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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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D. Kurilovich,
Laser-induced dynamics of liquid tin microdroplets
, VU University Amsterdam, 2019-04-04
G.M. Bremmer, L. van Haandel, E.J.M. Hensen, J.W.M. Frenken and P.J. Kooyman,
The effect of oxidation and resulfidation on (Ni/Co)MoS2 hydrodesulfurisation catalysts
, Appl.Catal.B
243
, 145-150 (2019)
N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE., 2019. - pp. 1-11
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
The role of the organic shell in hybrid molecular materials for EUV lithography
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE., 2019.
X. Zhou, F.-C. Hsia, Y. Xue, D.-M. Tang, O. Cretu, C. Zhang, M. Mitome, Y. Bando, T. Sasaki and D. Golberg,
Tunable Mechanical and Electrical Properties of Coaxial BN-C Nanotubes
, Phys Status Solidi Rapid Res Lett
13
, (3), 1800576: 1-7 (2019)
D.W. van Baarle, S.Yu. Krylov, M.E.S. Beck and J.W.M. Frenken,
On the non-trivial origin of atomic-scale patterns in friction force Microscopy
, Tribol. Lett.
67
, (15) (2019)
L. Wu, M. Baliozovic, G. Portale, D. Kazazis, M. Vockenhuber, T. Jung, Y. Ekinci and S. Castellanos Ortega,
Mechanistic insights in Zr-, and Hf-based molecular hybrid EUV photoresists
, J. of Micro/Nanolithography. MEMS and MOEMS
18
, (1) (2019)
D. Bodewits and R. Hoekstra,
Charge-Exchange Emission from Hydrogen-Like Carbon Ions Colliding with Water Molecules
, Atoms
7
, (1), 17: 1-11 (2019)
L. Wu, M. Tiekink, A. Giuliani, L. Nahon and S. Castellanos Ortega,
Tuning photoionization mechanisms of molecular hybrid materials for EUV lithography applications
, J. Mater. Chem. C
7
, (1), 33-37 (2019)
R. Röhrich, C. Hoekmeijer, C.I. Osorio and A.F. Koenderink:
Polarimetric and interferometric measurement of orbital angular momentum imparted by single plasmon nano-antennas
In:
Imaging and Applied Optics 2019 (COSI, IS, MATH, pcAOP), CTh3A.2, OPG, 2019.
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
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Support vacancies
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