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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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R.V. Mom, J. Vermeer, J.W.M. Frenken and I.M.N. Groot,
Structural Dynamics of Al2O3/NiAl(110) During Film Growth in NO2
, J.Phys.Chem.B
122
, (2), 788-793 (2018)
M.F. Jager, C. Ott, C.J. Kaplan, P.M. Kraus, D.M. Neumark and S.R. Leone,
Attosecond transient absorption instrumentation for thin film materials: Phase transitions, heat dissipation, signal stabilization, timing correction, and rapid sample rotation
, Rev. Sci. Instrum.
89
, (1) (2018)
A. Thete, D. Geelen, S.J. van der Molen and R.M. Tromp,
Charge catastrophe and dielectric breakdown during exposure of organic thin films to low-energy electron radiation
, Phys. Rev. Lett.
119
, (26), 266803: 1-6 (2017)
J.W.M. Frenken:
Van grensvlakfysica tot nanolithografie
In:
Natuurkundige Voordrachten 2016-2017, Koninklijke Maatschappij voor Natuurkunde Diligentia, 2017.
H. Gelderblom and O.O. Versolato,
Laserschieten op tindruppels
, NTvN
83
, (11), 382-385 (2017)
P. Antonov,
Towards thermo- and superlubricity on the macroscopic scale : from nanostructures to graphite and graphene lubrication
, Leiden University, 2017-10-18
J. Haitjema, Y. Zhang, M. Vockenhuber, D. Kazazis, Y. Ekinci and A.M. Brouwer,
Extreme ultraviolet patterning of tin-oxo cages
, J. of Micro/Nanolithography. MEMS and MOEMS
16
, (3), 033510:1-7 (2017)
R.A. Meijer, A. Stodolna, K.S.E. Eikema and S. Witte,
High-energy Nd:YAG laser system with arbitrary sub-nanosecond pulse shaping capability
, Opt. Lett.
42
, (14), 2758-2761 (2017)
Y. Zhang, J. Haitjema, X. Liu, F.O.L. Johansson, A. Lindblad, S. Castellanos Ortega, N. Ottosson and A.M. Brouwer,
Photochemical conversion of tin-oxo cage compounds studied using hard x-ray photoelectron spectroscopy
, J. of Micro/Nanolithography. MEMS and MOEMS
16
, (2), 123510: 1-7 (2017)
J. Haitjema, Y. Zhang, N. Ottosson and A.M. Brouwer,
Photoreactions of Tin Oxo Cages, Model EUV Photoresists
, J. Photopolym. Sci. Technol.
30
, (1), 99-102 (2017)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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