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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
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Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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R.V. Mom, N. Louwen, J.W.M. Frenken and I.M.N. Groot,
In situ observations of an active MoS2 model hydrodesulfurization catalyst
, Nature Commun.
10
, 2546: 1-8 (2019)
C.J. Kaplan, P.M. Kraus, E.M. Gullikson, L.J. Borja, S.K. Cushing, M. Zuerch, H.-T. Chang, D.M. Neumark and S.R. Leone,
Retrieval of the complex-valued refractive index of germanium near the M-4,M-5 absorption edge
, J. Opt. Soc. Am. B
36
, (6), 1716-1720 (2019)
Z. Jakub, J. Hulva, F. Mirabella, F. Kraushofer, M. Meier, R. Bliem, U. Diebold and G.S. Parkinson,
Nickel Doping Enhances the Reactivity of Fe3O4(001) to Water
, J. Phys. Chem. C
123
, (24), 15038-15045 (2019)
R.V. Mom, S.T.A.G. Melissen, P. Sautet, J.W.M. Frenken and S.N. Steinmann,
The Pressure Gap for Thiols: Methanethiol Self-Assembly on Au(111) from Vacuum to 1 bar
, J. Phys. Chem. C
123
, (19), 12382-12389 (2019)
Y. Zhang,
Organotin Photoresists for extreme ultraviolet lithography
, University of Amsterdam, 2019-04-11
B. Weber, T. Suhina, A.M. Brouwer and D. Bonn,
Frictional weakening of slip interfaces
, Sci. Adv.
5
, (4), eaav7603: 1-7 (2019)
D. Kurilovich,
Laser-induced dynamics of liquid tin microdroplets
, VU University Amsterdam, 2019-04-04
G.M. Bremmer, L. van Haandel, E.J.M. Hensen, J.W.M. Frenken and P.J. Kooyman,
The effect of oxidation and resulfidation on (Ni/Co)MoS2 hydrodesulfurisation catalysts
, Appl.Catal.B
243
, 145-150 (2019)
L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
The role of the organic shell in hybrid molecular materials for EUV lithography
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019.
N. Thakur, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega:
Zinc-based metal oxoclusters: towards enhanced EUV absorptivity
In:
Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570D, SPIE-Intl Soc Optical Eng, 2019. - pp. 1-11
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
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PhD vacancies
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Support vacancies
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