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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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P. van Essen, B. de Keijzer, T. Horen, E.B. Molinero, A. Jiménez Galán, R.E.F. Silva and P.M. Kraus,
Spatial polarization gating of high-harmonic generation in solids
, Phys. Rev. Res.
7
, (1), L012063: 1-6 (2025)
L. Oltra, L. Méndez, I. Rabadán, K. Bijlsma, E. de Wit and R. Hoekstra,
Sequential Synchronous Mechanism for Double-Electron Capture: Insights into Unforeseen Large Cross Sections in Low-Energy Sn3++H2 Collisions
, Phys. Rev. Lett.
134
, (9), 093002: 1-6 (2025)
L. Kemme,
A Molecular Dynamics Study of the Elastic Properties of Cu-Zr-Al Metallic Glasses
, University of Amsterdam, 2025-03-04
A. Pelekanidis, F. Zhang, K.S.E. Eikema and S. Witte,
Generation Dynamics of Broadband Extreme Ultraviolet Vortex Beams
, ACS Photonics
12
, (3), 1638-1649 (2025)
C. Leriche,
Visualizing, quantifying, and understanding nanowear of multi-asperity contacts
, University of Amsterdam, 2025-02-25
M. Noordam, T. van Gardingen-Cromwijk and A.J. den Boef,
Diffraction-based overlay metrology using polarization-resolved dark-field digital holographic microscopy
, J. Micro/Nanopattern. Mater. Metrol.
24
, (01), 014002: 1-13 (2025)
T.J. van den Hooven and P.C.M. Planken,
Wavelength-dependent optical detection of strain waves near intrinsic and artificial optical resonances
, Opt. Lett.
50
, (5), 1445-1448 (2025)
J. Kim, T. van Gardingen-Cromwijk, M. Noordam, M. Adhikary, J.F. de Boer, C. Park, Y. Kang and A.J. den Boef,
Correcting spurious apodization effects in digital holographic microscopy using a simple Fourier transform spectrometer
, Opt. Continuum
4
, (2), 382-395 (2025)
J. Gonzalez and J. Sheil,
Langdon effect in the realm of extreme ultraviolet source plasmas
, Phys. Rev. E
111
, (2), L023201: 1-6 (2025)
E. de Wit, L. Tinge, K. Bijlsma and R. Hoekstra,
Single and Double Electron Capture by 1–16 keV Sn4+ Ions Colliding on H2
, Atoms
13
, (2), 12: 1-9 (2025)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
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Events
Repository
Contact
ARCNL Newsletter