Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications - Articles

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • J. Kirschner, A.H.A. Gomes, R.R.T. Marinho, O. Björneholm, H. Ågren, V. Carravetta, N. Ottosson, A.N. de Brito and H.J. Bakker, The molecular structure of the surface of water–ethanol mixtures, Phys. Chem. Chem. Phys. 23, 11568-11578 (2021)

  • F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin, Tracing single asperity wear in relation to macroscale friction during running-in, Tribol.Int. 162, 107108: 1-9 (2021)

  • Y. Zhang, J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, N. Sadegh, R. Ovsyannikov, E. Giangrisostomi, F.O.L. Johansson, E. Berggren, A. Lindblad and A.M. Brouwer, Extreme ultraviolet photoemission of a tin-based photoresist, Appl. Phys. Lett. 118, (17), 171903: 1-6 (2021)

  • F.M. Elam, F.-C. Hsia, S. van Vliet, R. Bliem, L. Yang, B. Weber and S.E. Franklin, The influence of corrosion on diamond-like carbon topography and friction at the nanoscale, Carbon 179, 590-599 (2021)

  • M. Aarts, S. van Vliet, R. Bliem and E. Alarcón-Lladó, Investigation of copper nanoscale electro-crystallization under directed and non-directed electrodeposition from dilute electrolytes, CrystEngComm 23, (20), 3648-3653 (2021)

  • J.S. van den Burgt, C.D. Dieleman, E. Johlin, J.J. Geuchies, A.J. Houtepen, B. Ehrler and E.C. Garnett, Integrating Sphere Fourier Microscopy of Highly Directional Emission, ACS Photonics 8, (4), 1143-1151 (2021)

  • R. Schupp, L. Behnke, J. Sheil, Z. Bouza, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Characterization of 1- and 2−μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light, Phys. Rev. Res. 3, (1), 013294: 1-9 (2021)

  • R. Röhrich, A.F. Koenderink, S. Witte and L. Loetgering, Spatial coherence control and analysis via micromirror-based mixed-state ptychography, New J. Phys. 23, 053016: 1-15 (2021)

  • M. Du, L. Loetgering, K.S.E. Eikema and S. Witte, Ptychographic optical coherence tomography, Opt. Lett. 46, (6), 1337-1340 (2021)

  • R. Röhrich and A.F. Koenderink, Double moiré localized plasmon structured illumination microscopy, Nanophotonics 10, (3), 1107-1121 (2021)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 17
  • 18
  • 19
  • 20
  • 21
  • …
  • 31
  • 32
  • 33
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter