Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications - Articles

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • M. Saedi, C. Sfiligoj, J. Verhoeven and J.W.M. Frenken, Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications, Appl. Surf. Sci., 144951: 1-10 (2020)

  • L. Loetgering, M. Du, K.S.E. Eikema and S. Witte, zPIE: an autofocusing algorithm for ptychography, Opt. Lett. 45, (7), 2030-2033 (2020)

  • P.C. Konda, L. Loetgering, K.C. Zhou, S. Xu, A.R. Harvey and R. Horstmeyer, Fourier ptychography: current applications and future promises, Opt. Express 28, (7), 9603-9630 (2020)

  • R. Hu, S.Yu. Krylov and J.W.M. Frenken, On the Origin of Frictional Energy Dissipation, Tribol. Lett. 68, (1), 8: 1-13 (2020)

  • Z. Jakub, J. Hulva, P.T.P. Ryan, D.A. Duncan, D.J. Payne, R. Bliem, M. Ulreich, P. Hofegger, F. Kraushofer, M. Meier, M. Schmid, U. Diebold and G.S. Parkinson, Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst, Nanoscale 12, (10), 5866-5875 (2020)

  • L.V. Amitonova, T.B.H. Tentrup, I.M. Vellekoop and P.W.H. Pinkse, Quantum key establishment via a multimode fiber, Opt. Express 28, (5), 5965-5981 (2020)

  • L. Loetgering, M. Baluktsian, K. Keskinbora, R. Horstmeyer, T. Wilhein, G. Schütz, K.S.E. Eikema and S. Witte, Generation and characterization of focused helical x-ray beams, Sci. Adv. 6, (7), eaax8836: 1-6 (2020)

  • B. Liu, D. Kurilovich, H. Gelderblom and O.O. Versolato, Mass loss from a stretching semitransparent sheet of liquid tin, Phys. Rev. Appl. 13, (2), 024035: 1-10 (2020)

  • A.C.C. de Beurs, X. Liu, G.S.M. Jansen, S. Konijnenberg, W. Coene, K.S.E. Eikema and S. Witte, Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry, Opt. Express 28, (4), 5257-5266 (2020)

  • M. Du, L. Loetgering, K.S.E. Eikema and S. Witte, Measuring laser beam quality, wavefronts, and lens aberrations using ptychography, Opt. Express 28, (4), 5022-5034 (2020)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 23
  • 24
  • 25
  • 26
  • 27
  • …
  • 31
  • 32
  • 33
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter