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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • O.C.M. Lugier, U. Pokharel and S. Castellanos Ortega, Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films., Cryst. Growth Des. 20, (8), 5302-5309 (2020)

  • S. Edward, Detection of hidden gratings using light and sound, University of Amsterdam, 2020-06-18

  • J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato, EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap, Phys. Rev. A 101, (6), 062511: 1-11 (2020)

  • O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte, Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography, J. Phys.: Conf. Ser. 1412, (19), 192006:1-1 (2020)

  • J. Haitjema, Exciting tin-oxo cages: light-induced chemistry for nanopatterning, University of Amsterdam, 2020-06-03

  • R. Géneaux, C.J. Kaplan, L. Yue, A.D. Ross, E. Bækhøj, P.M. Kraus, H.-T. Chang, A. Guggenmos, M.-Y. Huang, M. Zürch, K.J. Schafer, D.M. Neumark, M.B. Gaarde and S.R. Leone, Attosecond Time-Domain Measurement of Core-Level-Exciton Decay in Magnesium Oxide, Phys. Rev. Lett. 124, (20), 207401: 1-6 (2020)

  • S.D.C. Roscam Abbing, F. Campi, F.S. Sajjadian, N. Lin, P. Smorenburg and P.M. Kraus, Divergence Control of High-Harmonic Generation, Phys. Rev. Appl. 13, (5), 054029: 1-9 (2020)

  • F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan, Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography, Nature Commun. 11, (1), 2334: 1-8 (2020)

  • L.V. Amitonova and J.F. de Boer, Endo-microscopy beyond the Abbe and Nyquist limits, Light : Sci. Appl. 9, (1), 81: 1-12 (2020)

  • S. Konijnenberg, A.C.C. de Beurs, G.S.M. Jansen, H.P. Urbach, S. Witte and W. Coene, Phase retrieval algorithms for lensless imaging using diffractive shearing interferometry, J. Opt. Soc. Am. A 37, (6), 914-924 (2020)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter