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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, I. Shlesinger, X. Liu, S. Witte, J.F. de Boer and A.J. den Boef, Aberration calibration and correction with nano-scatterers in digital holographic microscopy for semiconductor metrology, Opt. Express 29, (23), 38237-38256 (2021)

  • R.W. Liefferink, B. Weber, C. Coulais and D. Bonn, Geometric control of sliding friction, Extreme Mech. Lett. 49, 101475: 1-6 (2021)

  • L. Wu, M.F. Hilbers, O.C.M. Lugier, N. Thakur, M. Vockenhuber, Y. Ekinci, A.M. Brouwer and S. Castellanos Ortega, Fluorescent Labeling to Investigate Nanopatterning Processes in Extreme Ultraviolet Lithography, ACS Appl. Mater. Interfaces 13, (43), 51790-51798 (2021)

  • D.J. Hemminga, L. Poirier, M.M. Basko, R. Hoekstra, W.M.G. Ubachs, O.O. Versolato and J. Sheil, High-energy ions from Nd:YAG laser ablation of tin microdroplets: comparison between experiment and a single-fluid hydrodynamic model, Plasma Sources Sci. Technol. 30, (10), 105006: 1-10 (2021)

  • S.Yu. Krylov and J.W.M. Frenken, Atomistic mechanisms for frictional energy dissipation during continuous sliding, Sci. Rep 11, (1), 19964 : 1-10 (2021)

  • M. Paradiz Dominguez, B. Demirkurt, M. Grzelka, D. Bonn, L. Galmiche, P. Audebert and A.M. Brouwer, Fluorescent Liquid Tetrazines, Molecules 26, (19), 6047: 1-16 (2021)

  • G. de Haan, T.J. van den Hooven and P.C.M. Planken, Ultrafast laser-induced strain waves in thin ruthenium layers, Opt. Express 29, (20), 32051-32067 (2021)

  • J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, UV and VUV-induced fragmentation of tin-oxo cage ions, Phys. Chem. Chem. Phys. 23, (37), 20909-20918 (2021)

  • R. Géneaux, I. Timrov, C.J. Kaplan, A.D. Ross, P.M. Kraus and S.R. Leone, Coherent energy exchange between carriers and phonons in Peierls-distorted bismuth unveiled by broadband XUV pulses, Phys. Rev. Res. 3, (3), 033210: 1-12 (2021)

  • O.C.M. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers, ACS Appl. Mater. Interfaces 13, (36), 43777-43786 (2021)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter