Publications - ARCNL

T. de Faria Pinto, J. Mathijssen, R.A. Meijer, H. Zhang, A. Bayerle, D. Kurilovich, O.O. Versolato, K.S.E. Eikema and S. Witte, Cylindrically and non-cylindrically symmetric expansion dynamics of tin microdroplets after ultrashort laser pulse impact, Appl. Phys. A 127, (2), 93: 1-10 (2021)
J. Seifert, D. Bouchet, L. Loetgering and A.P. Mosk, Efficient and flexible approach to ptychography using an optimization framework based on automatic differentiation, OSA Continuum 4, (1), 121-121 (2021)
M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse, Spatiotemporal focusing through a multimode fiber via time-domain wavefront shaping, Opt. Express 29, (1), 272-290 (2021)
S.D.C. Roscam Abbing, Z.-Y. Zhang, R. Kolkowski, F. Campi, A.F. Koenderink and P.M. Kraus: Coherent diffractive extreme-ultraviolet generation from nanostructured silica In: Conference on Lasers and Electro-Optics, CLEO 2021, OPG, 2021.
H.C. Hendrikse, A. van der Weijden, M. Ronda‐Lloret, T. Yang, R. Bliem, R.N. Shiju, M. van Hecke, L. Li and W.L. Noorduin, Shape‐Preserving Chemical Conversion of Architected Nanocomposites, Adv. Mater. 32, (52), 2003999: 1-7 (2020)
R. Röhrich, Unconventional metrology: Merging nanophotonics with computational imaging, University of Amsterdam, 2020-12-11
N.J. Schilder, T. A. W. Wolterink, C. Mennes, R. Röhrich and A.F. Koenderink, Phase-retrieval Fourier microscopy of partially temporally coherent nanoantenna radiation patterns, Opt. Express 28, (25), 37844-37859 (2020)
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef, Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms, Opt. Express 28, (25), 37419-37435 (2020)
J.H. Buss, S. Starosielec, I. Grguras, T. Golz, M.J. Prandolini, M. Schulz, P.M. Kraus and R. Riedel: Few-cycle OPCPA at 2 µm with up to 100 W average power In: OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.3, OSA Technical Digest (Optical Society of America), 2020.
L. Wu, Metal oxo clusters: molecular design for extreme ultraviolet lithography, University of Amsterdam, 2020-11-18

Partners:

Visiting address

Science Park 106
1098 XG Amsterdam
The Netherlands

Delivery address

Science Park 102
1098 XG Amsterdam
The Netherlands

Mail address

PO Box 93019
1090 BA Amsterdam
The Netherlands

T. +31 20 8517100
E-mail: arcnlsecretariaat@arcnl.nl

© ARCNL 2025