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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J.L. Ellis, K.M. Dorney, D.D. Hickstein, N.J. Brooks, C. Gentry, C. Hernández-García, D. Zusin, J.M. Shaw, Q.L. Nguyen, C.A. Mancuso, G.S. Jansen, S. Witte, H.C. Kapteyn and M.M. Murnane,
High harmonics with spatially varying ellipticity
, Optica
5
, (4), 479-485 (2018)
P.M. Kraus and H.J. Wörner,
Perspectives of Attosecond Spectroscopy for the Understanding of Fundamental Electron Correlations
, Angew. Chem. Int. Ed.
57
, (19), 5228-5247 (2018)
A. Bayerle, M.J. Deuzeman, S. van der Heijden, D. Kurilovich, T. de Faria Pinto, A. Stodolna, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Sn ion energy distributions of ns- and ps-laser produced plasmas
, Plasma Sources Sci. Technol.
27
, 045001:1-8 (2018)
L. Freisem, G.S.M. Jansen, D. Rudolf, K.S.E. Eikema and S. Witte,
Spectrally resolved single-shot wavefront sensing of broadband high-harmonic sources
, Opt. Express
26
, (6), 6860-6871 (2018)
B. Weber, T. Suhina, T. Junge, L. Pastewka, A.M. Brouwer and D. Bonn,
Molecular probes reveal deviations from Amontons' law in multi-asperity frictional contacts
, Nature Commun.
9
, 888:1-7 (2018)
F. Torretti, R. Schupp, D. Kurilovich, A. Bayerle, J. Scheers, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Short-wavelength out-of-band EUV emission from Sn laser-produced plasma
, J. Phys. B: At. Mol. Opt. Phys.
51
, 045005:1-9 (2018)
D. Kurilovich, M.M. Basko, D.A. Kim, F. Torretti, J.C. Visschers, R. Schupp, J. Scheers, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato,
Power-law scaling of plasma pressure on laser-ablated tin microdroplets
, Phys. Plasmas
25
, 012709: 1-10 (2018)
R.V. Mom, J. Vermeer, J.W.M. Frenken and I.M.N. Groot,
Structural Dynamics of Al2O3/NiAl(110) During Film Growth in NO2
, J.Phys.Chem.B
122
, (2), 788-793 (2018)
M.F. Jager, C. Ott, C.J. Kaplan, P.M. Kraus, D.M. Neumark and S.R. Leone,
Attosecond transient absorption instrumentation for thin film materials: Phase transitions, heat dissipation, signal stabilization, timing correction, and rapid sample rotation
, Rev. Sci. Instrum.
89
, (1) (2018)
A. Thete, D. Geelen, S.J. van der Molen and R.M. Tromp,
Charge catastrophe and dielectric breakdown during exposure of organic thin films to low-energy electron radiation
, Phys. Rev. Lett.
119
, (26), 266803: 1-6 (2017)
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Close
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter