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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • D. Kim, R. Bliem, F. Hess, J.-J. Gallet and B. Yildiz, Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3, JACS 142, (7), 3548-3563 (2020)

  • H. Zhang, A. Antoncecchi, S. Edward, I. Setija, P.C.M. Planken and S. Witte, Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound, Phys. Rev. Appl. 13, (1), 014010: 1-14 (2020)

  • Z. Jakub, J. Hulva, P.T.P. Ryan, D.A. Duncan, D.J. Payne, R. Bliem, M. Ulreich, P. Hofegger, F. Kraushofer, M. Meier, M. Schmid, U. Diebold and G.S. Parkinson, Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst, Nanoscale 12, (10), 5866-5875 (2020)

  • D. Petrova, B. Weber, C. Allain, P. Audebert, C.H. Venner, A.M. Brouwer and D. Bonn, Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes, Sci. Adv. 5, (12), eaaw4761: 1-9 (2019)

  • D. Bonn and J.W.M. Frenken, Tunable superlubricity of 2-dimensional materials, PNAS 116, (49), 24386-24387 (2019)

  • N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters, J. of Micro/Nanolithography. MEMS and MOEMS 18, (4), 043504: 1-11 (2019)

  • M. Du, K.S.E. Eikema and S. Witte, Computational-imaging-based optical coherence tomography in time- and frequency-domain, OSA Continuum 2, (11), 3141-3152 (2019)

  • L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method, Eur. J. Inorg. Chem. 2019, (38), 4136-4141 (2019)

  • T. de Faria Pinto, J. Mathijssen, S. Witte and K.S.E. Eikema, An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm, Opt. Express 27, (21), 29829-29837 (2019)

  • Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst, Angew. Chem. Int. Ed. 131, 14099-14106 (2019)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter