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      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
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      • High-Harmonic Generation and EUV Science Peter Kraus
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  • D. Petrova, B. Weber, C. Allain, P. Audebert, D. Bonn and A.M. Brouwer, Fast 3D Microscopy Imaging of Contacts Between Surfaces Using a Fluorescent Liquid, Appl.Mater.Interfaces 10, (48), 40973-40977 (2018)

  • J. Scheers, A.N. Ryabtsev, A. Borschevsky, J.C. Berengut, K. Haris, R. Schupp, D. Kurilovich, F. Torretti, A. Bayerle, E. Eliav, W.M.G. Ubachs, O.O. Versolato and R. Hoekstra, Energy-level structure of Sn3+ ions, Phys. Rev. A 98, (6), 062503: 1-12 (2018)

  • L.S. Dreissen, H.F. Schouten, W.M.G. Ubachs, S.B. Raghunathan and T.D. Visser, Active Two-Dimensional Steering of Radiation from a Nanoaperture, Nano Lett. 18, (11), 7207-7210 (2018)

  • D.E. Boonzajer Flaes and S. Witte, Interference probe ptychography for computational amplitude and phase microscopy, Opt. Express 26, (24), 31372-31390 (2018)

  • R.W. Liefferink, B. Weber and D. Bonn, Ploughing friction on wet and dry sand, Phys.Rev.E 98, (5), 052903: 1-5 (2018)

  • D. Kurilovich, T. de Faria Pinto, F. Torretti, R. Schupp, J. Scheers, A. Stodolna, H. Gelderblom, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Expansion Dynamics after Laser-Induced Cavitation in Liquid Tin Microdroplets, Phys. Rev. Appl. 10, (5), 054005: 1-8 (2018)

  • R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink, Quantifying single plasmonic nanostructure far -fields with interferometric and polarimetric k-space microscopy, Light : Sci. Appl. 7, 65: 1-11 (2018)

  • S. Edward, A. Antoncecchi, H. Zhang, H.J. Sielcken, S. Witte and P.C.M. Planken, Detection of periodic structures through opaque metal layers by optical measurements of ultrafast electron dynamics, Opt. Express 26, (18), 23380-23396 (2018)

  • S.K. Cushing, M. Zürch, P.M. Kraus, L.M. Carneiro, A. Lee, H.-T. Chang, C.J. Kaplan and S.R. Leone, Hot phonon and carrier relaxation in Si(100) determined by transient extreme ultraviolet spectroscopy, Struct. Dyn. 5, (5), 054302: 1-21 (2018)

  • A. Stodolna, T. de Faria Pinto, F. Ali, A. Bayerle, D. Kurilovich, J. Mathijssen, R. Hoekstra, O.O. Versolato, K.S.E. Eikema and S. Witte, Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair, J. Appl. Phys 124, (5), 053303: 1-7 (2018)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter