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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications - Articles

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  • C. Xiao, S. van Vliet, R. Bliem, B. Weber and S.E. Franklin, Electrochemically-stimulated nanoscale mechanochemical wear of silicon, Friction 11, (2023)

  • W. Li, K. Abrashitova and L.V. Amitonova, Super-resolution multimode fiber imaging with an untrained neural network, Opt. Lett. 48, (13), 3363-3366 (2023)

  • N. Sadegh, Q. Evrard, N. Mahne, A. Giglia, S. Nannarone and A.M. Brouwer, Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists, J. Photopolym. Sci. Technol. 36, (5), 373-378 (2023)

  • F. Cassin, R. Hahury, T. Lançon, S.E. Franklin and B. Weber, The nucleation, growth, and adhesion of water bridges in sliding nano-contacts, J. Chem. Phys. 158, (22), 224703: 1-8 (2023)

  • P.C.M. Laan, F.J. de Zwart, E.M. Wilson, A. Troglia, O.C.M. Lugier, J.G. Norbert, R. Bliem, J.N.H. Reek, B. de Bruin, G. Rothenberg and N. Yan, Understanding the Oxidative Properties of Nickel Oxyhydroxide in Alcohol Oxidation Reactions, ACS Catal. 13, (13), 8467-8476 (2023)

  • M. Adhikary, T. van Gardingen-Cromwijk, de Wit, S. Witte, J.F. de Boer and A.J. den Boef, Illumination spot profile correction in digital holographic microscopy for overlay metrology, J. Micro/Nanopattern. Mater. Metrol. 22, (2), 024001: 1-14 (2023)

  • T.J. van den Hooven and P.C.M. Planken, Surface-plasmon-enhanced strain-wave-induced optical diffraction changes from a segmented grating, Photoacoustics 31, 100497: 1-13 (2023)

  • B. Lochocki, A. Ivanina, A. Bandhoe, J.F. de Boer and L.V. Amitonova, Swept-source multimode fiber imaging, Sci. Rep 13, (1), 8071: 1-9 (2023)

  • J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte, Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics, Appl. Phys. B- Lasers O 129, 91: 1-11 (2023)

  • Y. Huo, M.K. Espinoza Cangahuala, V. Zamudio-Bayer, M. Goulart, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter, An X-ray spectroscopy study of structural stability of superhydrogenated pyrene derivatives, MNRAS 523, (1), 865-875 (2023)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter