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Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Proceedings
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L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega,
Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method
, Eur. J. Inorg. Chem.
2019
, (38), 4136-4141 (2019)
T. de Faria Pinto, J. Mathijssen, S. Witte and K.S.E. Eikema,
An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm
, Opt. Express
27
, (21), 29829-29837 (2019)
Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson,
Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst
, Angew. Chem. Int. Ed.
131
, 14099-14106 (2019)
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma
, Appl. Phys. Lett.
115
, (12), 124101: 1-6 (2019)
S. Edward, S. Witte and P.C.M. Planken,
Verborgen uitlijntralies meten met licht en geluid
, NTvN, (2019)
S. Witte and A.J. den Boef,
Lensloze microscopie
, NTvN, (2019)
S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra and G. O’Sullivan,
Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions
, J. Phys. B: At. Mol. Opt. Phys.
52
, (17), 171002: 1-49 (2019)
G.S.M. Jansen, X. Liu, K.S.E. Eikema and S. Witte,
Broadband extreme ultraviolet dispersionmeasurements using a high-harmonic source
, Opt. Lett.
44
, (15), 3625-3628 (2019)
O.O. Versolato,
Physics of laser-driven tin plasma sources of EUV radiation for nanolithography
, Plasma Sources Sci. Technol.
28
, (8), 083001:1-17 (2019)
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Scheers, D. Kurilovich, A. Bayerle, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Efficient generation of extreme ultraviolet light from Nd:YAG-driven microdroplet-tin plasma
, Phys. Rev. Appl.
12
, (1), 014010: 1-11 (2019)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter