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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • G. de Haan, T.J. van den Hooven and P.C.M. Planken, Ultrafast laser-induced strain waves in thin ruthenium layers, Opt. Express 29, (20), 32051-32067 (2021)

  • J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, UV and VUV-induced fragmentation of tin-oxo cage ions, Phys. Chem. Chem. Phys. 23, (37), 20909-20918 (2021)

  • R. Géneaux, I. Timrov, C.J. Kaplan, A.D. Ross, P.M. Kraus and S.R. Leone, Coherent energy exchange between carriers and phonons in Peierls-distorted bismuth unveiled by broadband XUV pulses, Phys. Rev. Res. 3, (3), 033210: 1-12 (2021)

  • O.C.M. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers, ACS Appl. Mater. Interfaces 13, (36), 43777-43786 (2021)

  • G. de Haan, V. Verrina, A.J.L. Adam, H. Zhang and P.C.M. Planken, Plasmonic enhancement of photo-acoustic inducedreflection changes, Appl. Opt. 60, (24), 7304-7313 (2021)

  • R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte, Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets, Phys. Rev. Appl. 16, (2), 024026: 1-11 (2021)

  • X.-Q. Zhou, M. Mytiliniou, J. Hilgendorf, Z. Ye, P. Panagiota, Y. Shao, M. Paradiz Dominguez, L. Zhang, M.B.S. Hesselberth, E. Bos, M.A. Siegler, F. Buda, A.M. Brouwer, A. Kros, R.I. Koning, D. Heinrich and S. Bonnet, Intracellular Dynamic Assembly of Deep‐Red Emitting Supramolecular Nanostructures Based on the Pt…Pt Metallophilic Interaction, Adv. Mater., 2008613: 1-13 (2021)

  • M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek, Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography, Phys. Chem. Chem. Phys. 23, (31), 16646-16657 (2021)

  • R. Schupp, L. Behnke, Z. Bouza, Z. Mazzotta, Y. Mostafa, A.C. Lassise, L. Poirier, J. Sheil, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets, J. Phys. D: Appl. Phys. 54, (36), 365103: 1-12 (2021)

  • K.J. Flanagan, M. Paradiz Dominguez, Z. Melissari, H.-G. Eckhardt, R.M. Williams, D. Gibbons, C. Prior, G.M. Locke, A. Meindl, A.A. Ryan and M.O. Senge, Structural effects of meso-halogenation on porphyrins, Beilstein J. Org. Chem 17, 1149-1170 (2021)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter