Logo
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter
Directory
menu
Search
Publications
Category
Articles
Bachelor Thesis
Book Chapters
Master Thesis
Proceedings
Theses
B. Liu, D. Kurilovich, H. Gelderblom and O.O. Versolato,
Mass loss from a stretching semitransparent sheet of liquid tin
, Phys. Rev. Appl.
13
, (2), 024035: 1-10 (2020)
A.C.C. de Beurs, X. Liu, G.S.M. Jansen, S. Konijnenberg, W. Coene, K.S.E. Eikema and S. Witte,
Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry
, Opt. Express
28
, (4), 5257-5266 (2020)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Measuring laser beam quality, wavefronts, and lens aberrations using ptychography
, Opt. Express
28
, (4), 5022-5034 (2020)
D. Petrova, D.K. Sharma, M. Vacha, D. Bonn, A.M. Brouwer and B. Weber,
Ageing of Polymer Frictional Interfaces: The Role of Quantity and Quality of Contact
, ACS Appl. Mater. Interfaces
12
, (8), 9890-9895 (2020)
I. Bespalov, Y. Zhang, J. Haitjema, R.M. Tromp, S.J. van der Molen, A.M. Brouwer, J. Jobst and S. Castellanos Ortega,
The Key Role of Very-Low-Energy-Electrons in Tin-based Molecular Resists for Extreme Ultraviolet Nanolithography
, ACS Appl. Mater. Interfaces
12
, (8), 9881-0889 (2020)
F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin,
Wear particle dynamics drive the difference between repeated and non-repeated reciprocated sliding
, Tribol.Int.
142
, 105983: 1-8 (2020)
F. Torretti, F. Liu, M. Bayraktar, J. Scheers, Z. Bouza, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Spectral characterization of an industrial EUV light source for nanolithography
, J. Phys. D: Appl. Phys.
53
, (5), 055204: 1-7 (2020)
L.V. Amitonova and J.F. de Boer,
Sensitivity analysis of Raman endoscopy with and without wavefront shaping
, Opt. Express
28
, (3), 3779-3788 (2020)
D. Kim, R. Bliem, F. Hess, J.-J. Gallet and B. Yildiz,
Electrochemical Polarization Dependence of the Elastic and Electrostatic Driving Forces to Aliovalent Dopant Segregation on LaMnO3
, J. Am. Chem. Soc.
142
, (7), 3548-3563 (2020)
G.S. Jansen,
Wavelength-resolved Extreme Ultraviolet Lensless Imaging and Metrology
, VU University Amsterdam, 2020-01-10
Logo
Close
Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter