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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • O.C.M. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos Ortega, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Technol. 33, (2), 229-234 (2020)

  • N. Sadegh, M.L.S. van der Geest, J. Haitjema, F. Campi, S. Castellanos Ortega, P.M. Kraus and A.M. Brouwer, XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy, J. Photopolymer. Sci.Tec. 33, (2), 145-151 (2020)

  • N. Thakur, A. Giuliani, L. Nahon and S. Castellanos Ortega, Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications, J. Photopolym. Sci. Technol. 33, (2), 153-158 (2020)

  • C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef: Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.

  • L. Helmbrecht, M. Tan, R. Röhrich, M.H. Bistervels, B.O. Kessels, A.F. Koenderink, B. Kahr and W.L. Noorduin, Directed Emission from Self‐Assembled Microhelices, Adv. Funct. Mater. 30, (26), 1908218: 1-5 (2020)

  • H. Zhang, J.-P. Colombier and S. Witte, Laser-induced periodic surface structures: Arbitrary angles of incidence and polarization states, Phys. Rev. B 101, (24), 245430: 1-15 (2020)

  • O.C.M. Lugier, U. Pokharel and S. Castellanos Ortega, Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films., Cryst. Growth Des. 20, (8), 5302-5309 (2020)

  • S. Edward, Detection of hidden gratings using light and sound, University of Amsterdam, 2020-06-18

  • J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato, EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap, Phys. Rev. A 101, (6), 062511: 1-11 (2020)

  • O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte, Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography, J. Phys.: Conf. Ser. 1412, (19), 192006:1-1 (2020)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter