Publications - ARCNL

Materials and Surface Science for EUV Lithography

Group leader: Dr. Roland Bliem

N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos, Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography, J.Mater.Chem.C, (2020)
O. Lugier, A. Troglia, N. Sadegh, L. Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Tec. 33, 2: 229-234 (2020)
D. Kim, R. Bliem, F. Hess, J.-J. Gallet and B. Yildiz, Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3, JACS 142, 7: 3548-3563 (2020)
Z. Jakub, J. Hulva, P.T.P. Ryan, D.A. Duncan, D.J. Payne, R. Bliem, M. Ulreich, P. Hofegger, F. Kraushofer, M. Meier, M. Schmid, U. Diebold and G.S. Parkinson, Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst, Nanoscale 12, 10: 5866-5875 (2020)
Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst, Angew. Chem. Int. Ed. 131, 14099-14106 (2019)
Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson, Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water, J. Phys. Chem. C 123, 24: 15038-15045 (2019)
J. Wang, S.N. Bishop, L. Sun, Q. Lu, G. Vardar, R. Bliem, N. Tsvetkov, E.J. Crumlin, J.-J. Gallet, F. Bournel, I. Waluyo and B. Yildiz, Threshold catalytic onset of carbon formation on CeO2 during CO2 electrolysis: mechanism and inhibition, J. Mater. Chem. A 7, 25: 15233-15243 (2019)

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