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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Olivier Lugier defends PhD thesis

    June 15, 2021

    On June 3rd Olivier Lugier successfully defended his thesis ‘Surface-mounted metal-organic frameworks for extreme ultraviolet lithography’at the University of Amsterdam (UvA). Lugier did his doctoral research in the EUV Photoresists …

  • Vanessa Verrina defends PhD thesis

    April 16, 2021

    On April 6th Vanessa Verrina successfully defended her thesis ‘Laser-induced ultrasound for the detection of buried micro- and nano-structures’ at the University of Amsterdam. Verrina did her doctoral research in …

  • PhD defense Ruben Schupp

    March 29, 2021

      On Wednesday, March 17th PhD student Ruben Schupp defended his thesis ‘Spectral characterization of solid-state laser-driven plasma sources of EUV light’ at the Vrije Universiteit in Amsterdam. Schupp performed …

  • ARCNL Newsletter 10

    February 19, 2021

    ARCNL proudly presents Newsletter 10 with highlights of the past months. Click here to open the newsletter …

  • Editor’s choice Applied Physics A

    January 26, 2021

    The journal Applied Physics A has selected a publication from the EUV Generation and Imaging group led by Stefan Witte as this month’s Editor’s Choice. First author Tiago Pinto and …

  • Spreading focus for better imaging

    January 25, 2021

    Extreme Ultraviolet (EUV) light in microscopy offers the advantage of obtaining a high-resolution image combined with spectral information about the object under study. However, because EUV microscopy uses diffraction instead …

  • Season’s greetings

    December 23, 2020

    Season’s greetings from ARCNL …

  • ARCNL groups receive OTP grant

    December 22, 2020

    In December, the groups of Peter Kraus and Stefan Witte received an Open Technology Programme (OTP) grant for the project ‘Ultrafast metrology of semiconductor nanostructures with a next-generation table-top soft-X-ray …

  • ‘Ondernemende Onderzoekers’ interview in NWO magazine

    December 21, 2020

    This fall NWO published in their magazine Onderzoek an interview with Bart Noordam (ASML) and Joost Frenken (ARCNL). The article illustrates how the academic and industrial partners look at their …

  • Ruslan Röhrich PhD defense

    December 18, 2020

    On December 11th, PhD student Ruslan Röhrich successfully defended his thesis ‘Unconventional metrology: merging nanophotonics with computational imaging’ at the University of Amsterdam. Röhrich worked on a joint research project …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter