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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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C. Messinis, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef,
Impact of coherence length on the field of view in dark-field holographic microscopy for semiconductor metrology: theoretical and experimental comparisons
, Appl. Opt.
59
, (11), 3498-3507 (2020)
G. de Haan, J. Hernandez-Rueda and P.C.M. Planken,
Femtosecond time-resolved pump-probe measurements on percolating gold in the ablation regime
, Opt. Express
28
, (8), 12093-12107 (2020)
L. Barreau, A.D. Ross, S. Garg, P.M. Kraus, D.M. Neumark and S.R. Leone,
Efficient table-top dual-wavelength beamline for ultrafast transient absorption spectroscopy in the soft X-ray region
, Sci. Rep
10
, (1), 5733: 1-9 (2020)
M. Saedi, C. Sfiligoj, J. Verhoeven and J.W.M. Frenken,
Effect of rubidium incorporation on the optical properties and intermixing in Mo/Si multilayer mirrors for EUV lithography applications
, Appl. Surf. Sci., 144951: 1-10 (2020)
L. Loetgering, M. Du, K.S.E. Eikema and S. Witte,
zPIE: an autofocusing algorithm for ptychography
, Opt. Lett.
45
, (7), 2030-2033 (2020)
P.C. Konda, L. Loetgering, K.C. Zhou, S. Xu, A.R. Harvey and R. Horstmeyer,
Fourier ptychography: current applications and future promises
, Opt. Express
28
, (7), 9603-9630 (2020)
R. Hu, S.Yu. Krylov and J.W.M. Frenken,
On the Origin of Frictional Energy Dissipation
, Tribol. Lett.
68
, (1), 8: 1-13 (2020)
Z. Jakub, J. Hulva, P.T.P. Ryan, D.A. Duncan, D.J. Payne, R. Bliem, M. Ulreich, P. Hofegger, F. Kraushofer, M. Meier, M. Schmid, U. Diebold and G.S. Parkinson,
Adsorbate-induced structural evolution changes the mechanism of CO oxidation on a Rh/Fe3O4(001) model catalyst
, Nanoscale
12
, (10), 5866-5875 (2020)
L.V. Amitonova, T.B.H. Tentrup, I.M. Vellekoop and P.W.H. Pinkse,
Quantum key establishment via a multimode fiber
, Opt. Express
28
, (5), 5965-5981 (2020)
L. Loetgering, M. Baluktsian, K. Keskinbora, R. Horstmeyer, T. Wilhein, G. Schütz, K.S.E. Eikema and S. Witte,
Generation and characterization of focused helical x-ray beams
, Sci. Adv.
6
, (7), eaax8836: 1-6 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter