Publications - ARCNL

P.C.M. Laan, F.J. de Zwart, E.M. Wilson, A. Troglia, O.C.M. Lugier, J.G. Norbert, R. Bliem, J.N.H. Reek, B. de Bruin, G. Rothenberg and N. Yan, Understanding the Oxidative Properties of Nickel Oxyhydroxide in Alcohol Oxidation Reactions, ACS Catal. 13, (13), 8467-8476 (2023)
F. Cassin, R. Hahury, T. Lançon, S.E. Franklin and B. Weber, The nucleation, growth, and adhesion of water bridges in sliding nano-contacts, J. Chem. Phys. 158, (22), 224703: 1-8 (2023)
M. Adhikary, T. van Gardingen-Cromwijk, de Wit, S. Witte, J.F. de Boer and A.J. den Boef, Illumination spot profile correction in digital holographic microscopy for overlay metrology, J. Micro/Nanopattern. Mater. Metrol. 22, (2), 024001: 1-14 (2023)
T.J. van den Hooven and P.C.M. Planken, Surface-plasmon-enhanced strain-wave-induced optical diffraction changes from a segmented grating, Photoacoustics 31, 100497: 1-13 (2023)
B. Lochocki, A. Ivanina, A. Bandhoe, J.F. de Boer and L.V. Amitonova, Swept-source multimode fiber imaging, Sci. Rep 13, (1), 8071: 1-9 (2023)
J. Mathijssen, Z. Mazzotta, A.M. Heinzerling, K.S.E. Eikema and S. Witte, Material-specific high-order harmonic generation in laser-produced plasmas for varying plasma dynamics, Appl. Phys. B- Lasers O 129, 91: 1-11 (2023)
Y. Huo, M.K. Espinoza Cangahuala, V. Zamudio-Bayer, M. Goulart, M. Kubin, M. Timm, J.T. Lau, B. von Issendorff, R. Hoekstra, S. Faraji and T. Schlathölter, An X-ray spectroscopy study of structural stability of superhydrogenated pyrene derivatives, MNRAS 523, (1), 865-875 (2023)
Q. Evrard, N. Sadegh, C.-C. Hsu, N. Mahne, A. Giglia, S. Nannarone, Y. Ekinci, M. Vockenhuber, A. Nishimura, T. Goya, T. Sugioka and A.M. Brouwer: Influence of the anion in tin-based EUV photoresists properties In: Advances in Patterning Materials and Processes XL 12498, SPIE-Intl Soc Optical Eng, 2023.
D.J. Hemminga, L. Poirier, J. Hernandez-Rueda, B. Liu, A.C. Lassise, R. Hoekstra, J. Sheil and O.O. Versolato: Tin fluid dynamics driven by laser-produced plasmas relevant to EUV nanolithography In: Proceedings of SPIE 12494 ,Optical and EUV Nanolithography XXXVI, SPIE-Intl Soc Optical Eng, 2023.
L. Loetgering, M. Du, D.E. Boonzajer Flaes, T. Aidukas, F. Wechsler, D. Penagos Molina, M. Rose, A. Pelekanidis, W. Eschen, J. Hess, T. Wilhein, R. Heintzmann, J. Rothhardt and S. Witte, PtyLab.m/py/jl: a cross-platform, open-source inverse modeling toolbox for conventional and Fourier ptychography, Opt. Express 31, (9), 13763-13797 (2023)

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