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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
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Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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L. Loetgering, M. Du, K.S.E. Eikema and S. Witte,
zPIE: an autofocusing algorithm for ptychography
, Opt. Lett.
45
, (7), 2030-2033 (2020)
M. Saedi, C. Sfiligoj, J. Verhoeven and J.W.M. Frenken,
Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications
, Appl. Surf. Sci., 144951: 1-10 (2020)
P.C. Konda, L. Loetgering, K.C. Zhou, S. Xu, A.R. Harvey and R. Horstmeyer,
Fourier ptychography: current applications and future promises
, Opt. Express
28
, (7), 9603-9630 (2020)
R. Hu, S.Yu. Krylov and J.W.M. Frenken,
On the Origin of Frictional Energy Dissipation
, Tribol. Lett.
68
, (1), 8: 1-13 (2020)
Z. Jakub, J. Hulva, P.T.P. Ryan, D.A. Duncan, D.J. Payne, R. Bliem, M. Ulreich, P. Hofegger, F. Kraushofer, M. Meier, M. Schmid, U. Diebold and G.S. Parkinson,
Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst
, Nanoscale
12
, (10), 5866-5875 (2020)
L.V. Amitonova, T.B.H. Tentrup, I.M. Vellekoop and P.W.H. Pinkse,
Quantum key establishment via a multimode fiber
, Opt. Express
28
, (5), 5965-5981 (2020)
L. Loetgering, M. Baluktsian, K. Keskinbora, R. Horstmeyer, T. Wilhein, G. Schütz, K.S.E. Eikema and S. Witte,
Generation and characterization of focused helical x-ray beams
, Sci. Adv.
6
, (7), eaax8836: 1-6 (2020)
B. Liu, D. Kurilovich, H. Gelderblom and O.O. Versolato,
Mass loss from a stretching semitransparent sheet of liquid tin
, Phys. Rev. Appl.
13
, (2), 024035: 1-10 (2020)
A.C.C. de Beurs, X. Liu, G.S.M. Jansen, S. Konijnenberg, W. Coene, K.S.E. Eikema and S. Witte,
Extreme ultraviolet lensless imaging without object support through rotational diversity in diffractive shearing interferometry
, Opt. Express
28
, (4), 5257-5266 (2020)
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Measuring laser beam quality, wavefronts, and lens aberrations using ptychography
, Opt. Express
28
, (4), 5022-5034 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
More
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People
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Repository
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ARCNL Newsletter