Publications - ARCNL

L.V. Amitonova, T.B.H. Tentrup, I.M. Vellekoop and P.W.H. Pinkse, Quantum key establishment via a multimode fiber, Opt. Express 28, (5), 5965-5981 (2020)
L. Loetgering, M. Baluktsian, K. Keskinbora, R. Horstmeyer, T. Wilhein, G. Schütz, K.S.E. Eikema and S. Witte, Generation and characterization of focused helical x-ray beams, Sci. Adv. 6, (7), eaax8836: 1-6 (2020)
B. Liu, D. Kurilovich, H. Gelderblom and O.O. Versolato, Mass loss from a stretching semitransparent sheet of liquid tin, Phys. Rev. Appl. 13, (2), 024035: 1-10 (2020)
A.C.C. de Beurs, X. Liu, G.S.M. Jansen, S. Konijnenberg, W. Coene, K.S.E. Eikema and S. Witte, Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry, Opt. Express 28, (4), 5257-5266 (2020)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte, Measuring laser beam quality, wavefronts, and lens aberrations using ptychography, Opt. Express 28, (4), 5022-5034 (2020)
D. Petrova, D.K. Sharma, M. Vacha, D. Bonn, A.M. Brouwer and B. Weber, Ageing of Polymer Frictional Interfaces: The Role of Quantity and Quality of Contact, ACS Appl. Mater. Interfaces 12, (8), 9890-9895 (2020)
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos Ortega, The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography, ACS Appl. Mater. Interfaces 12, (8), 9881-0889 (2020)
F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin, Wear particle dynamics drive the difference between repeated and non-repeated reciprocated sliding, Tribol.Int. 142, 105983: 1-8 (2020)
F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Spectral characterization of an industrial EUV light source for nanolithography, J. Phys. D: Appl. Phys. 53, (5), 055204: 1-7 (2020)
L.V. Amitonova and J.F. de Boer, Sensitivity analysis of Raman endoscopy with and without wavefront shaping, Opt. Express 28, (3), 3779-3788 (2020)

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