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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • ARCNL Newsletter October 2021

    October 22, 2021

    Just published: our ARCNL Newsletter October 2021. With highlights of the past months.

  • NWO Rubicon grant for Igor Milov

    October 13, 2021

    On October 4th Igor Milov received a Rubicon Grant from the Dutch Research Council (NWO). With this grant Milov will investigate phase transitions in nanoparticles and thin films induced by …

  • Open Day 2021

    October 8, 2021

    On October 2nd ARCNL participated in the Amsterdam Science Park Open Day, welcoming the general public in the labs and in the main lecture room on campus. Because of the …

  • Two ARCNL publications highlighted

    October 7, 2021

    Two ARCNL publications were recently highlighted by the editors of the two journals: The Editorial Board of Physical Chemistry Chemical Physics (PCCP) selected the publication UV and VUV-induced fragmentation of …

  • Enhancing sound-wave-induced reflection measurements

    October 6, 2021

    ARCNL researchers use plasmonic resonance to amplify tiny changes in reflection To extract information from very subtle changes in a signal, researchers either have to measure over a long period, …

  • PhD Defense Randy Meijer

    October 6, 2021

    On October 4th Randy Meijer successfully defended his thesis ‘Tailored Laser-Droplet Interaction for Target Formation in Extreme Ultraviolet Sources’ at Vrije Universiteit. Meijer was a PhD student in the group …

  • Start of two new tenure track group leaders

    September 6, 2021

    On September 1st ARCNL welcomes two new tenure track group leaders: Emilia Olsson and John Sheil. Both of them have been appointed at an ARCNL partner university, respectively at the …

  • ARCNL publication selected as 2021 PCCP HOT Article

    August 23, 2021

    Editors and referees of the journal Physical Chemistry Chemical Physics have selected a publication by PhD student Neha Thakur for the journal’s online rolling collection of hottest work. The open …

  • Two PhD defenses on June 30th

    July 2, 2021

    June has been a busy month for ARCNL, with a record number of four PhD defenses in one month. The final two defenses took place on June 30th: Cristina Sfiligoj …

  • Mengqi Du PhD defense

    June 24, 2021

    On June 9th Mengqi Du successfully defended her thesis ‘Computational Depth-resolved Imaging and Metrology’ at the Vrije Universiteit. Du did her doctoral research in the EUV Generation & Imaging group …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter