Publications - ARCNL

J. Haitjema, Y. Zhang, M. Vockenhuber, D. Kazazis, Y. Ekinci and A.M. Brouwer, Extreme ultraviolet patterning of tin-oxo cages, J. of Micro/Nanolithography. MEMS and MOEMS 16, (3), 033510:1-7 (2017)
R.A. Meijer, A. Stodolna, K.S.E. Eikema and S. Witte, High-energy Nd:YAG laser system with arbitrary sub-nanosecond pulse shaping capability, Opt. Lett. 42, (14), 2758-2761 (2017)
Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson and A.M. Brouwer, Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy, J. of Micro/Nanolithography. MEMS and MOEMS 16, (2), 123510: 1-7 (2017)
J. Haitjema, Y. Zhang, N. Ottosson and A.M. Brouwer, Photoreactions of Tin Oxo Cages, Model EUV Photoresists, J. Photopolym. Sci. Technol. 30, (1), 99-102 (2017)
F. Torretti, A. Windberger, A.N. Ryabtsev, S. Dobrodey, H. Bekker, W.M.G. Ubachs, R. Hoekstra, E.V. Kahl, J.C. Berengut, J.R. Crespo López-Urrutia and O.O. Versolato, Optical spectroscopy of complex open-4d-shell ions Sn7+–Sn10+, Phys. Rev. A 95, 042503: 1-16 (2017)
O.O. Versolato, Boxing with tin droplets, Amsterdam Sci. 3, (5) (2017)
Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson and A.M. Brouwer: Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy In: Advances in Patterning Materials and Processes XXXIV : conference held in San Jose, California, February 26, 2017 /ed. C.K. Hohle and R. Gronheid, SPIE-Intl Soc Optical Eng, 2017. - pp. 1014606: 1-10 (Proceedings SPIE; 10146)
J. Haitjema, Y. Zhang, M. Vockenhuber, D. Kazazis, Y. Ekinci and A.M. Brouwer: Extreme ultraviolet patterning of tin-oxo cages In: Proc. SPIE 10143, Extreme Ultraviolet (EUV) Lithography VIII /ed. E.M. Panning and K.A. Goldberg, SPIE-Intl Soc Optical Eng, 2017. - pp. 1014325: 1-10 (Proceedings SPIE;)
R. Fallica, J. Haitjema, L. Wu, S. Castellanos Ortega, A.M. Brouwer and Y. Ekinci: Absorption and exposure kinetics of photoresists at EUV In: Proceedings SPIE /ed. E.M. Panning and K.A. Goldberg, SPIE-Intl Soc Optical Eng, 2017. - pp. 101430A: 1-11
M.J. Deuzeman, A. Stodolna, E.E.B. Leerssen, A. Antoncecchi, N. Spook, T. Kleijntjens, J. Versluis, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Ion distribution and ablation depth measurements of a fs-ps laser-irradiated solid tin target, J. Appl. Phys. 121, (10), 103301: 1-8 (2017)

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