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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • N. Thakur, M. Vockenhuber, Y. Ekinci, B. Watts, A. Giglia, N. Mahne, S. Nannarone, S. Castellanos Ortega and A.M. Brouwer, Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance, ACS Mater. Au 2, (3), 343-355 (2022)

  • T.T.M. van Schaijk, C. Messinis, N. Pandey, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology from visible to infrared wavelengths using a single sensor, J. Micro/Nanopattern. Mater. Metrol. 21, (1), 014001: 1-10 (2022)

  • L. Poirier, A. Bayerle, A.C. Lassise, F. Torretti, R. Schupp, L. Behnke, Y. Mostafa, W.M.G. Ubachs, O.O. Versolato and R. Hoekstra, Cross-calibration of a combined electrostatic and time-of-flight analyzer for energy- and charge-state-resolved spectrometry of tin laser-produced plasma, Appl. Phys. B- Lasers O 128, (3), 39: 1-11 (2022)

  • G. de Haan, E. Abram, T.J. van den Hooven and P.C.M. Planken, Plasmonic enhancement of photoacoustic strain-waves on gold gratings, AIP Advances 12, (2), 025227: 1-8 (2022)

  • C.D. Dieleman, J.S. van den Burgt, N. Thakur, E.C. Garnett and B. Ehrler, Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography, ACS Appl. Energy Mater. 5, (2), 1672-1680 (2022)

  • van Eden, D. Verheijde and J. Verhoeven, Secondary electron emission yield measurements of dielectrics based on a novel collector-only method, Nucl. Instrum. Methods. Phys. Res., Sect B 511, 6-11 (2022)

  • F.-C. Hsia, S.E. Franklin, P. Audebert, A.M. Brouwer, D. Bonn and B. Weber, Rougher is more slippery: How adhesive friction decreases with increasing surface roughness due to the suppression of capillary adhesion, Phys. Rev. Res. 3, (4), 043204: 1-9 (2021)

  • Z. Bouza, J. Byers, J. Scheers, R. Schupp, Y. Mostafa, L. Behnke, Z. Mazzotta, J. Sheil, W.M.G. Ubachs, R. Hoekstra, M. Bayraktar and O.O. Versolato, The spectrum of a 1-μm-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range, AIP Advances 11, (12), 125003: 1-9 (2021)

  • S.D.C. Roscam Abbing, F. Campi, A. Zeltsi, P. Smorenburg and P.M. Kraus, Divergence and efficiency optimization in polarization-controlled two-color high-harmonic generation, Sci. Rep 11, (1), 24253: 1-11 (2021)

  • C.R. Stilhano Vilas Boas, J.M. Sturm, W.T.E. van den Beld and F. Bijkerk, Oxidation kinetics of transition metals exposed to molecular and atomic oxygen, Materialia 20, 101203: 1-13 (2021)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

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      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
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    • Career
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  • More
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