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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • T. Suhina, D. Bonn, B. Weber and A.M. Brouwer, Photophysics of Fluorescent Contact Sensors Based on the Dicyanodihydrofuran Motif, ChemPhysChem 22, (2), 221-227 (2021)

  • T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte, Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact, Appl. Phys. A 127, (2), 93: 1-10 (2021)

  • J. Seifert, D. Bouchet, L. Loetgering and A.P. Mosk, Efficient and flexible approach to ptychography using an optimization framework based on automatic differentiation, OSA Continuum 4, (1), 121-121 (2021)

  • M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse, Spatiotemporal focusing through a multimode fiber via time-domain wavefront shaping, Opt. Express 29, (1), 272-290 (2021)

  • H.C. Hendrikse, A. van der Weijden, M. Ronda‐Lloret, T. Yang, R. Bliem, R.N. Shiju, M. van Hecke, L. Li and W.L. Noorduin, Shape‐Preserving Chemical Conversion of Architected Nanocomposites, Adv. Mater. 32, (52), 2003999: 1-7 (2020)

  • N.J. Schilder, T. A. W. Wolterink, C. Mennes, R. Röhrich and A.F. Koenderink, Phase-retrieval Fourier microscopy of partially temporally coherent nanoantenna radiation patterns, Opt. Express 28, (25), 37844-37859 (2020)

  • C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms, Opt. Express 28, (25), 37419-37435 (2020)

  • S. Rai, K. Bijlsma, S. Koeleman, Tjepkema, A.W. Noordam, H.T. Jonkman, O.O. Versolato and R. Hoekstra, Single-collision scattering of keV-energy Kr ions off a polycrystalline Cu surface, Nucl. Instrum. Methods. Phys. Res., Sect B 482, 58-63 (2020)

  • A. Antoncecchi, H. Zhang, S. Edward, V. Verrina, P.C.M. Planken and S. Witte, High-resolution microscopy through optically opaque media using ultrafast photoacoustics, Opt. Express 28, (23), 33937-33947 (2020)

  • V. Verrina, S. Edward, H. Zhang, A. Antoncecchi, S. Witte and P.C.M. Planken, Role of scattering by surface roughness in the photoacoustic detection of hidden micro-structures, Appl. Opt. 59, (30), 9499-9509 (2020)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter