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      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
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      • Nanolayers Joost Frenken
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  • Oscar Versolato starts new research group “Atomic Plasma Processes”

    October 20, 2015

    On October 1st, ARCNL appointed Oscar Versolato as tenure track group leader of the new research group Atomic Plasma Processes. The group studies the atomic processes involved in the generation …

  • ARCNL celebrates independency

    September 10, 2015

    For a year and a half ARCNL operated as a department of FOM Institute AMOLF, taking advantage of the mother organization and growing rapidly. On September 3rd, ARCNL and AMOLF …

  • Niklas Ottosson starts new research group “EUV Photoemission”

    August 10, 2015

    As of August 1, Niklas Ottosson has been appointed as tenure track group leader at ARCNL and AMOLF. The start of the EUV Photoemission group marks the start of a …

  • ARCNL welcomes students at first Meet-Up@ARCNL event

    May 21, 2015

    On Monday, May 18th, ARCNL held its first Meet-Up@ARCNL event for students looking for master and PhD projects. The group of approximately 20 students in physics and chemistry had been …

  • ARCNL one step closer to Extreme Ultraviolet light (EUV)

    May 19, 2015

    ARCNL researchers recently generated plasma in the ARCNL extreme ultraviolet (EUV) generating source. The researchers used a powerful laser beam to hit a number of small indium-tin droplets turning them …

  • ERC Advanced Grant for ARCNL group leader Wim Ubachs

    May 7, 2015

    Wim Ubachs was awarded an ERC Advanced Grant of 2.5 million Euro for his proposal “Physics Beyond the Standard Model from Molecules”. Ubachs will use his grant to measure very …

  • ARCNL at Hannover Messe

    April 20, 2015

    Last week ARCNL presented itself at the Holland High Tech House of Hannover Messe. NWO coordinated the Dutch presence showing technological achievements in the Netherlands. Among the visitors was Henk …

  • Joost Frenken appointed as professor in ‘Nanoscale Surface Physics’ at VU and UvA

    February 10, 2015

    ARCNL director and group leader Joost Frenken has been appointed as professor in ‘Nanoscale Surface Physics’ both at the VU University Amsterdam and at the University of Amsterdam. The appointment …

  • ARCNL at FOM Veldhoven

    January 26, 2015

    On Tuesday, January 20th ARCNL made its first presence at the big stage of Physics@FOM meeting in Veldhoven. The annual conference of the Dutch physics community proved to be an …

  • ERC Starting Grant for ARCNL group leader Stefan Witte

    November 27, 2014

    Stefan Witte was awarded an ERC Starting Grant of 1.5 million Euro for his proposal “High-resolution microscopy without lenses: a new generation of imaging technology”. The Starting Grants of the …

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© ARCNL 2021

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Ronnie Hoekstra Wim Ubachs
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Nanolayers Joost Frenken
      • Contact Dynamics Bart Weber Steve Franklin
      • EUV Photoresists Fred Brouwer (a.i.)
      • Materials and Surface Science for Extreme Ultraviolet Lithography Roland Bliem
      • Nanophotochemistry Fred Brouwer
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter