NWO Vidi grant awarded to Oscar Versolato

Published on May 30, 2017
Category EUV Plasma Processes

ARCNL group leader Oscar Versolato has been awarded a NWO Vidi grant. This grant enables Versolato to study the physics of plasma sources of extreme ultraviolet (EUV) light for nanolithography. NWO has awarded a total of 89 experienced researchers a Vidi grant that is worth 800.000 euros. 

Nanolithography with extreme-ultraviolet  light will enable shrinking chips to ever smaller sizes. However, the generation of EUV light remains a challenge. When asked about his motivation Versolato says, “I intend to meet this challenge by building a strong scientific base that will underpin more stable and powerful laser-produced plasma sources of EUV light.”

The NWO Vidi grant is aimed at experienced researchers who have carried out successful research for a number of years after obtaining their PhDs. Together with Veni and Vici, Vide is part of the NWO Talent Scheme. Researchers in the NWO Talent Scheme are free to submit their own subject for funding. NWO thus encourages curiosity-driven and innovative research.

More information on this year’s Vidi grants at the NWO website.