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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink,
Quantifying single plasmonic nanostructure far -fields with interferometric and polarimetric k-space microscopy
, Light : Sci. Appl.
7
, 65: 1-11 (2018)
S. Edward, A. Antoncecchi, H. Zhang, H.J. Sielcken, S. Witte and P.C.M. Planken,
Detection of periodic structures through opaque metal layers by optical measurements of ultrafast electron dynamics
, Opt. Express
26
, (18), 23380-23396 (2018)
S.K. Cushing, M. Zürch, P.M. Kraus, L.M. Carneiro, A. Lee, H.-T. Chang, C.J. Kaplan and S.R. Leone,
Hot phonon and carrier relaxation in Si(100) determined by transient extreme ultraviolet spectroscopy
, Struct. Dyn.
5
, (5), 054302: 1-21 (2018)
A. Stodolna, T. de Faria Pinto, F. Ali, A. Bayerle, D. Kurilovich, J. Mathijssen, R. Hoekstra, O.O. Versolato, K.S.E. Eikema and S. Witte,
Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair
, J. Appl. Phys.
124
, (5), 053303: 1-7 (2018)
G.C. Dong, Y. Zhang and J.W.M. Frenken,
Formation of a monolayer h-BN nanomesh on Rh (111) studied using in-situ STM
, Sci. China-Phys. Mech. Astron.
61
, (7), 076811: 1-6 (2018)
S.A. Reijers, D. Kurilovich, F. Torretti, H. Gelderblom and O.O. Versolato,
Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light
, J. Appl. Phys.
124
, (1), 013102: 1-7 (2018)
P.M. Kraus, M. Zürch, S.K. Cushing, D.M. Neumark and S.R. Leone,
The ultrafast X-ray spectroscopic revolution in chemical dynamics
, Nat. Rev. Chem.
2
, (6), 82-94 (2018)
Y. Zhang, J. Haitjema, M. Baljozovic, M. Vockenhuber, D. Kazazis, T. Jung, Y. Ekinci and A.M. Brouwer,
Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure
, J. Photopolymer. Sci.Tec.
31
, (2), 249-255 (2018)
J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer,
Photo-Induced Fragmentation of a Tin-Oxo Cage Compound
, J. Photopolymer. Sci.Tec.
31
, (2), 243-247 (2018)
G.S.M. Jansen, A.C.C. de Beurs, X. Liu, K.S.E. Eikema and S. Witte,
Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging
, Opt. Express
26
, (10), 12479-12489 (2018)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
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Events
Repository
Contact & Directions
ARCNL Newsletter