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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma, Appl. Phys. Lett. 115, (12), 124101: 1-6 (2019)

  • S. Witte and A.J. den Boef, Lensloze microscopie, NTvN, (2019)

  • S. Edward, S. Witte and P.C.M. Planken, Verborgen uitlijntralies meten met licht en geluid, NTvN, (2019)

  • S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra and G. O’Sullivan, Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions, J. Phys. B: At. Mol. Opt. Phys. 52, (17), 171002: 1-49 (2019)

  • G.S.M. Jansen, X. Liu, K.S.E. Eikema and S. Witte, Broadband extreme ultraviolet dispersionmeasurements using a high-harmonic source, Opt. Lett. 44, (15), 3625-3628 (2019)

  • O.O. Versolato, Physics of laser-driven tin plasma sources of EUV radiation for nanolithography, Plasma Sources Sci. Technol. 28, (8), 083001:1-17 (2019)

  • R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Scheers, D. Kurilovich, A. Bayerle, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Efficient generation of extreme ultraviolet light from Nd:YAG-driven microdroplet-tin plasma, Phys. Rev. Appl. 12, (1), 014010: 1-11 (2019)

  • L. Serafini, A. Bacci, A. Bellandi, M. Bertucci, M. Bolognesi, A. Bosotti, F. Broggi, R. Calandrino, F. Camera, F. Canella, S. Capra, P. Cardarelli, M. Carrara, K. Cassou, A. Castoldi, R. Castriconi, G.M. Cattaneo, S. Cialdi, A. Cianchi, N. Coluccelli, C. Curatolo, A. Del Vecchio, S. Di Mitri, I. Drebot, K. Dupraz, A. Esposito, L. Faillace, M. Ferrario, C. Fiorini, C. Galzerano, M. Gambaccini, G. Ghiringhelli, D. Giannotti, D. Giove, F. Groppi, C. Guazzoni, P. Laporta, S. Leoni, A. Loria, P. Mangili, A. Martens, T. Mazza, Z. Mazzotta, C. Meroni, G. Mettivier, P. Michelato, L. Monaco, S. Morante, M.M. Sala, D. Nutarelli, S. Olivares, G. Onida, M. Opromolla, C. Pagani, R. Paparella, M.G.A. Paris, B. Paroli, G. Paterno, C. Paulin, L. Perini, M. Petrarca, V. Petrillo, E. Pinotti, P. Piser, M.A.C. Potenza, F. Prelz, A. Pullia, E. Puppin, F. Ragusa, R. Ramponi, M. Rome, M.R. Conti, A.R. Rossi, L. Rossi, M. Ruijter, P. Russo, S. Samsam, A. Sarno, D. Sertore, M. Sorbi, B. Spataro, M. Statera, G. Turchetti, C. Vaccarezza, R. Valdagni, A. Vanzulli, F. Zomer and G. Rossi, MariX, an advanced MHz-class repetition rate X-ray source for linear regime time-resolved spectroscopy and photon scattering, Nucl. Instrum. Methods Phys. Res., Sect. A 930, (21), 167-172 (2019)

  • R.V. Mom, N. Louwen, J.W.M. Frenken and I.M.N. Groot, In situ observations of an active MoS2 model hydrodesulfurization catalyst, Nature Commun. 10, 2546: 1-8 (2019)

  • C.J. Kaplan, P.M. Kraus, E.M. Gullikson, L.J. Borja, S.K. Cushing, M. Zuerch, H.-T. Chang, D.M. Neumark and S.R. Leone, Retrieval of the complex-valued refractive index of germanium near the M-4,M-5 absorption edge, J. Opt. Soc. Am. B 36, (6), 1716-1720 (2019)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
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