Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications - Articles

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • C.R. Stilhano Vilas Boas, J.M. Sturm, W.T.E. van den Beld and F. Bijkerk, Oxidation kinetics of transition metals exposed to molecular and atomic oxygen, Materialia 20, 101203: 1-13 (2021)

  • Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W.M.G. Ubachs, R. Hoekstra, M. Bayraktar and O.O. Versolato, The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range, AIP Advances 11, (12), 125003: 1-9 (2021)

  • S.D.C. Roscam Abbing, F. Campi, A. Zeltsi, P. Smorenburg and P.M. Kraus, Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation, Sci. Rep 11, (1), 24253: 1-11 (2021)

  • H. Zhang, A. Antoncecchi, S. Edward, P.C.M. Planken and S. Witte, Enhancing the detection of laser-excited strain waves via transparent nanolayers, Phys. Rev. B 104, (20), 205416: 1-8 (2021)

  • C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, I. Shlesinger, X. Liu, S. Witte, J.F. de Boer and A.J. den Boef, Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology, Opt. Express 29, (23), 38237-38256 (2021)

  • R.W. Liefferink, B. Weber, C. Coulais and D. Bonn, Geometric control of sliding friction, Extreme Mech. Lett. 49, 101475: 1-6 (2021)

  • L. Wu, M.F. Hilbers, O.C.M. Lugier, N. Thakur, M. Vockenhuber, Y. Ekinci, A.M. Brouwer and S. Castellanos Ortega, Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography, ACS Appl. Mater. Interfaces 13, (43), 51790-51798 (2021)

  • D.J. Hemminga, L. Poirier, M.M. Basko, R. Hoekstra, W.M.G. Ubachs, O.O. Versolato and J. Sheil, High-energy ions from Nd:YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model, Plasma Sources Sci. Technol. 30, (10), 105006: 1-10 (2021)

  • S.Yu. Krylov and J.W.M. Frenken, Atomistic mechanisms for frictional energy dissipation during continuous sliding, Sci. Rep 11, (1), 19964 : 1-10 (2021)

  • M. Paradiz Dominguez, B. Demirkurt, M. Grzelka, D. Bonn, L. Galmiche, P. Audebert and A.M. Brouwer, Fluorescent Liquid Tetrazines, Molecules 26, (19), 6047: 1-16 (2021)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 15
  • 16
  • 17
  • 18
  • 19
  • …
  • 31
  • 32
  • 33
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter