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      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
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      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • ARCNL involved in large ‘Perspectief’ program on lensless imaging

    November 23, 2017

    Six new ‘Perspectief’ programs have been given the green light by NWO, Netherlands Organisation for Scientific Research. The programs should lead to a new 3D printer for large metal components, …

  • ARCNL delivers its first young doctor!

    October 18, 2017

    On Wednesday, 18 October, 2017 at 4.15 pm, ARCNL PhD student Pavel Antonov will defend his PhD thesis on new methods to drastically lower friction and wear by the use …

  • EU H2020-INFRADEV funding for Ronnie Hoekstra

    September 19, 2017

    Ronnie Hoekstra (ARCNL group leader) received EU funding for his work on the dynamics of the electron beam driving an X-ray light source. The grant was awarded to the consortium …

  • Fred Brouwer receives award in Japan

    September 15, 2017

    At this year’s conference of the Japanese Photochemistry Association in Sendai, ARCNL group leader Fred Brouwer received the prestigious Honda-Fujishima Lectureship Award. This award is handed out each year to …

  • Latest issue ARCNL Newsletter

    June 9, 2017

    ARCNL proudly presents the 5th newsletter of the Advanced Research Center for Nanolithography (ARCNL) with highlights of the past six months. Click here to open newsletter …

  • 1st pile new building

    June 7, 2017

    An important step has been taken towards permanent housing for ARCNL. On June 6th Christa Hooijer (director NWO-I) and Joost Frenken (director ARCNL) performed the honorable task of driving the …

  • NWO Vidi grant awarded to Oscar Versolato

    May 30, 2017

    ARCNL group leader Oscar Versolato has been awarded a NWO Vidi grant. This grant enables Versolato to study the physics of plasma sources of extreme ultraviolet (EUV) light for nanolithography.

  • Teacher and researcher Carin Werner-IJgosse about her experiences at ARCNL

    May 24, 2017

    Once a week high school chemistry teacher Carin Werner-IJgosse works at ARCNL as a researcher in the group EUV Photo resists. She is financially supported by the programme ‘Leraar in …

  • Joost Frenken wins the MRS Innovation in Materials Characterization Award

    April 21, 2017

    ARCNL director and group leader Joost Frenken received the 2017 Innovation in Materials Characterization Award of the Materials Research Society (MRS). He was chosen from a large group of nominees …

  • ‘Dreaming of graphene’: Joost Frenken on Dutch radio

    February 3, 2017

    Recently, Joost Frenken talked on Dutch Radio (NPO radio 1, Langs de lijn en Omstreken) about graphene: a one atom thick superconductor. Listen to the interview: De nieuwe mogelijkheden van …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

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      • PhD vacancies
      • Scientific internships
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    • Career
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      • Coming from abroad
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  • More
    • More

      • People
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      • ARCNL Newsletter