Publications - ARCNL

H. Zhang, A. Antoncecchi, S. Edward, I. Setija, P.C.M. Planken and S. Witte, Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound, Phys. Rev. Appl. 13, (1), 014010: 1-14 (2020)
J. Mathijssen, T. de Faria Pinto, A. Schulte, K.S.E. Eikema and S. Witte: Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, OSA Technical Digest (Optical Society of America), 2020.
L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato: Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2, OSA Technical Digest (Optical Society of America), 2020.
Z. Mazzotta, R.A. Meijer, D. Kurilovich, R. Schupp, O.O. Versolato, K.S.E. Eikema and S. Witte: Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EM1A.4, OSA Technical Digest (Optical Society of America), 2020.
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse: Imaging Applications of Time-Domain Wavefront Shaping In: Frontiers in Optics / Laser Science, paper FW5F.3, OSA Technical Digest (Optical Society of America), 2020.
F. Torretti, Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography, VU University Amsterdam, 2019-12-19
D. Petrova, B. Weber, C. Allain, P. Audebert, C.H. Venner, A.M. Brouwer and D. Bonn, Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes, Sci. Adv. 5, (12), eaaw4761: 1-9 (2019)
D. Bonn and J.W.M. Frenken, Tunable superlubricity of 2-dimensional materials, PNAS 116, (49), 24386-24387 (2019)
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters, J. of Micro/Nanolithography. MEMS and MOEMS 18, (4), 043504: 1-11 (2019)
M. Du, K.S.E. Eikema and S. Witte, Computational-imaging-based optical coherence tomography in time- and frequency-domain, OSA Continuum 2, (11), 3141-3152 (2019)

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

T. +31 20 8517100
E-mail: arcnlsecretariaat@arcnl.nl

© ARCNL 2025