Prizes for ARCNL students

Published on September 9, 2019
Categories Contact Dynamics, EUV Photoresists

Last week two ARCNL students won prizes for their contribution to international conferences.

At the ELENA conference in Leuven (Belgium) Neha Thakur got the prize for Best Student Talk. Thakur is a PhD student in the EUV Photoresist group led by Sonia Castellanos. The ELENA conference brings together researchers in the field of Low energy ELEctron driven chemistry for the advantage of emerging NAno-fabrication methods.

In the same week Feng-Chun Hsia was awarded second prize for his poster at the Leeds-Lyon tribology conference in Lyon. Hsia is a PhD student in the Contact Dynamics group led by Steve Franklin.

Neha Thakur
Feng-Chun Hsia