Measuring laser beam quality, wavefronts, and lens aberrations using ptychography

Publication date
DOI http://dx.doi.org/10.1364/oe.385191
Reference M. Du, L. Loetgering, K.S.E. Eikema and S. Witte, Measuring laser beam quality, wavefronts, and lens aberrations using ptychography, Opt. Express 28, 4: 5022-5034 (2020)
Group EUV Generation & Imaging

We report on an approach for quantitative characterization of laser beam quality, wavefronts, and lens aberrations using ptychography with a near-infrared supercontinuum laser. Ptychography is shown to offer a powerful alternative for both beam propagation ratio M2 and wavefront measurements compared with existing techniques. In addition, ptychography is used to recover the transmission function of a microlens array for aberration analysis. The results demonstrate ptychography’s flexibility in wavefront metrology and optical shop testing.