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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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J. Scheers, C. Shah, A.N. Ryabtsev, H. Bekker, F. Torretti, J. Sheil, D.A. Czapski, J.C. Berengut, W.M.G. Ubachs, J.R. Crespo López-Urrutia, R. Hoekstra and O.O. Versolato,
EUV spectroscopy of highly charged Sn13+−Sn15+ ions in an electron-beam ion trap
, Phys. Rev. A
101
, (6), 062511: 1-11 (2020)
O.O. Versolato, A. Bayerle, M. Bayraktar, L. Behnke, H. Bekker, Z. Bouza, J. Colgan, J.R. Crespo López-Urrutia, M.J. Deuzeman, R. Hoekstra, D. Kurilovich, B. Liu, R.A. Meijer, A.J. Neukirch, L. Poirier, S. Rai, A.N. Ryabtsev, J. Scheers, R. Schupp, J. Sheil, F. Torretti, W.M.G. Ubachs and S. Witte,
Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography
, J. Phys.: Conf. Ser.
1412
, (19), 192006:1-1 (2020)
J. Haitjema,
Exciting tin-oxo cages: light-induced chemistry for nanopatterning
, University of Amsterdam, 2020-06-03
R. Géneaux, C.J. Kaplan, L. Yue, A.D. Ross, E. Bækhøj, P.M. Kraus, H.-T. Chang, A. Guggenmos, M.-Y. Huang, M. Zürch, K.J. Schafer, D.M. Neumark, M.B. Gaarde and S.R. Leone,
Attosecond Time-Domain Measurement of Core-Level-Exciton Decay in Magnesium Oxide
, Phys. Rev. Lett.
124
, (20), 207401: 1-6 (2020)
S.D.C. Roscam Abbing, F. Campi, F.S. Sajjadian, N. Lin, P. Smorenburg and P.M. Kraus,
Divergence Control of High-Harmonic Generation
, Phys. Rev. Appl.
13
, (5), 054029: 1-9 (2020)
F. Torretti, J. Sheil, R. Schupp, M.M. Basko, M. Bayraktar, R.A. Meijer, S. Witte, W.M.G. Ubachs, R. Hoekstra, O.O. Versolato, A.J. Neukirch and J. Colgan,
Prominent radiative contributions from multiply-excited states in laser-produced tin plasma for nanolithography
, Nature Commun.
11
, (1), 2334: 1-8 (2020)
L.V. Amitonova and J.F. de Boer,
Endo-microscopy beyond the Abbe and Nyquist limits
, Light : Sci. Appl.
9
, (1), 81: 1-12 (2020)
S. Konijnenberg, A.C.C. de Beurs, G.S.M. Jansen, H.P. Urbach, S. Witte and W. Coene,
Phase retrieval algorithms for lensless imaging using diffractive shearing interferometry
, J. Opt. Soc. Am. A
37
, (6), 914-924 (2020)
C.D. Dieleman, Weiyi Ding, L. Wu, N. Thakur, I. Bespalov, B. Daiber, Y. Ekinci, S. Castellanos Ortega and B. Ehrler,
Universal Direct Pattering of Colloidal Quantum Dots by (Extreme) Ultraviolet and Electron Beam Lithography
, Nanoscale
12
, (20), 11306-11316 (2020)
A.L. Klein, D. Kurilovich, H. Lhuissier, O.O. Versolato, D. Lohse, E. Villermaux and H. Gelderblom,
Drop fragmentation by laser-pulse impact
, J. Fluid Mech.
893
, A7: 1-37 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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Events
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ARCNL Newsletter