Publications - Articles - ARCNL

L. Loetgering, X. Liu, A.C.C. de Beurs, M. Du, G. Kuijper, K.S.E. Eikema and S. Witte, Tailoring spatial entropy in extreme ultraviolet focused beams for multispectral ptychography, Optica 8, (2), 130-138 (2021)
J. Sheil, O.O. Versolato, A.J. Neukirch and J. Colgan, Multiply-excited states and their contribution to opacity in CO2 laser-driven tin-plasma conditions, J. Phys. B: At. Mol. Opt. Phys. 54, (3), 035002: 1-11 (2021)
J. Hulva, M. Meier, R. Bliem, Z. Jakub, F. Kraushofer, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, Unraveling CO adsorption on model single-atom catalysts, Science 371, (6527), 375-379 (2021)
T. Suhina, D. Bonn, B. Weber and A.M. Brouwer, Photophysics of Fluorescent Contact Sensors Based on the Dicyanodihydrofuran Motif, ChemPhysChem 22, (2), 221-227 (2021)
T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte, Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact, Appl. Phys. A 127, (2), 93: 1-10 (2021)
J. Seifert, D. Bouchet, L. Loetgering and A.P. Mosk, Efficient and flexible approach to ptychography using an optimization framework based on automatic differentiation, OSA Continuum 4, (1), 121-121 (2021)
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse, Spatiotemporal focusing through a multimode fiber via time-domain wavefront shaping, Opt. Express 29, (1), 272-290 (2021)
H.C. Hendrikse, A. van der Weijden, M. Ronda‐Lloret, T. Yang, R. Bliem, R.N. Shiju, M. van Hecke, L. Li and W.L. Noorduin, Shape‐Preserving Chemical Conversion of Architected Nanocomposites, Adv. Mater. 32, (52), 2003999: 1-7 (2020)
N.J. Schilder, T. A. W. Wolterink, C. Mennes, R. Röhrich and A.F. Koenderink, Phase-retrieval Fourier microscopy of partially temporally coherent nanoantenna radiation patterns, Opt. Express 28, (25), 37844-37859 (2020)
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms, Opt. Express 28, (25), 37419-37435 (2020)

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