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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson, Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water, J. Phys. Chem. C 123, (24), 15038-15045 (2019)

  • R.V. Mom, S.T.A.G. Melissen, P. Sautet, J.W.M. Frenken and S.N. Steinmann, The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar, J. Phys. Chem. C 123, (19), 12382-12389 (2019)

  • Y. Zhang, Organotin Photoresists for extreme ultraviolet lithography, University of Amsterdam, 2019-04-11

  • B. Weber, T. Suhina, A.M. Brouwer and D. Bonn, Frictional weakening of slip interfaces, Sci. Adv. 5, (4), eaav7603: 1-7 (2019)

  • D. Kurilovich, Laser-induced dynamics of liquid tin microdroplets, VU University Amsterdam, 2019-04-04

  • G.M. Bremmer, L. van Haandel, E.J.M. Hensen, J.W.M. Frenken and P.J. Kooyman, The effect of oxidation and resulfidation on (Ni/Co)MoS2 hydrodesulfurisation catalysts, Appl.Catal.B 243, 145-150 (2019)

  • L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: The role of the organic shell in hybrid molecular materials for EUV lithography In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019.

  • N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega: Zinc-based metal oxoclusters: towards enhanced EUV absorptivity In: Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019. - pp. 1-11

  • X. Zhou, F.-C. Hsia, Y. Xue, D.-M. Tang, O. Cretu, C. Zhang, M. Mitome, Y. Bando, T. Sasaki and D. Golberg, Tunable Mechanical and Electrical Properties of Coaxial BN-C Nanotubes, Phys Status Solidi Rapid Res Lett 13, (3), 1800576: 1-7 (2019)

  • D.W. van Baarle, S.Yu. Krylov, M.E.S. Beck and J.W.M. Frenken, On the non-trivial origin of atomic-scale patterns in friction force Microscopy, Tribol. Lett. 67, (15) (2019)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter