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    • Mission and vision
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    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • G.C. Dong, Y. Zhang and J.W.M. Frenken, Formation of a monolayer h-BN nanomesh on Rh (111) studied using in-situ STM, Sci.China-Phys.Mech.Astron. 61, (7), 076811: 1-6 (2018)

  • S.A. Reijers, D. Kurilovich, F. Torretti, H. Gelderblom and O.O. Versolato, Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light, J. Appl. Phys 124, (1), 013102: 1-7 (2018)

  • P.M. Kraus, M. Zürch, S.K. Cushing, D.M. Neumark and S.R. Leone, The ultrafast X-ray spectroscopic revolution in chemical dynamics, Nat. Rev. Chem. 2, (6), 82-94 (2018)

  • Y. Zhang, J. Haitjema, M. Baljozovic, M. Vockenhuber, D. Kazazis, T. Jung, Y. Ekinci and A.M. Brouwer, Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure, J. Photopolymer. Sci.Tec. 31, (2), 249-255 (2018)

  • J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, Photo-Induced Fragmentation of a Tin-Oxo Cage Compound, J. Photopolymer. Sci.Tec. 31, (2), 243-247 (2018)

  • G.S.M. Jansen, A.C.C. de Beurs, X. Liu, K.S.E. Eikema and S. Witte, Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging, Opt. Express 26, (10), 12479-12489 (2018)

  • R. Fallica, J. Haitjema, L. Wu, S. Castellanos Ortega, A.M. Brouwer and Y. Ekinci, Absorption coefficient of metal-containing photoresists in the extreme ultraviolet, J. of Micro/Nanolithography. MEMS and MOEMS 17, (2), 023505: 1-7 (2018)

  • B. Weber, Y. Nagata, S. Ketzetzi, F. Tang, W.J. Smit, H.J. Bakker, E.H.G. Backus, D. Bonn and M. Bonn, Molecular Insight into the Slipperiness of Ice, J. Phys. Chem. Lett. 9, (11), 2838-2842 (2018)

  • C.J. Kaplan, P.M. Kraus, A.D. Ross, M. Zürch, S.K. Cushing, M.F. Jager, H.-T. Chang, E.M. Gullikson, D.M. Neumark and S.R. Leone, Femtosecond tracking of carrier relaxation in germanium with extreme ultraviolet transient reflectivity, Phys.Rev.B 97, (20), 205202: 1-9 (2018)

  • R.V. Mom, O. Ivashenko, J.W.M. Frenken, I.M.N. Groot and A.O. Sjastad, Nucleation, Alloying, and Stability of Co–Re Bimetallic Nanoparticles on Al2O3/NiAl(110), J. Phys. Chem. C 122, (16), 8967-8975 (2018)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter