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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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D. Kurilovich, M.M. Basko, D.A. Kim, F. Torretti, J.C. Visschers, R. Schupp, J. Scheers, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato,
Power-law scaling of plasma pressure on laser-ablated tin microdroplets
, Phys. Plasmas
25
, 012709: 1-10 (2018)
R.V. Mom, J. Vermeer, J.W.M. Frenken and I.M.N. Groot,
Structural Dynamics of Al2O3/NiAl(110) During Film Growth in NO2
, J.Phys.Chem.B
122
, (2), 788-793 (2018)
M.F. Jager, C. Ott, C.J. Kaplan, P.M. Kraus, D.M. Neumark and S.R. Leone,
Attosecond transient absorption instrumentation for thin film materials: Phase transitions, heat dissipation, signal stabilization, timing correction, and rapid sample rotation
, Rev. Sci. Instrum.
89
, (1) (2018)
A. Thete, D. Geelen, S.J. van der Molen and R.M. Tromp,
Charge catastrophe and dielectric breakdown during exposure of organic thin films to low-energy electron radiation
, Phys. Rev. Lett.
119
, (26), 266803: 1-6 (2017)
H. Gelderblom and O.O. Versolato,
Laserschieten op tindruppels
, NTvN
83
, (11), 382-385 (2017)
J. Haitjema, Y. Zhang, M. Vockenhuber, D. Kazazis, Y. Ekinci and A.M. Brouwer,
Extreme ultraviolet patterning of tin-oxo cages
, J. of Micro/Nanolithography. MEMS and MOEMS
16
, (3), 033510:1-7 (2017)
R.A. Meijer, A. Stodolna, K.S.E. Eikema and S. Witte,
High-energy Nd:YAG laser system with arbitrary sub-nanosecond pulse shaping capability
, Opt. Lett.
42
, (14), 2758-2761 (2017)
Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson and A.M. Brouwer,
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
, J. of Micro/Nanolithography. MEMS and MOEMS
16
, (2), 123510: 1-7 (2017)
J. Haitjema, Y. Zhang, N. Ottosson and A.M. Brouwer,
Photoreactions of Tin Oxo Cages, Model EUV Photoresists
, J. Photopolym. Sci. Technol.
30
, (1), 99-102 (2017)
F. Torretti, A. Windberger, A.N. Ryabtsev, S. Dobrodey, H. Bekker, W.M.G. Ubachs, R. Hoekstra, E.V. Kahl, J.C. Berengut, J.R. Crespo López-Urrutia and O.O. Versolato,
Optical spectroscopy of complex open-4d-shell ions Sn7+–Sn10+
, Phys. Rev. A
95
, 042503: 1-16 (2017)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter