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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos Ortega, Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists, J. of Micro/Nanolithography. MEMS and MOEMS 18, (1) (2019)

  • D. Bodewits and R. Hoekstra, Charge-Exchange Emission from Hydrogen-Like Carbon Ions Colliding with Water Molecules, Atoms 7, (1), 17: 1-11 (2019)

  • L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos Ortega, Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications, J. Mater. Chem. C 7, (1), 33-37 (2019)

  • F.-C. Hsia, D.-M. Tang, W. Jevasuwan, N. Fukata, X. Zhou, M. Mitome, Y. Bando, T.E.M. Nordling and D. Golberg, Realization and direct observation of five normal and parametric modes in silicon nanowire resonators by in situ transmission electron microscopy, Nanoscale Adv. 1, (5), 1784-1790 (2019)

  • J. Wang, S.N. Bishop, L. Sun, Q. Lu, G. Vardar, R. Bliem, N. Tsvetkov, E.J. Crumlin, J.-J. Gallet, F. Bournel, I. Waluyo and B. Yildiz, Threshold catalytic onset of carbon formation on CeO2 during CO2 electrolysis: mechanism and inhibition, J. Mater. Chem. A 7, (25), 15233-15243 (2019)

  • D. Petrova, B. Weber, C. Allain, P. Audebert, D. Bonn and A.M. Brouwer, Fast 3D Microscopy Imaging of Contacts Between Surfaces Using a Fluorescent Liquid, ACS Appl. Mater. Interfaces 10, (48), 40973-40977 (2018)

  • J. Scheers, A.N. Ryabtsev, A. Borschevsky, J.C. Berengut, K. Haris, R. Schupp, D. Kurilovich, F. Torretti, A. Bayerle, E. Eliav, W.M.G. Ubachs, O.O. Versolato and R. Hoekstra, Energy-level structure of Sn3+ ions, Phys. Rev. A 98, (6), 062503: 1-12 (2018)

  • D.E. Boonzajer Flaes and S. Witte, Interference probe ptychography for computational amplitude and phase microscopy, Opt. Express 26, (24), 31372-31390 (2018)

  • L.S. Dreissen, H.F. Schouten, W.M.G. Ubachs, S.B. Raghunathan and T.D. Visser, Active Two-Dimensional Steering of Radiation from a Nanoaperture, Nano Lett. 18, (11), 7207-7210 (2018)

  • R.W. Liefferink, B. Weber and D. Bonn, Ploughing friction on wet and dry sand, Phys. Rev. E 98, (5), 052903: 1-5 (2018)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter