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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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G.M. Bremmer, L. van Haandel, E.J.M. Hensen, J.W.M. Frenken and P.J. Kooyman,
The effect of oxidation and resulfidation on (Ni/Co)MoS2 hydrodesulfurisation catalysts
, Appl.Catal.B
243
, 145-150 (2019)
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
The role of the organic shell in hybrid molecular materials for EUV lithography
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019.
N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019. - pp. 1-11
X. Zhou, F.-C. Hsia, Y. Xue, D.-M. Tang, O. Cretu, C. Zhang, M. Mitome, Y. Bando, T. Sasaki and D. Golberg,
Tunable Mechanical and Electrical Properties of Coaxial BN-C Nanotubes
, Phys Status Solidi Rapid Res Lett
13
, (3), 1800576: 1-7 (2019)
D.W. van Baarle, S.Yu. Krylov, M.E.S. Beck and J.W.M. Frenken,
On the non-trivial origin of atomic-scale patterns in friction force Microscopy
, Tribol. Lett.
67
, (15) (2019)
L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos Ortega,
Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists
, J. of Micro/Nanolithography. MEMS and MOEMS
18
, (1) (2019)
D. Bodewits and R. Hoekstra,
Charge-Exchange Emission from Hydrogen-Like Carbon Ions Colliding with Water Molecules
, Atoms
7
, (1), 17: 1-11 (2019)
L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos Ortega,
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
, J. Mater. Chem. C
7
, (1), 33-37 (2019)
R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink:
Polarimetric and interferometric measurement of orbital angular momentum imparted by single plasmon nano-antennas
In:
Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP), CTh3A.2, OPG, 2019.
J. Wang, S.N. Bishop, L. Sun, Q. Lu, G. Vardar, R. Bliem, N. Tsvetkov, E.J. Crumlin, J.-J. Gallet, F. Bournel, I. Waluyo and B. Yildiz,
Threshold catalytic onset of carbon formation on CeO2 during CO2 electrolysis: mechanism and inhibition
, J. Mater. Chem. A
7
, (25), 15233-15243 (2019)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter