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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • F. Torretti, Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography, VU University Amsterdam, 2019-12-19

  • D. Petrova, B. Weber, C. Allain, P. Audebert, C.H. Venner, A.M. Brouwer and D. Bonn, Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes, Sci. Adv. 5, (12), eaaw4761: 1-9 (2019)

  • D. Bonn and J.W.M. Frenken, Tunable superlubricity of 2-dimensional materials, PNAS 116, (49), 24386-24387 (2019)

  • N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters, J. of Micro/Nanolithography. MEMS and MOEMS 18, (4), 043504: 1-11 (2019)

  • M. Du, K.S.E. Eikema and S. Witte, Computational-imaging-based optical coherence tomography in time- and frequency-domain, OSA Continuum 2, (11), 3141-3152 (2019)

  • L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method, Eur. J. Inorg. Chem. 2019, (38), 4136-4141 (2019)

  • T. de Faria Pinto, J. Mathijssen, S. Witte and K.S.E. Eikema, An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm, Opt. Express 27, (21), 29829-29837 (2019)

  • Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson, Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst, Angew. Chem. Int. Ed. 131, 14099-14106 (2019)

  • R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma, Appl. Phys. Lett. 115, (12), 124101: 1-6 (2019)

  • S. Edward, S. Witte and P.C.M. Planken, Verborgen uitlijntralies meten met licht en geluid, NTvN, (2019)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter