Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter
Directory

Publications - Articles

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Books
  • Master Thesis
  • Proceedings
  • Theses
  • X.-Q. Zhou, M. Mytiliniou, J. Hilgendorf, Z. Ye, P. Panagiota, Y. Shao, M. Paradiz Dominguez, L. Zhang, M.B.S. Hesselberth, E. Bos, M.A. Siegler, F. Buda, A.M. Brouwer, A. Kros, R.I. Koning, D. Heinrich and S. Bonnet, Intracellular Dynamic Assembly of Deep‐Red Emitting Supramolecular Nanostructures Based on the Pt…Pt Metallophilic Interaction, Adv. Mater., 2008613: 1-13 (2021)

  • M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek, Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography, Phys. Chem. Chem. Phys. 23, (31), 16646-16657 (2021)

  • R. Schupp, L. Behnke, Z. Bouza, Z. Mazzotta, Y. Mostafa, A.C. Lassise, L. Poirier, J. Sheil, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets, J. Phys. D: Appl. Phys. 54, (36), 365103: 1-12 (2021)

  • K.J. Flanagan, M. Paradiz Dominguez, Z. Melissari, H.-G. Eckhardt, R.M. Williams, D. Gibbons, C. Prior, G.M. Locke, A. Meindl, A.A. Ryan and M.O. Senge, Structural effects of meso-halogenation on porphyrins, Beilstein J. Org. Chem 17, 1149-1170 (2021)

  • J. Kirschner, A.H.A. Gomes, R.R.T. Marinho, O. Björneholm, H. Ågren, V. Carravetta, N. Ottosson, A.N. de Brito and H.J. Bakker, The molecular structure of the surface of water–ethanol mixtures, Phys. Chem. Chem. Phys. 23, 11568-11578 (2021)

  • F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin, Tracing single asperity wear in relation to macroscale friction during running-in, Tribol.Int. 162, 107108: 1-9 (2021)

  • Y. Zhang, J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, N. Sadegh, R. Ovsyannikov, E. Giangrisostomi, F.O.L. Johansson, E. Berggren, A. Lindblad and A.M. Brouwer, Extreme ultraviolet photoemission of a tin-based photoresist, Appl. Phys. Lett. 118, (17), 171903: 1-6 (2021)

  • F.M. Elam, F.-C. Hsia, S. van Vliet, R. Bliem, L. Yang, B. Weber and S.E. Franklin, The influence of corrosion on diamond-like carbon topography and friction at the nanoscale, Carbon 179, 590-599 (2021)

  • M. Aarts, S. van Vliet, R. Bliem and E. Alarcón-Lladó, Investigation of copper nanoscale electro-crystallization under directed and non-directed electrodeposition from dilute electrolytes, CrystEngComm 23, (20), 3648-3653 (2021)

  • J.S. van den Burgt, C.D. Dieleman, E. Johlin, J.J. Geuchies, A.J. Houtepen, B. Ehrler and E.C. Garnett, Integrating Sphere Fourier Microscopy of Highly Directional Emission, ACS Photonics 8, (4), 1143-1151 (2021)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 19
  • 20
  • 21
  • 22
  • 23
  • …
  • 33
  • 34
  • 35
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter