Publications - ARCNL

Z. Bouza, J. Scheers, A.N. Ryabtsev, R. Schupp, L. Behnke, C. Shah, J. Sheil, M. Bayraktar, J.R. Crespo López-Urrutia, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, EUV spectroscopy of Sn5-Sn10+ions in an electron beam ion trap and laser-produced plasmas, J. Phys. B: At. Mol. Opt. Phys. 53, (19), 195001: 1-11 (2020)
V. Verrina, S. Edward, H. Zhang, S. Witte and P.C.M. Planken, Photoacoustic detection of low duty cycle gratings through optically opaque layers, Appl. Phys. Lett. 117, (5), 051104: 1-6 (2020)
S. Patra, M. Germann, J.-Ph. Karr, M. Haidar, L. Hilico, V.I. Korobov, F. M. J. Cozijn, K.S.E. Eikema, W.M.G. Ubachs and J.C.J. Koelemeij, Proton-electron mass ratio from laser spectroscopy of HD+ at the part-per-trillion level, Science 369, (6508), 1238-1241 (2020)
S. Edward, H. Zhang, S. Witte and P.C.M. Planken, Laser-induced ultrasonics for detection of low-amplitude grating through metal layers with finite roughness, Opt. Express 28, (16), 23374-23387 (2020)
J. Scheers, R. Schupp, R.A. Meijer, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Time- and space-resolved optical Stark spectroscopy in the afterglow of laser-produced tin-droplet plasma, Phys. Rev. E 102, (1), 013204: 1-9 (2020)
S. Edward, H. Zhang, I. Setija, V. Verrina, A. Antoncecchi, S. Witte and P.C.M. Planken, Detection of hidden gratings through multilayer nanostructures using light and sound, Phys. Rev. Appl. 14, (1), 014015-1-16 (2020)
O.C.M. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos Ortega, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Technol. 33, (2), 229-234 (2020)
N. Sadegh, M.L.S. van der Geest, J. Haitjema, F. Campi, S. Castellanos Ortega, P.M. Kraus and A.M. Brouwer, XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy, J. Photopolymer. Sci.Tec. 33, (2), 145-151 (2020)
N. Thakur, A. Giuliani, L. Nahon and S. Castellanos Ortega, Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications, J. Photopolym. Sci. Technol. 33, (2), 153-158 (2020)
F. Holtrop, A.R. Jupp, N.P. van Leest, M. Paradiz Dominguez, R.M. Williams, A.M. Brouwer, B. de Bruin, A.W. Ehlers and J.C. Slootweg, Photoinduced and Thermal Single‐Electron Transfer to Generate Radicals from Frustrated Lewis Pairs, Chem. Eur. J. 26, (41), 9005-9011 (2020)

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