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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos Ortega,
Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists
, J. of Micro/Nanolithography. MEMS and MOEMS
18
, (1) (2019)
D. Bodewits and R. Hoekstra,
Charge-Exchange Emission from Hydrogen-Like Carbon Ions Colliding with Water Molecules
, Atoms
7
, (1), 17: 1-11 (2019)
L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos Ortega,
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
, J. Mater. Chem. C
7
, (1), 33-37 (2019)
R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink:
Polarimetric and interferometric measurement of orbital angular momentum imparted by single plasmon nano-antennas
In:
Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP), CTh3A.2, OPG, 2019.
J. Wang, S.N. Bishop, L. Sun, Q. Lu, G. Vardar, R. Bliem, N. Tsvetkov, E.J. Crumlin, J.-J. Gallet, F. Bournel, I. Waluyo and B. Yildiz,
Threshold catalytic onset of carbon formation on CeO2 during CO2 electrolysis: mechanism and inhibition
, J. Mater. Chem. A
7
, (25), 15233-15243 (2019)
F.-C. Hsia, D.-M. Tang, W. Jevasuwan, N. Fukata, X. Zhou, M. Mitome, Y. Bando, T.E.M. Nordling and D. Golberg,
Realization and direct observation of five normal and parametric modes in silicon nanowire resonators by in situ transmission electron microscopy
, Nanoscale Adv.
1
, (5), 1784-1790 (2019)
D. Petrova, B. Weber, C. Allain, P. Audebert, D. Bonn and A.M. Brouwer,
Fast 3D Microscopy Imaging of Contacts Between Surfaces Using a Fluorescent Liquid
, ACS Appl. Mater. Interfaces
10
, (48), 40973-40977 (2018)
J. Scheers, A.N. Ryabtsev, A. Borschevsky, J.C. Berengut, K. Haris, R. Schupp, D. Kurilovich, F. Torretti, A. Bayerle, E. Eliav, W.M.G. Ubachs, O.O. Versolato and R. Hoekstra,
Energy-level structure of Sn3+ ions
, Phys. Rev. A
98
, (6), 062503: 1-12 (2018)
L.S. Dreissen, H.F. Schouten, W.M.G. Ubachs, S.B. Raghunathan and T.D. Visser,
Active Two-Dimensional Steering of Radiation from a Nanoaperture
, Nano Lett.
18
, (11), 7207-7210 (2018)
D.E. Boonzajer Flaes and S. Witte,
Interference probe ptychography for computational amplitude and phase microscopy
, Opt. Express
26
, (24), 31372-31390 (2018)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter