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    • Mission and vision
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    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • H. Gelderblom and O.O. Versolato, Laserschieten op tindruppels, NTvN 83, (11), 382-385 (2017)

  • J. Haitjema, Y. Zhang, M. Vockenhuber, D. Kazazis, Y. Ekinci and A.M. Brouwer, Extreme ultraviolet patterning of tin-oxo cages, J. of Micro/Nanolithography. MEMS and MOEMS 16, (3), 033510:1-7 (2017)

  • R.A. Meijer, A. Stodolna, K.S.E. Eikema and S. Witte, High-energy Nd:YAG laser system with arbitrary sub-nanosecond pulse shaping capability, Opt. Lett. 42, (14), 2758-2761 (2017)

  • Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson and A.M. Brouwer, Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy, J. of Micro/Nanolithography. MEMS and MOEMS 16, (2), 123510: 1-7 (2017)

  • J. Haitjema, Y. Zhang, N. Ottosson and A.M. Brouwer, Photoreactions of Tin Oxo Cages, Model EUV Photoresists, J. Photopolym. Sci. Tec. 30, (1), 99-102 (2017)

  • F. Torretti, A. Windberger, A.N. Ryabtsev, S. Dobrodey, H. Bekker, W.M.G. Ubachs, R. Hoekstra, E.V. Kahl, J.C. Berengut, J.R. Crespo López-Urrutia and O.O. Versolato, Optical spectroscopy of complex open-4d-shell ions Sn7+–Sn10+, Phys. Rev. A 95, 042503: 1-16 (2017)

  • O.O. Versolato, Boxing with tin droplets, Amsterdam Sci. 3, (5) (2017)

  • M.J. Deuzeman, A. Stodolna, E.E.B. Leerssen, A. Antoncecchi, N. Spook, T. Kleijntjens, J. Versluis, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Ion distribution and ablation depth measurements of a fs-ps laser-irradiated solid tin target, J. Appl. Phys 121, (10), 103301: 1-8 (2017)

  • D. Kurilovich, A.L. Klein, F. Torretti, A. Lassise, R. Hoekstra, W.M.G. Ubachs, H. Gelderblom and O.O. Versolato, Plasma Propulsion of a Metallic Micro-droplet and its Deformation upon Laser Impact, Phys. Rev. Appl. 6, 014018: 1-8 (2016)

  • A. Windberger, F. Torretti, A. Borschevsky, A.N. Ryabtsev, S. Dobrodey, H. Bekker, E. Eliav, U. Kaldor, W.M.G. Ubachs, R. Hoekstra, J.R. Crespo López-Urrutia and O.O. Versolato, Analysis of the fine structure of Sn11+ - 14+ ions by optical spectroscopy in an electron beam ion trap, Phys. Rev. A 94, 012506: 1-11 (2016)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter