Publications - Articles - ARCNL

M. Du, K.S.E. Eikema and S. Witte, Computational-imaging-based optical coherence tomography in time- and frequency-domain, OSA Continuum 2, (11), 3141-3152 (2019)
L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method, Eur. J. Inorg. Chem. 2019, (38), 4136-4141 (2019)
T. de Faria Pinto, J. Mathijssen, S. Witte and K.S.E. Eikema, An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm, Opt. Express 27, (21), 29829-29837 (2019)
Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst, Angew. Chem. Int. Ed. 131, 14099-14106 (2019)
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma, Appl. Phys. Lett. 115, (12), 124101: 1-6 (2019)
S. Edward, S. Witte and P.C.M. Planken, Verborgen uitlijntralies meten met licht en geluid, NTvN, (2019)
S. Witte and A.J. den Boef, Lensloze microscopie, NTvN, (2019)
S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra and G. O’Sullivan, Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions, J. Phys. B: At. Mol. Opt. Phys. 52, (17), 171002: 1-49 (2019)
G.S.M. Jansen, X. Liu, K.S.E. Eikema and S. Witte, Broadband extreme ultraviolet dispersionmeasurements using a high-harmonic source, Opt. Lett. 44, (15), 3625-3628 (2019)
O.O. Versolato, Physics of laser-driven tin plasma sources of EUV radiation for nanolithography, Plasma Sources Sci. Technol. 28, (8), 083001:1-17 (2019)

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