Z.-Y. Zhang, F. Campi, L. Loetgering, A.F. Koenderink and P.M. Kraus, Extreme-ultraviolet shaping and imaging by high-harmonic generation from nanostructured silica, Phys. Rev. Lett. 128, (22), 223902: 1-7 (2022)

  • Z. Lyu, G. Osnabrugge, P.W.H. Pinkse and L.V. Amitonova, Focus quality in raster-scan imaging via a multimode fiber, Appl. Opt. 61, (15), 4363-4369 (2022)

  • C. Messinis, M. Adhikary, T.C. Cromwijk, T.T.M. van Schaijk, S. Witte, J.F. de Boer and A.J. den Boef, Pupil apodization in digital holographic microscopy for reduction of coherent imaging effects, Opt. Continuum 1, (5), 1202-1217 (2022)

  • X. Yao, E. Olsson, M. Wang, J.A. Wang, Q. Cai, N.H. Peng, R. Webb and Y. Zhao, Xenon Ion Implantation Induced Surface Compressive Stress for Preventing Dendrite Penetration in Solid‐State Electrolytes, Small, 2108124: 1-9 (2022)

  • A.C.C. de Beurs, L. Loetgering, M. Herczog, M. Du, K.S.E. Eikema and S. Witte, aPIE: an angle calibration algorithm for reflection ptychography, Opt. Lett. 47, (8), 1949-1952 (2022)

  • A. Troglia, S. van Vliet, G. Yetik, I.El. Wakil, J. Momand, B.J. Kooi and R. Bliem, Free-standing nanolayers based on Ru silicide formation on Si(100), Phys. Rev. Mater. 6, (4), 043402: 1-8 (2022)

  • M. Meier, J. Hulva, Z. Jakub, F. Kraushofer, M. Bobić, R. Bliem, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, CO oxidation by Pt-2/Fe3O4: Metastable dimer and support configurations facilitate lattice oxygen extraction, Sci. Adv. 8, (13), eabn4580: 1-8 (2022)

  • N. Tavakoli, R. Spalding, A. Lambertz, P. Koppejan, G. Gkantzounis, C. Wan, R. Röhrich, E. Kontoleta, A.F. Koenderink, R. Sapienza, M. Florescu and E. Alarcón-Lladó, Over 65% Sunlight Absorption in a 1 μm Si Slab with Hyperuniform Texture, ACS Photonics 9, (4), 1206-1217 (2022)

  • K. Abrashitova and L.V. Amitonova, High-speed label-free multimode-fiber-based compressive imaging beyond the diffraction limit, Opt. Express 30, (7), 10456-10469 (2022)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
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      • Repository
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      • ARCNL Newsletter