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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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A. Antoncecchi, H. Zhang, S. Edward, V. Verrina, P.C.M. Planken and S. Witte,
High-resolution microscopy through optically opaque media using ultrafast photoacoustics
, Opt. Express
28
, (23), 33937-33947 (2020)
V. Verrina, S. Edward, H. Zhang, A. Antoncecchi, S. Witte and P.C.M. Planken,
Role of scattering by surface roughness in the photoacoustic detection of hidden micro-structures
, Appl. Opt.
59
, (30), 9499-9509 (2020)
L. Wu, I. Bespalov, K. Witte, O.C.M. Lugier, J. Haitjema, M. Vockenhuber, Y. Ekinci, B. Watts, A.M. Brouwer and S. Castellanos Ortega,
Unravelling the effect of fluorinated ligands in hybrid EUV photoresists by X-ray spectroscopy
, J. Mater. Chem. C
8
, (42), 14757-14765 (2020)
H.J. Sielcken and H.J. Bakker,
Probing the ultrafast electron and lattice dynamics of gold using femtosecond mid-infrared pulses
, Phys. Rev. B
102
, (13), 134301: 1-8 (2020)
N. Thakur, R. Bliem, I. Mochi, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega,
Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
, J. Mater. Chem. C
8
, (41), 14499-14506 (2020)
J. Biemolt, D. van Noordenne, J.W. Liu, E. Antonetti, M. Leconte, S. van Vliet, R. Bliem, G. Rothenberg, X.-Z. Fu and N. Yan,
Assembling Palladium and Cuprous Oxide Nanoclusters into Single Quantum Dots for the Electrocatalytic Oxidation of Formaldehyde, Ethanol, and Glucose
, ACS Appl. Nano. Mater.
3
, (10), 10176-10182 (2020)
R. Röhrich, G. Oliveri, S. Kovaios, V.T. Tenner, A.J. den Boef, J.T.B. Overvelde and A.F. Koenderink,
Uncertainty estimation and design optimization of 2D diffraction-based overlay metrology targets
, ACS Photonics
7
, (10), 2765-2777 (2020)
Z. Bouza, J. Scheers, A.N. Ryabtsev, R. Schupp, L. Behnke, C. Shah, J. Sheil, M. Bayraktar, J.R. Crespo López-Urrutia, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of Sn5-Sn10+ions in an electron beam ion trap and laser-produced plasmas
, J. Phys. B: At. Mol. Opt. Phys.
53
, (19), 195001: 1-11 (2020)
V. Verrina, S. Edward, H. Zhang, S. Witte and P.C.M. Planken,
Photoacoustic detection of low duty cycle gratings through optically opaque layers
, Appl. Phys. Lett.
117
, (5), 051104: 1-6 (2020)
S. Patra, M. Germann, J.-Ph. Karr, M. Haidar, L. Hilico, V.I. Korobov, F. M. J. Cozijn, K.S.E. Eikema, W.M.G. Ubachs and J.C.J. Koelemeij,
Proton-electron mass ratio from laser spectroscopy of HD+ at the part-per-trillion level
, Science
369
, (6508), 1238-1241 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter