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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • A. Pelekanidis, F. Zhang, M. Gouder, J. Seifert, M. Du, K.S.E. Eikema and S. Witte, Illumination diversity in multiwavelength extreme ultraviolet ptychography, Photon. Res. 12, (12), 2757-2771 (2024)

  • M. Verhage, H.T. Çiftçi, M. Reul, T.C. Cromwijk, T.J.N. van Stralen, B. Koopmans, O. Kurnosikov and K. Flipse, Switchable-magnetization planar probe MFM sensor for imaging magnetic textures of complex metal oxide perovskite, J. Appl. Phys. 136, (18), 184504: 1-10 (2024)

  • F. Zhang, A. Pelekanidis, A. Karpavicius, M. Gouder, J. Seifert, K.S.E. Eikema and S. Witte, Characterizing post-compression of mJ-level ultrafast pulses via loose focusing in a gas cell, Opt. Express 32, (23), 40990-40990 (2024)

  • S. Payá, N. Diez, J. Cottom, E. Olsson and M. Sevilla, MgSO4 as an Effective, Low-Temperature Sulfur Dopant for Carbon Materials Enabling Fast Sodium Storage, ACS Appl. Energy Mater. 7, (21), 10061-10072 (2024)

  • Z. Lyu and L.V. Amitonova, Wavefront shaping and imaging through a multimode hollow-core fiber, Opt. Express 32, (21), 37098: 1-10 (2024)

  • F. Bijloo, K. Murzyn, F. van Emmerik, A.J. den Boef, P.M. Kraus and A.F. Koenderink, Near-Unity All-Optical Modulation of Third-Harmonic Generation with a Fano-Resonant Dielectric Metasurface, Nano Lett. 24, (41), 12942-12947 (2024)

  • I. Babenko, Y. Mostafa, Z. Bouza, O.O. Versolato and M. Bayraktar, Spectral and spatial resolution of an extreme ultraviolet broadband imaging spectrometer based on dispersion-matched zone plates, AIP Advances 14, (10), 105021: 1-7 (2024)

  • S.D.C. Roscam Abbing, N. Kuzkova, van der Linden, F. Campi, B. de Keijzer, C. Morice, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus, Enhancing the efficiency of high-order harmonics with two-color non-collinear wave mixing in silica, Nature Commun. 15, (1), 8355: 1-7 (2024)

  • T. van Gardingen-Cromwijk, S. Konijnenberg, S. Witte, J.F. de Boer and A.J. den Boef, Computational vibration mitigation using phase interpolation in digital holographic microscopy for overlay metrology, Opt. Express 32, (21), 36315-36328 (2024)

  • J.H. Buss, S. Starosielec, M. Schulz, R. Riedel, F. Campi, C.S. Lehmann, S. Witte and P.M. Kraus, Mid-infrared optical parametric chirped-pulse amplifier at 50 W and 38 fs pumped by a high-power Yb-InnoSlab platform, Opt. Express 32, (21), 36185-36192 (2024)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter