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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Mathijssen, T. de Faria Pinto, A. Schulte, K.S.E. Eikema and S. Witte:
Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, OSA Technical Digest (Optical Society of America), 2020.
F. Torretti,
Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography
, VU University Amsterdam, 2019-12-19
D. Petrova, B. Weber, C. Allain, P. Audebert, C.H. Venner, A.M. Brouwer and D. Bonn,
Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes
, Sci. Adv.
5
, (12), eaaw4761: 1-9 (2019)
D. Bonn and J.W.M. Frenken,
Tunable superlubricity of 2-dimensional materials
, PNAS
116
, (49), 24386-24387 (2019)
N. Thakur, L.T. Tseng, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega,
Stability studies on a sensitive EUV photoresist based on zinc metal oxoclusters
, J. of Micro/Nanolithography. MEMS and MOEMS
18
, (4), 043504: 1-11 (2019)
M. Du, K.S.E. Eikema and S. Witte,
Computational-imaging-based optical coherence tomography in time- and frequency-domain
, OSA Continuum
2
, (11), 3141-3152 (2019)
L. Wu, J. Liu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega,
Hybrid EUV Resists with Mixed Organic Shells: A Simple Preparation Method
, Eur. J. Inorg. Chem.
2019
, (38), 4136-4141 (2019)
T. de Faria Pinto, J. Mathijssen, S. Witte and K.S.E. Eikema,
An optical parametric chirped pulse amplifier producing ultrashort 10.5 mJ pulses at 1.55 μm
, Opt. Express
27
, (21), 29829-29837 (2019)
Z. Jakub, J. Hulva, M. Meier, R. Bliem, F. Kraushofer, M. Setvin, M. Schmid, U. Diebold, C. Franchini and G.S. Parkinson,
Local Structure and Coordination Define Adsorption in a Model Ir1/Fe3O4 Single‐Atom Catalyst
, Angew. Chem. Int. Ed.
131
, 14099-14106 (2019)
R. Schupp, F. Torretti, R.A. Meijer, M. Bayraktar, J. Sheil, J. Scheers, D. Kurilovich, A. Bayerle, A.A. Schafgans, M. Purvis, K.S.E. Eikema, S. Witte, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Radiation transport and scaling of optical depth in Nd:YAG laser-produced microdroplet-tin plasma
, Appl. Phys. Lett.
115
, (12), 124101: 1-6 (2019)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
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More
People
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Events
Repository
Contact & Directions
ARCNL Newsletter