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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Articles
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  • S. Edward, H. Zhang, S. Witte and P.C.M. Planken, Laser-induced ultrasonics for detection of low-amplitude grating through metal layers with finite roughness, Opt. Express 28, (16), 23374-23387 (2020)

  • J. Scheers, R. Schupp, R.A. Meijer, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Time- and space-resolved optical Stark spectroscopy in the afterglow of laser-produced tin-droplet plasma, Phys. Rev. E 102, (1), 013204: 1-9 (2020)

  • S. Edward, H. Zhang, I. Setija, V. Verrina, A. Antoncecchi, S. Witte and P.C.M. Planken, Detection of hidden gratings through multilayer nanostructures using light and sound, Phys. Rev. Appl. 14, (1), 014015-1-16 (2020)

  • N. Thakur, A. Giuliani, L. Nahon and S. Castellanos Ortega, Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications, J. Photopolym. Sci. Technol. 33, (2), 153-158 (2020)

  • O.C.M. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos Ortega, Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers, J. Photopolym. Sci. Technol. 33, (2), 229-234 (2020)

  • F. Holtrop, A.R. Jupp, N.P. van Leest, M. Paradiz Dominguez, R.M. Williams, A.M. Brouwer, B. de Bruin, A.W. Ehlers and J.C. Slootweg, Photoinduced and Thermal Single‐Electron Transfer to Generate Radicals from Frustrated Lewis Pairs, Chem. Eur. J. 26, (41), 9005-9011 (2020)

  • N. Sadegh, M.L.S. van der Geest, J. Haitjema, F. Campi, S. Castellanos Ortega, P.M. Kraus and A.M. Brouwer, XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy, J. Photopolymer. Sci.Tec. 33, (2), 145-151 (2020)

  • C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef: Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.

  • L. Helmbrecht, M. Tan, R. Röhrich, M.H. Bistervels, B.O. Kessels, A.F. Koenderink, B. Kahr and W.L. Noorduin, Directed Emission from Self‐Assembled Microhelices, Adv. Funct. Mater. 30, (26), 1908218: 1-5 (2020)

  • H. Zhang, J.-P. Colombier and S. Witte, Laser-induced periodic surface structures: Arbitrary angles of incidence and polarization states, Phys. Rev. B 101, (24), 245430: 1-15 (2020)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter