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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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Publications

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  • S. Witte and A.J. den Boef, Lensloze microscopie, NTvN, (2019)

  • S. Schippers, E. Sokell, F. Aumayr, H. Sadeghpour, K. Ueda, I. Bray, K. Bartschat, A. Murray, J. Tennyson, A. Dorn, M. Yamazaki, M. Takahashi, N. Mason, O. Novotný, A. Wolf, L. Sanche, M. Centurion, Y. Yamazaki, G. Laricchia, C.M. Surko, J. Sullivan, G. Gribakin, D.W. Savin, Y. Ralchenko, R. Hoekstra and G. O’Sullivan, Roadmap on photonic, electronic and atomic collision physics: II. Electron and antimatter interactions, J. Phys. B: At. Mol. Opt. Phys. 52, (17), 171002: 1-49 (2019)

  • G.S.M. Jansen, X. Liu, K.S.E. Eikema and S. Witte, Broadband extreme ultraviolet dispersionmeasurements using a high-harmonic source, Opt. Lett. 44, (15), 3625-3628 (2019)

  • O.O. Versolato, Physics of laser-driven tin plasma sources of EUV radiation for nanolithography, Plasma Sources Sci. Technol. 28, (8), 083001:1-17 (2019)

  • R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Scheers, D. Kurilovich, A. Bayerle, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Efficient generation of extreme ultraviolet light from Nd:YAG-driven microdroplet-tin plasma, Phys. Rev. Appl. 12, (1), 014010: 1-11 (2019)

  • M.J. Deuzeman, Generation and interactions of energetic tin ions, University of Groningen, 2019-06-21

  • L. Serafini, A. Bacci, A. Bellandi, M. Bertucci, M. Bolognesi, A. Bosotti, F. Broggi, R. Calandrino, F. Camera, F. Canella, S. Capra, P. Cardarelli, M. Carrara, K. Cassou, A. Castoldi, R. Castriconi, G.M. Cattaneo, S. Cialdi, A. Cianchi, N. Coluccelli, C. Curatolo, A. Del Vecchio, S. Di Mitri, I. Drebot, K. Dupraz, A. Esposito, L. Faillace, M. Ferrario, C. Fiorini, C. Galzerano, M. Gambaccini, G. Ghiringhelli, D. Giannotti, D. Giove, F. Groppi, C. Guazzoni, P. Laporta, S. Leoni, A. Loria, P. Mangili, A. Martens, T. Mazza, Z. Mazzotta, C. Meroni, G. Mettivier, P. Michelato, L. Monaco, S. Morante, M.M. Sala, D. Nutarelli, S. Olivares, G. Onida, M. Opromolla, C. Pagani, R. Paparella, M.G.A. Paris, B. Paroli, G. Paterno, C. Paulin, L. Perini, M. Petrarca, V. Petrillo, E. Pinotti, P. Piser, M.A.C. Potenza, F. Prelz, A. Pullia, E. Puppin, F. Ragusa, R. Ramponi, M. Rome, M.R. Conti, A.R. Rossi, L. Rossi, M. Ruijter, P. Russo, S. Samsam, A. Sarno, D. Sertore, M. Sorbi, B. Spataro, M. Statera, G. Turchetti, C. Vaccarezza, R. Valdagni, A. Vanzulli, F. Zomer and G. Rossi, MariX, an advanced MHz-class repetition rate X-ray source for linear regime time-resolved spectroscopy and photon scattering, Nucl. Instrum. Methods Phys. Res., Sect. A 930, (21), 167-172 (2019)

  • R.V. Mom, N. Louwen, J.W.M. Frenken and I.M.N. Groot, In situ observations of an active MoS2 model hydrodesulfurization catalyst, Nature Commun. 10, 2546: 1-8 (2019)

  • D.E. Boonzajer Flaes, Reconstructive imaging based on indirect measurements From lensless imaging to waveguide analysis, VU University Amsterdam, 2019-06-11

  • C.J. Kaplan, P.M. Kraus, E.M. Gullikson, L.J. Borja, S.K. Cushing, M. Zuerch, H.-T. Chang, D.M. Neumark and S.R. Leone, Retrieval of the complex-valued refractive index of germanium near the M-4,M-5 absorption edge, J. Opt. Soc. Am. B 36, (6), 1716-1720 (2019)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter