The journal Applied Physics A has selected a publication from the EUV Generation and Imaging group led by Stefan Witte as this month’s Editor’s Choice. First author Tiago Pinto and …
Extreme Ultraviolet (EUV) light in microscopy offers the advantage of obtaining a high-resolution image combined with spectral information about the object under study. However, because EUV microscopy uses diffraction instead …
In December, the groups of Peter Kraus and Stefan Witte received an Open Technology Programme (OTP) grant for the project ‘Ultrafast metrology of semiconductor nanostructures with a next-generation table-top soft-X-ray …
This fall NWO published in their magazine Onderzoek an interview with Bart Noordam (ASML) and Joost Frenken (ARCNL). The article illustrates how the academic and industrial partners look at their …
On December 11th, PhD student Ruslan Röhrich successfully defended his thesis ‘Unconventional metrology: merging nanophotonics with computational imaging’ at the University of Amsterdam. Röhrich worked on a joint research project …
On November 18th PhD student Lianjia Wu obtained the doctorate degree after defending her thesis ‘Metal oxo clusters: molecular design for extreme ultraviolet lithography’ at the University of Amsterdam. The …
On Tuesday, November 10th, Joris Scheers successfully defended his thesis Charge-state-resolved spectroscopy of multiply-charged tin ions at the Vrije Universiteit Amsterdam. Scheers did his doctoral research in the EUV Plasma …
Group leader Peter Kraus is one of the fifteen technical talents (Techniektalenten) of 2020 in the Netherlands, that were identified by the Dutch technical journal De Ingenieur. Fundamental science research …
De jaarlijkse open dag op zaterdag 3 oktober was dit jaar een online editie op ZOOM. Wim Symens (ASML) en Joost Frenken (ARCNL) gaven een lezing over computer- en geheugenchips …
