Logo
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter
Directory
menu
Search
Publications - Articles
Category
Articles
Bachelor Thesis
Book Chapters
Master Thesis
Proceedings
Theses
S. Witte and A.J. den Boef,
Lensloze microscopie
, NTvN, (2019)
S. Edward, S. Witte and P.C.M. Planken,
Verborgen uitlijntralies meten met licht en geluid
, NTvN, (2019)
S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra and G. O’Sullivan,
Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions
, J. Phys. B: At. Mol. Opt. Phys.
52
, (17), 171002: 1-49 (2019)
G.S.M. Jansen, X. Liu, K.S.E. Eikema and S. Witte,
Broadband extreme ultraviolet dispersionmeasurements using a high-harmonic source
, Opt. Lett.
44
, (15), 3625-3628 (2019)
O.O. Versolato,
Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
, Plasma Sources Sci. Technol.
28
, (8), 083001:1-17 (2019)
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Scheers, D. Kurilovich, A. Bayerle, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Efficient generation of extreme ultraviolet light from Nd:YAG-driven microdroplet-tin plasma
, Phys. Rev. Appl.
12
, (1), 014010: 1-11 (2019)
L. Serafini, A. Bacci, A. Bellandi, M. Bertucci, M. Bolognesi, A. Bosotti, F. Broggi, R. Calandrino, F. Camera, F. Canella, S. Capra, P. Cardarelli, M. Carrara, K. Cassou, A. Castoldi, R. Castriconi, G.M. Cattaneo, S. Cialdi, A. Cianchi, N. Coluccelli, C. Curatolo, A. Del Vecchio, S. Di Mitri, I. Drebot, K. Dupraz, A. Esposito, L. Faillace, M. Ferrario, C. Fiorini, C. Galzerano, M. Gambaccini, G. Ghiringhelli, D. Giannotti, D. Giove, F. Groppi, C. Guazzoni, P. Laporta, S. Leoni, A. Loria, P. Mangili, A. Martens, T. Mazza, Z. Mazzotta, C. Meroni, G. Mettivier, P. Michelato, L. Monaco, S. Morante, M.M. Sala, D. Nutarelli, S. Olivares, G. Onida, M. Opromolla, C. Pagani, R. Paparella, M.G.A. Paris, B. Paroli, G. Paterno, C. Paulin, L. Perini, M. Petrarca, V. Petrillo, E. Pinotti, P. Piser, M.A.C. Potenza, F. Prelz, A. Pullia, E. Puppin, F. Ragusa, R. Ramponi, M. Rome, M.R. Conti, A.R. Rossi, L. Rossi, M. Ruijter, P. Russo, S. Samsam, A. Sarno, D. Sertore, M. Sorbi, B. Spataro, M. Statera, G. Turchetti, C. Vaccarezza, R. Valdagni, A. Vanzulli, F. Zomer and G. Rossi,
MariX, an advanced MHz-class repetition rate X-ray source for linear regime time-resolved spectroscopy and photon scattering
, Nucl. Instrum. Methods Phys. Res., Sect. A
930
, (21), 167-172 (2019)
R.V. Mom, N. Louwen, J.W.M. Frenken and I.M.N. Groot,
In situ observations of an active MoS2 model hydrodesulfurization catalyst
, Nature Commun.
10
, 2546: 1-8 (2019)
C.J. Kaplan, P.M. Kraus, E.M. Gullikson, L.J. Borja, S.K. Cushing, M. Zuerch, H.-T. Chang, D.M. Neumark and S.R. Leone,
Retrieval of the complex-valued refractive index of germanium near the M-4,M-5 absorption edge
, J. Opt. Soc. Am. B
36
, (6), 1716-1720 (2019)
Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson,
Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water
, J. Phys. Chem. C
123
, (24), 15038-15045 (2019)
Logo
Close
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter