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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer,
UV and VUV-induced fragmentation of tin-oxo cage ions
, Phys. Chem. Chem. Phys.
23
, (37), 20909-20918 (2021)
R. Géneaux, I. Timrov, C.J. Kaplan, A.D. Ross, P.M. Kraus and S.R. Leone,
Coherent energy exchange between carriers and phonons in Peierls-distorted bismuth unveiled by broadband XUV pulses
, Phys. Rev. Res.
3
, (3), 033210: 1-12 (2021)
O.C.M. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega,
Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers
, ACS Appl. Mater. Interfaces
13
, (36), 43777-43786 (2021)
G. de Haan, V. Verrina, A.J.L. Adam, H. Zhang and P.C.M. Planken,
Plasmonic enhancement of photo-acoustic inducedreflection changes
, Appl. Opt.
60
, (24), 7304-7313 (2021)
R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte,
Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets
, Phys. Rev. Appl.
16
, (2), 024026: 1-11 (2021)
X.-Q. Zhou, M. Mytiliniou, J. Hilgendorf, Z. Ye, P. Panagiota, Y. Shao, M. Paradiz Dominguez, L. Zhang, M.B.S. Hesselberth, E. Bos, M.A. Siegler, F. Buda, A.M. Brouwer, A. Kros, R.I. Koning, D. Heinrich and S. Bonnet,
Intracellular Dynamic Assembly of Deep‐Red Emitting Supramolecular Nanostructures Based on the Pt…Pt Metallophilic Interaction
, Adv. Mater., 2008613: 1-13 (2021)
M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek,
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
, Phys. Chem. Chem. Phys.
23
, (31), 16646-16657 (2021)
R. Schupp, L. Behnke, Z. Bouza, Z. Mazzotta, Y. Mostafa, A.C. Lassise, L. Poirier, J. Sheil, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets
, J. Phys. D: Appl. Phys.
54
, (36), 365103: 1-12 (2021)
K.J. Flanagan, M. Paradiz Dominguez, Z. Melissari, H.-G. Eckhardt, R.M. Williams, D. Gibbons, C. Prior, G.M. Locke, A. Meindl, A.A. Ryan and M.O. Senge,
Structural effects of meso-halogenation on porphyrins
, Beilstein J. Org. Chem
17
, 1149-1170 (2021)
J. Kirschner, A.H.A. Gomes, R.R.T. Marinho, O. Björneholm, H. Ågren, V. Carravetta, N. Ottosson, A.N. de Brito and H.J. Bakker,
The molecular structure of the surface of water–ethanol mixtures
, Phys. Chem. Chem. Phys.
23
, 11568-11578 (2021)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
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Coming from abroad
Candidate portal
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