Phd – student: Ultrafast photoacoustics for semiconductor metrology

Work Activities

Background

In semiconductor device manufacturing, optical metrology tools are used determine the position of a Si wafer by measuring light, scattered from so-called alignment markers. When these markers become covered in materials that are optically opaque, measuring scattered light becomes a challenge. A possible solution to that challenge is the use of photoacoustics. There, a pump pulse rapidly heats up an absorbing material, launching a strain wave in the process. That strain wave propagates to and reflects off the marker, creating a strain-wave copy. At the surface, light measures this strain wave copy of the marker allowing us to indirectly observe the hidden markers. The process works, but signal strength must be improved to make real-world applications possible.

Project goal

In this project you will work towards improving the signal-to-noise ratio in photoacoustics by using hitherto underexplored techniques, aimed at both increasing signal strength and decreasing noise. This can for example be done by optimizing the optical wavelengths used for the generation and detection of the strain waves and by using optical transitions to enhance detection sensitivity.                                                                                                                                                             

After you join our group, your goal is to design and execute photoacoustics experiments aimed to generate and detect strain waves with femtosecond laser pulses, and to improve the detection signal-to-noise ratio. You will learn to work with high-power femtosecond lasers to perform ultrafast time-resolved reflection and diffraction experiment for the generation and detection of strain waves. You will get acquainted with nonlinear optics, perform experiments on relevant materials, and learn how to analyze your data. The research will be done in close collaboration with the ASML research department.

Qualifications

You have (or soon will have) a MSc degree in physics, chemistry, or materials science or equivalent, to satisfy the Dutch university requirement to enter a PhD program. Previous experience with femtosecond lasers is not required but it would be a plus. An interest in non-linear optics, materials science and chemistry is needed, as are critical thinking, and creative problem-solving skills. Good verbal and written communication skills in English are required.

Work environment

The Advanced Research Center for Nanolithography (ARCNL) focuses on the fundamental physics and chemistry involved in current and future key technologies in nanolithography, primarily for the semiconductor industry. ARCNL is a public-private partnership between the Dutch Research Council (NWO), the University of Amsterdam (UvA), the VU University Amsterdam (VU), associate partner the University of Groningen (RuG), and the semiconductor equipment manufacturer ASML. ARCNL is located at the Amsterdam Science Park, The Netherlands, and has a size of approximately 100 scientists and support staff. See also www.arcnl.nl.

About the Light/Matter Interaction group

The research activities of the Light/Matter Interaction group focus on the optical and terahertz response of materials within the context of photo-acoustics and light-induced damage.

Working conditions

The position is intended as full-time (40 hours / week, 12 months / year) appointment in the service of the Netherlands Foundation of Scientific Research Institutes (NWO-I) for the duration of four years, with a starting salary of gross € 2.968,- per month and a range of employment benefits. After successful completion of the PhD research a PhD degree will be granted at a Dutch University. Several courses are offered, specially developed for PhD-students. ARCNL assists any new foreign PhD-student with housing and visa applications and compensates their transport costs and furnishing expenses.

More information?

For further information about the position, please contact Paul Planken: p.planken@arcnl.nl 

Application

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Diversity code

ARCNL is highly committed to an inclusive and diverse work environment: we want to develop talent and creativity by bringing together people from different backgrounds and cultures. We recruit and select on the basis of competencies and talents. We strongly encourage anyone with the right qualifications to apply for the vacancy, regardless of age, gender, origin, sexual orientation or physical ability.

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