At this year’s conference of the Japanese Photochemistry Association in Sendai, ARCNL group leader Fred Brouwer received the prestigious Honda-Fujishima Lectureship Award. This award is handed out each year to …
ARCNL proudly presents the 5th newsletter of the Advanced Research Center for Nanolithography (ARCNL) with highlights of the past six months. Click here to open newsletter …
An important step has been taken towards permanent housing for ARCNL. On June 6th Christa Hooijer (director NWO-I) and Joost Frenken (director ARCNL) performed the honorable task of driving the …
ARCNL group leader Oscar Versolato has been awarded a NWO Vidi grant. This grant enables Versolato to study the physics of plasma sources of extreme ultraviolet (EUV) light for nanolithography.
Once a week high school chemistry teacher Carin Werner-IJgosse works at ARCNL as a researcher in the group EUV Photo resists. She is financially supported by the programme ‘Leraar in …
ARCNL director and group leader Joost Frenken received the 2017 Innovation in Materials Characterization Award of the Materials Research Society (MRS). He was chosen from a large group of nominees …
Recently, Joost Frenken talked on Dutch Radio (NPO radio 1, Langs de lijn en Omstreken) about graphene: a one atom thick superconductor. Listen to the interview: De nieuwe mogelijkheden van …
Today Joost Frenken explains the technology behind ASML's new type of computer chips machnine in Dutch news paper de Volkskrant. Read the article 'Zo werkt die 'toverlantaarn' van ASML' …
On January 9, 2017, Andrea Peña received the Hendrik Casimir Prize 2016 for best Master student. The Casimir Research School yearly awards these prizes to the best MSc students in …
This is ARCNL's fourth newsletter. Since its start three years ago, ARCNL has been growing rapidly, which is visible in the number of employees, the number of research groups and …
