Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter
Directory

Publications

Category
  • Articles
  • Bachelor Thesis
  • Book Chapters
  • Master Thesis
  • Proceedings
  • Theses
  • D. Kim, R. Bliem, F. Hess, J.-J. Gallet and B. Yildiz, Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3, J. Am. Chem. Soc. 142, (7), 3548-3563 (2020)

  • G.S. Jansen, Wavelength-resolved Extreme Ultraviolet Lensless Imaging and Metrology, VU University Amsterdam, 2020-01-10

  • H. Zhang, A. Antoncecchi, S. Edward, I. Setija, P.C.M. Planken and S. Witte, Unraveling Phononic, Optoacoustic, and Mechanical Properties of Metals with Light-Driven Hypersound, Phys. Rev. Appl. 13, (1), 014010: 1-14 (2020)

  • L. Behnke, R. Schupp, Z. Bouza, J. Scheers, J. Sheil, R. Hoekstra, W.M.G. Ubachs and O.O. Versolato: Solid-State-Laser-Produced Microdroplet-Tin Plasma Sources of Extreme Ultraviolet Radiation In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EF2A.2, OSA Technical Digest (Optical Society of America), 2020.

  • M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse: Imaging Applications of Time-Domain Wavefront Shaping In: Frontiers in Optics / Laser Science, paper FW5F.3, OSA Technical Digest (Optical Society of America), 2020.

  • J. Mathijssen, T. de Faria Pinto, A. Schulte, K.S.E. Eikema and S. Witte: Optical Parametric Chirped Pulse Amplifier Producing Ultrashort 10.5 mJ Pulses at 1.55 µm In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.2, OSA Technical Digest (Optical Society of America), 2020.

  • Z. Mazzotta, R.A. Meijer, D. Kurilovich, R. Schupp, O.O. Versolato, K.S.E. Eikema and S. Witte: Controlling the temporal shape of a high-power nanosecond 1064 nm laser pulse to explore EUV generation and different droplet deformation regimes In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper EM1A.4, OSA Technical Digest (Optical Society of America), 2020.

  • F. Torretti, Spectroscopy of highly-charged Sn ions for extreme ultraviolet nanolithography, VU University Amsterdam, 2019-12-19

  • D. Petrova, B. Weber, C. Allain, P. Audebert, C.H. Venner, A.M. Brouwer and D. Bonn, Fluorescence microscopy visualization of the roughness-induced transition between lubrication regimes, Sci. Adv. 5, (12), eaaw4761: 1-9 (2019)

  • D. Bonn and J.W.M. Frenken, Tunable superlubricity of 2-dimensional materials, PNAS 116, (49), 24386-24387 (2019)

  • « Previous
  • 1
  • 2
  • 3
  • …
  • 31
  • 32
  • 33
  • 34
  • 35
  • …
  • 39
  • 40
  • 41
  • Next »

Partners:

  • Logo Advanced Semiconductor Materials Lithography, ASML
  • Logo Dutch Research Council, NWO
  • Logo University of Amsterdam, UVA
  • Logo Vrije Universiteit Amsterdam, VU
  • Logo University of Groningen
  • Logo City of Amsterdam
  • Logo The province of Noord-Holland

Links

  • People
  • Research
  • Events
  • News
  • Jobs
  • Repository
  • Contact
  • Privacy statement
  • Disclaimer & Cookies
  • Publications
  • Accessibilty statement
  • Complaints Procedure

Visiting address

  • Science Park 106
  • 1098 XG Amsterdam
  • The Netherlands

Delivery address

  • Science Park 102
  • 1098 XG Amsterdam
  • The Netherlands

Mail address

  • PO Box 93019
  • 1090 BA Amsterdam
  • The Netherlands
  • T. +31 20 8517100
  • E-mail: arcnlsecretariaat@arcnl.nl

Follow us

  • LinkedIn

© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter