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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • Bachelor Thesis
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  • O.C.M. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos Ortega, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Technol. 33, (2), 229-234 (2020)

  • F. Holtrop, A.R. Jupp, N.P. van Leest, M. Paradiz Dominguez, R.M. Williams, A.M. Brouwer, B. de Bruin, A.W. Ehlers and J.C. Slootweg, Photoinduced and Thermal Single‐Electron Transfer to Generate Radicals from Frustrated Lewis Pairs, Chem. Eur. J. 26, (41), 9005-9011 (2020)

  • L. Helmbrecht, M. Tan, R. Röhrich, M.H. Bistervels, B.O. Kessels, A.F. Koenderink, B. Kahr and W.L. Noorduin, Directed Emission from Self‐Assembled Microhelices, Adv. Funct. Mater. 30, (26), 1908218: 1-5 (2020)

  • H. Zhang, J.-P. Colombier and S. Witte, Laser-induced periodic surface structures: Arbitrary angles of incidence and polarization states, Phys. Rev. B 101, (24), 245430: 1-15 (2020)

  • O.C.M. Lugier, U. Pokharel and S. Castellanos Ortega, Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films., Cryst. Growth Des. 20, (8), 5302-5309 (2020)

  • J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato, EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap, Phys. Rev. A 101, (6), 062511: 1-11 (2020)

  • O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte, Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography, J. Phys.: Conf. Ser. 1412, (19), 192006:1-1 (2020)

  • R. Géneaux, C.J. Kaplan, L. Yue, A.D. Ross, E. Bækhøj, P.M. Kraus, H.-T. Chang, A. Guggenmos, M.-Y. Huang, M. Zürch, K.J. Schafer, D.M. Neumark, M.B. Gaarde and S.R. Leone, Attosecond Time-Domain Measurement of Core-Level-Exciton Decay in Magnesium Oxide, Phys. Rev. Lett. 124, (20), 207401: 1-6 (2020)

  • S.D.C. Roscam Abbing, F. Campi, F.S. Sajjadian, N. Lin, P. Smorenburg and P.M. Kraus, Divergence Control of High-Harmonic Generation, Phys. Rev. Appl. 13, (5), 054029: 1-9 (2020)

  • F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan, Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography, Nature Commun. 11, (1), 2334: 1-8 (2020)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter