Advances in laboratory-scale ptychography using high harmonic sources [Invited]

Publication date
DOI http://dx.doi.org/10.1364/oe.443622
Reference L. Lötgering, S. Witte and J. Rothhardt, Advances in laboratory-scale ptychography using high harmonic sources [Invited], Opt. Express 30, (3), 4133-4164 (2022)
Group EUV Generation & Imaging

Extreme ultraviolet microscopy and wavefront sensing are key elements for next-generation ultrafast applications, such as chemically-resolved imaging, focal spot diagnostics in pump-and-probe experiments, and actinic metrology for the state-of-the-art lithography node at 13.5 nm wavelength. Ptychography offers a robust solution to the aforementioned challenges. Originally adapted by the electron and synchrotron communities, advances in the stability and brightness of high-harmonic tabletop sources have enabled the transfer of ptychography to the laboratory. This review covers the state of the art in tabletop ptychography with high harmonic generation sources. We consider hardware options such as illumination optics and detector concepts as well as algorithmic aspects in the analysis of multispectral ptychography data. Finally, we review technological application cases such as multispectral wavefront sensing, attosecond pulse characterization, and depth-resolved imaging.