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Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
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Materials and Surface Science for EUV Lithography
Group leader:
Dr. Roland Bliem
Materials & Surface Science
for EUVL
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Latest Publications
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H.C. Hendrikse, A. van der Weijden, M. Ronda‐Lloret, T. Yang, R. Bliem, R.N. Shiju, M. van Hecke, L. Li and W.L. Noorduin,
Shape‐Preserving Chemical Conversion of Architected Nanocomposites
, Adv.Mater., 2003999: 1-7 (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos,
Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
, J.Mater.Chem.C
8
, 41: 14499-14506 (2020)
J. Biemolt, D. van Noordenne, J.W. Liu, E. Antonetti, M. Leconte, S. van Vliet, R. Bliem, G. Rothenberg, X.-Z. Fu and N. Yan,
Assembling Palladium and Cuprous Oxide Nanoclusters into Single Quantum Dots for the Electrocatalytic Oxidation of Formaldehyde, Ethanol, and Glucose
, ACS Appl. Nano. Mater.
3
, 10: 10176-10182 (2020)
O. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos,
Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers
, J. Photopolym. Sci. Tec.
33
, 2: 229-234 (2020)
D. Kim, R. Bliem, F. Hess, J.-J. Gallet and B. Yildiz,
Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3
, JACS
142
, 7: 3548-3563 (2020)
Z. Jakub, J. Hulva, P.T.P. Ryan, D.A. Duncan, D.J. Payne, R. Bliem, M. Ulreich, P. Hofegger, F. Kraushofer, M. Meier, M. Schmid, U. Diebold and G.S. Parkinson,
Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst
, Nanoscale
12
, 10: 5866-5875 (2020)
Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson,
Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst
, Angew. Chem. Int. Ed.
131
, 14099-14106 (2019)
Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson,
Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water
, J. Phys. Chem. C
123
, 24: 15038-15045 (2019)
J. Wang, S.N. Bishop, L. Sun, Q. Lu, G. Vardar, R. Bliem, N. Tsvetkov, E.J. Crumlin, J.-J. Gallet, F. Bournel, I. Waluyo and B. Yildiz,
Threshold catalytic onset of carbon formation on CeO2 during CO2 electrolysis: mechanism and inhibition
, J. Mater. Chem. A
7
, 25: 15233-15243 (2019)
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Mission
Mission and vision
Mission
About
Research
Source department
EUV Plasma Processes
Oscar Versolato
Ronnie Hoekstra
Wim Ubachs
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Nanolayers
Joost Frenken
Contact Dynamics
Bart Weber
Steve Franklin
EUV Photoresists
Fred Brouwer (a.i.)
Materials and Surface Science for Extreme Ultraviolet Lithography
Roland Bliem
Nanophotochemistry
Fred Brouwer
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
How to apply
Coming from abroad
More
More
People
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Events
Repository
Contact & Directions
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