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    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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News - High-Harmonic Generation and EUV Science

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  • ARCNL groups receive OTP grant

    December 22, 2020

    In December, the groups of Peter Kraus and Stefan Witte received an Open Technology Programme (OTP) grant for the project ‘Ultrafast metrology of semiconductor nanostructures with a next-generation table-top soft-X-ray …

  • Peter Kraus ‘techniektalent’ of 2020

    November 12, 2020

    Group leader Peter Kraus is one of the fifteen technical talents (Techniektalenten) of 2020 in the Netherlands, that were identified by the Dutch technical journal De Ingenieur. Fundamental science research …

  • Veni grant for Peter Kraus

    July 16, 2018

    ARCNL group leader Peter Kraus has been awarded a Veni grant from the Netherlands Organisation for Scientific Research (NWO) for his proposal ‘Shining ultrafast light on ultrasmall chips.’ Kraus started …

  • Peter Kraus starts new group on High-Harmonic generation and EUV Science

    May 3, 2018

    As of May 1, Peter Kraus has been appointed as tenure-track group leader at ARCNL. He will lead a program to develop extreme ultraviolet (EUV) sources from high-harmonic generation and …

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter