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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson,
Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water
, J. Phys. Chem. C
123
, (24), 15038-15045 (2019)
R.V. Mom, S.T.A.G. Melissen, P. Sautet, J.W.M. Frenken and S.N. Steinmann,
The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar
, J. Phys. Chem. C
123
, (19), 12382-12389 (2019)
Y. Zhang,
Organotin Photoresists for extreme ultraviolet lithography
, University of Amsterdam, 2019-04-11
B. Weber, T. Suhina, A.M. Brouwer and D. Bonn,
Frictional weakening of slip interfaces
, Sci. Adv.
5
, (4), eaav7603: 1-7 (2019)
D. Kurilovich,
Laser-induced dynamics of liquid tin microdroplets
, VU University Amsterdam, 2019-04-04
G.M. Bremmer, L. van Haandel, E.J.M. Hensen, J.W.M. Frenken and P.J. Kooyman,
The effect of oxidation and resulfidation on (Ni/Co)MoS2 hydrodesulfurisation catalysts
, Appl.Catal.B
243
, 145-150 (2019)
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
The role of the organic shell in hybrid molecular materials for EUV lithography
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019.
N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019. - pp. 1-11
X. Zhou, F.-C. Hsia, Y. Xue, D.-M. Tang, O. Cretu, C. Zhang, M. Mitome, Y. Bando, T. Sasaki and D. Golberg,
Tunable Mechanical and Electrical Properties of Coaxial BN-C Nanotubes
, Phys Status Solidi Rapid Res Lett
13
, (3), 1800576: 1-7 (2019)
D.W. van Baarle, S.Yu. Krylov, M.E.S. Beck and J.W.M. Frenken,
On the non-trivial origin of atomic-scale patterns in friction force Microscopy
, Tribol. Lett.
67
, (15) (2019)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
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More
People
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Events
Repository
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ARCNL Newsletter