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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Kirschner, A.H.A. Gomes, R.R.T. Marinho, O. Björneholm, H. Ågren, V. Carravetta, N. Ottosson, A.N. de Brito and H.J. Bakker,
The molecular structure of the surface of water–ethanol mixtures
, Phys. Chem. Chem. Phys.
23
, 11568-11578 (2021)
F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin,
Tracing single asperity wear in relation to macroscale friction during running-in
, Tribol.Int.
162
, 107108: 1-9 (2021)
Y. Zhang, J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, N. Sadegh, R. Ovsyannikov, E. Giangrisostomi, F.O.L. Johansson, E. Berggren, A. Lindblad and A.M. Brouwer,
Extreme ultraviolet photoemission of a tin-based photoresist
, Appl. Phys. Lett.
118
, (17), 171903: 1-6 (2021)
F.M. Elam, F.-C. Hsia, S. van Vliet, R. Bliem, L. Yang, B. Weber and S.E. Franklin,
The influence of corrosion on diamond-like carbon topography and friction at the nanoscale
, Carbon
179
, 590-599 (2021)
M. Aarts, S. van Vliet, R. Bliem and E. Alarcón-Lladó,
Investigation of copper nanoscale electro-crystallization under directed and non-directed electrodeposition from dilute electrolytes
, CrystEngComm
23
, (20), 3648-3653 (2021)
J.S. van den Burgt, C.D. Dieleman, E. Johlin, J.J. Geuchies, A.J. Houtepen, B. Ehrler and E.C. Garnett,
Integrating Sphere Fourier Microscopy of Highly Directional Emission
, ACS Photonics
8
, (4), 1143-1151 (2021)
R. Schupp, L. Behnke, J. Sheil, Z. Bouza, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Characterization of 1- and 2−μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light
, Phys. Rev. Res.
3
, (1), 013294: 1-9 (2021)
R. Röhrich, A.F. Koenderink, S. Witte and L. Loetgering,
Spatial coherence control and analysis via micromirror-based mixed-state ptychography
, New J. Phys.
23
, 053016: 1-15 (2021)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Ptychographic optical coherence tomography
, Opt. Lett.
46
, (6), 1337-1340 (2021)
R. Röhrich and A.F. Koenderink,
Double moiré localized plasmon structured illumination microscopy
, Nanophotonics
10
, (3), 1107-1121 (2021)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter