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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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N. Thakur, A. Giuliani, L. Nahon and S. Castellanos Ortega,
Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications
, J. Photopolym. Sci. Technol.
33
, (2), 153-158 (2020)
N. Sadegh, M.L.S. van der Geest, J. Haitjema, F. Campi, S. Castellanos Ortega, P.M. Kraus and A.M. Brouwer,
XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy
, J. Photopolymer. Sci.Tec.
33
, (2), 145-151 (2020)
O.C.M. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos Ortega,
Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers
, J. Photopolym. Sci. Technol.
33
, (2), 229-234 (2020)
F. Holtrop, A.R. Jupp, N.P. van Leest, M. Paradiz Dominguez, R.M. Williams, A.M. Brouwer, B. de Bruin, A.W. Ehlers and J.C. Slootweg,
Photoinduced and Thermal Single‐Electron Transfer to Generate Radicals from Frustrated Lewis Pairs
, Chem. Eur. J.
26
, (41), 9005-9011 (2020)
L. Helmbrecht, M. Tan, R. Röhrich, M.H. Bistervels, B.O. Kessels, A.F. Koenderink, B. Kahr and W.L. Noorduin,
Directed Emission from Self‐Assembled Microhelices
, Adv. Funct. Mater.
30
, (26), 1908218: 1-5 (2020)
H. Zhang, J.-P. Colombier and S. Witte,
Laser-induced periodic surface structures: Arbitrary angles of incidence and polarization states
, Phys. Rev. B
101
, (24), 245430: 1-15 (2020)
O.C.M. Lugier, U. Pokharel and S. Castellanos Ortega,
Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films.
, Cryst. Growth Des.
20
, (8), 5302-5309 (2020)
J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap
, Phys. Rev. A
101
, (6), 062511: 1-11 (2020)
O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte,
Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography
, J. Phys.: Conf. Ser.
1412
, (19), 192006:1-1 (2020)
R. Géneaux, C.J. Kaplan, L. Yue, A.D. Ross, E. Bækhøj, P.M. Kraus, H.-T. Chang, A. Guggenmos, M.-Y. Huang, M. Zürch, K.J. Schafer, D.M. Neumark, M.B. Gaarde and S.R. Leone,
Attosecond Time-Domain Measurement of Core-Level-Exciton Decay in Magnesium Oxide
, Phys. Rev. Lett.
124
, (20), 207401: 1-6 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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More
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