ARCNL one step closer to Extreme Ultraviolet light (EUV)

Published on May 19, 2015
Category EUV Plasma Processes

ARCNL researchers recently generated plasma in the ARCNL extreme ultraviolet (EUV) generating source.

The researchers used a powerful laser beam to hit a number of small indium-tin droplets turning them into a vapour. ARCNL postdoc Oscar Versolato reports, “we are now only a small step away from realizing a fully functioning model source”. This achievement forms the basis for future studies in the EUV Plasma Dynamics group.

The movie shows how a small droplet (bright, white spot) turns into a much bigger pancake shape of molten metal, after it has been hit from the right by the infrared laser.