Publications - Articles - ARCNL

I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos Ortega, The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography, ACS Appl. Mater. Interfaces 12, (8), 9881-0889 (2020)
F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin, Wear particle dynamics drive the difference between repeated and non-repeated reciprocated sliding, Tribol.Int. 142, 105983: 1-8 (2020)
F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Spectral characterization of an industrial EUV light source for nanolithography, J. Phys. D: Appl. Phys. 53, (5), 055204: 1-7 (2020)
L.V. Amitonova and J.F. de Boer, Sensitivity analysis of Raman endoscopy with and without wavefront shaping, Opt. Express 28, (3), 3779-3788 (2020)
D. Kim, R. Bliem, F. Hess, J.-J. Gallet and B. Yildiz, Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3, J. Am. Chem. Soc. 142, (7), 3548-3563 (2020)
H. Zhang, A. Antoncecchi, S. Edward, I. Setija, P.C.M. Planken and S. Witte, Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound, Phys. Rev. Appl. 13, (1), 014010: 1-14 (2020)
D. Petrova, B. Weber, C. Allain, P. Audebert, C.H. Venner, A.M. Brouwer and D. Bonn, Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes, Sci. Adv. 5, (12), eaaw4761: 1-9 (2019)
D. Bonn and J.W.M. Frenken, Tunable superlubricity of 2-dimensional materials, PNAS 116, (49), 24386-24387 (2019)
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters, J. of Micro/Nanolithography. MEMS and MOEMS 18, (4), 043504: 1-11 (2019)
M. Du, K.S.E. Eikema and S. Witte, Computational-imaging-based optical coherence tomography in time- and frequency-domain, OSA Continuum 2, (11), 3141-3152 (2019)

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