Publications - ARCNL

Y. Zhang, J. Haitjema, M. Baljozovic, M. Vockenhuber, D. Kazazis, T. Jung, Y. Ekinci and A.M. Brouwer, Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure, J. Photopolymer. Sci.Tec. 31, (2), 249-255 (2018)
G.S.M. Jansen, A.C.C. de Beurs, X. Liu, K.S.E. Eikema and S. Witte, Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging, Opt. Express 26, (10), 12479-12489 (2018)
R. Fallica, J. Haitjema, L. Wu, S. Castellanos Ortega, A.M. Brouwer and Y. Ekinci, Absorption coefficient of metal-containing photoresists in the extreme ultraviolet, J. of Micro/Nanolithography. MEMS and MOEMS 17, (2), 023505: 1-7 (2018)
B. Weber, Y. Nagata, S. Ketzetzi, F. Tang, W.J. Smit, H.J. Bakker, E.H.G. Backus, D. Bonn and M. Bonn, Molecular Insight into the Slipperiness of Ice, J. Phys. Chem. Lett. 9, (11), 2838-2842 (2018)
C.J. Kaplan, P.M. Kraus, A.D. Ross, M. Zürch, S.K. Cushing, M.F. Jager, H.-T. Chang, E.M. Gullikson, D.M. Neumark and S.R. Leone, Femtosecond tracking of carrier relaxation in germanium with extreme ultraviolet transient reflectivity, Phys. Rev. B 97, (20), 205202: 1-9 (2018)
R.V. Mom, O. Ivashenko, J.W.M. Frenken, I.M.N. Groot and A.O. Sjastad, Nucleation, Alloying, and Stability of Co–Re Bimetallic Nanoparticles on Al2O3/NiAl(110), J. Phys. Chem. C 122, (16), 8967-8975 (2018)
J.L. Ellis, K.M. Dorney, D.D. Hickstein, N.J. Brooks, C. Gentry, C. Hernández-García, D. Zusin, J.M. Shaw, Q.L. Nguyen, C.A. Mancuso, G.S. Jansen, S. Witte, H.C. Kapteyn and M.M. Murnane, High harmonics with spatially varying ellipticity, Optica 5, (4), 479-485 (2018)
P.M. Kraus and H.J. Wörner, Perspectives of Attosecond Spectroscopy for the Understanding of Fundamental Electron Correlations, Angew. Chem. Int. Ed. 57, (19), 5228-5247 (2018)
A. Bayerle, M.J. Deuzeman, S. van der Heijden, D. Kurilovich, T. de Faria Pinto, A. Stodolna, S. Witte, K.S.E. Eikema, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Sn ion energy distributions of ns- and ps-laser produced plasmas, Plasma Sources Sci. Technol. 27, 045001:1-8 (2018)
S. Castellanos Ortega, L. Wu, M. Baljozovic, G. Portale, D. Kazazis, M. Vockenhuber, Y. Ekinci and T. Jung: Ti, Zr, and Hf-based molecular hybrid materials as EUV photoresists In: Extreme Ultraviolet (EUV) Lithography IX : SPIE Advanced Lithography, SPIE-Intl Soc Optical Eng, 2018. - pp. 105830A: 1-12 (Proceedings SPIE; 10583)

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

T. +31 20 8517100
E-mail: arcnlsecretariaat@arcnl.nl

© ARCNL 2024