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  • Mission
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    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • G. de Haan, V. Verrina, A.J.L. Adam, H. Zhang and P.C.M. Planken, Plasmonic enhancement of photo-acoustic inducedreflection changes, Appl. Opt. 60, (24), 7304-7313 (2021)

  • R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte, Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets, Phys. Rev. Appl. 16, (2), 024026: 1-11 (2021)

  • T.N. Hogenelst, Pulsed laser deposition synthesis of high entropy carbide (HfNbTaTiZr)C thin films with near-equiatomic composition, University of Amsterdam, UvA, 2021-08-04

  • X.-Q. Zhou, M. Mytiliniou, J. Hilgendorf, Z. Ye, P. Panagiota, Y. Shao, M. Paradiz Dominguez, L. Zhang, M.B.S. Hesselberth, E. Bos, M.A. Siegler, F. Buda, A.M. Brouwer, A. Kros, R.I. Koning, D. Heinrich and S. Bonnet, Intracellular Dynamic Assembly of Deep‐Red Emitting Supramolecular Nanostructures Based on the Pt…Pt Metallophilic Interaction, Adv. Mater., 2008613: 1-13 (2021)

  • M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek, Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography, Phys. Chem. Chem. Phys. 23, (31), 16646-16657 (2021)

  • A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte: aPIE: Angle calibration algorithm for reflection ptychography In: OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.

  • C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef: Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.

  • A. Pelekanidis, L. Loetgering and S. Witte: Ptychography-based characterization of wavelength-tunable vortex beams In: Computational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021, paper CTu6A.1, OSA Technical Digest (Optical Society of America), 2021.

  • F. Campi, S.D.C. Roscam Abbing, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus: Efficient extreme-ultraviolet multi-band high-order wave mixing in silica In: Proc. SPIE 11886, International Conference on X-Ray Lasers 2020, SPIE-Intl Soc Optical Eng, 2021. - pp. 117-124

  • C.D. Dieleman, Patterning Colloidal Nanocrystals with Light and Electrons, University of Amsterdam, UvA, 2021-06-30

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© ARCNL 2026

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
      • Short-Wavelength Light Sources for EUV Metrology Angana Mondal
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter