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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • A. Schulte, J. Mathijssen, K.S.E. Eikema and S. Witte: Towards High Harmonic Generation in Laser-Produced Plasma In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper ETh3A.4, OSA Technical Digest (Optical Society of America), 2020.

  • J. Scheers, Charge-state-resolved spectroscopy of multiply-charged tin ions, VU University Amsterdam, 2020-11-10

  • S. Rai, K. Bijlsma, S. Koeleman, Tjepkema, A.W. Noordam, H.T. Jonkman, O.O. Versolato and R. Hoekstra, Single-collision scattering of keV-energy Kr ions off a polycrystalline Cu surface, Nucl. Instrum. Methods. Phys. Res., Sect B 482, 58-63 (2020)

  • A. Antoncecchi, H. Zhang, S. Edward, V. Verrina, P.C.M. Planken and S. Witte, High-resolution microscopy through optically opaque media using ultrafast photoacoustics, Opt. Express 28, (23), 33937-33947 (2020)

  • V. Verrina, S. Edward, H. Zhang, A. Antoncecchi, S. Witte and P.C.M. Planken, Role of scattering by surface roughness in the photoacoustic detection of hidden micro-structures, Appl. Opt. 59, (30), 9499-9509 (2020)

  • L. Wu, I. Bespalov, K. Witte, O.C.M. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos Ortega, Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy, J. Mater. Chem. C 8, (42), 14757-14765 (2020)

  • N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography, J. Mater. Chem. C 8, (41), 14499-14506 (2020)

  • H.J. Sielcken and H.J. Bakker, Probing the ultrafast electron and lattice dynamics of gold using femtosecond mid-infrared pulses, Phys. Rev. B 102, (13), 134301: 1-8 (2020)

  • J. Biemolt, D. van Noordenne, J.W. Liu, E. Antonetti, M. Leconte, S. van Vliet, R. Bliem, G. Rothenberg, X.-Z. Fu and N. Yan, Assembling Palladium and Cuprous Oxide Nanoclusters into Single Quantum Dots for the Electrocatalytic Oxidation of Formaldehyde, Ethanol, and Glucose, ACS Appl. Nano. Mater. 3, (10), 10176-10182 (2020)

  • R. Röhrich, G. Oliveri, S. Kovaios, V.T. Tenner, A.J. den Boef, J.T.B. Overvelde and A.F. Koenderink, Uncertainty estimation and design optimization of 2D diffraction-based overlay metrology targets, ACS Photonics 7, (10), 2765-2777 (2020)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter