In the lab for Materials and Surface Science for EUV Lithography the long awaited setup for thin-film growth using pulsed laser deposition (PLD) has recently been installed. The new setup …
In a well-attended Zoom-session for all employees of ARCNL, Pim Stalenhoef from the company MonitorGroep presented the results of the Working Conditions Survey that his company conducted in May among …
Researchers at ARCNL have found a way to detect nanostructures buried under many layers of opaque material, using very high frequency sound waves induced by light. Their findings are promising …
After several months of strongly reduced presence, due to the corona crisis, 1 July marked the point where ARCNL was back to admitting 50% of its people in the Matrix …
Yesterday, ASML published on their website a very interesting story about Arie den Boef’s research: The future of metrology is powered by algorithms. Den Boef developed YieldStar metrology and is …
In June two PhD students of ARCNL successfully defended their theses at the University of Amsterdam. Because of the Covid-19 measures their PhD defenses were held online through ZOOM. On …
Extreme ultraviolet light (EUV light) does not naturally occur on earth, but it can be produced. In the latest nanolithography machines, that is realized using an immensely hot tin plasma.
Researchers at ARCNL and Vrije Universiteit Amsterdam have developed a compact setup for fast, super-resolution microscopy through an ultrathin fiber. Using smart signal processing, they beat the theoretical limits of …
Over the years, the focus of the research group of Paul Planken has shifted so much that its original name EUV Targets group no longer reflects the scientific focus of …
