Publications - ARCNL

F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan, Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography, Nature Commun. 11, (1), 2334: 1-8 (2020)
L.V. Amitonova and J.F. de Boer, Endo-microscopy beyond the Abbe and Nyquist limits, Light : Sci. Appl. 9, (1), 81: 1-12 (2020)
S. Konijnenberg, A.C.C. de Beurs, G.S.M. Jansen, H.P. Urbach, S. Witte and W. Coene, Phase retrieval algorithms for lensless imaging using diffractive shearing interferometry, J. Opt. Soc. Am. A 37, (6), 914-924 (2020)
A.L. Klein, D. Kurilovich, H. Lhuissier, O.O. Versolato, D. Lohse, E. Villermaux and H. Gelderblom, Drop fragmentation by laser-pulse impact, J. Fluid Mech. 893, A7: 1-37 (2020)
C.D. Dieleman, Weiyi Ding, L. Wu, N. Thakur, I. Bespalov, B. Daiber, Y. Ekinci, S. Castellanos Ortega and B. Ehrler, Universal Direct Pattering of Colloidal Quantum Dots by (Extreme) Ultraviolet and Electron Beam Lithography, Nanoscale 12, (20), 11306-11316 (2020)
C. Messinis, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef, Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisons, Appl. Opt. 59, (11), 3498-3507 (2020)
G. de Haan, J. Hernandez-Rueda and P.C.M. Planken, Femtosecond time-resolved pump-probe measurements on percolating gold in the ablation regime, Opt. Express 28, (8), 12093-12107 (2020)
L. Barreau, A.D. Ross, S. Garg, P.M. Kraus, D.M. Neumark and S.R. Leone, Efficient table-top dual-wavelength beamline for ultrafast transient absorption spectroscopy in the soft X-ray region, Sci. Rep 10, (1), 5733: 1-9 (2020)
L. Loetgering, M. Du, K.S.E. Eikema and S. Witte, zPIE: an autofocusing algorithm for ptychography, Opt. Lett. 45, (7), 2030-2033 (2020)
M. Saedi, C. Sfiligoj, J. Verhoeven and J.W.M. Frenken, Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications, Appl. Surf. Sci., 144951: 1-10 (2020)

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