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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
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EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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R. Röhrich,
Unconventional metrology: Merging nanophotonics with computational imaging
, University of Amsterdam, 2020-12-11
N.J. Schilder, T. A. W. Wolterink, C. Mennes, R. Röhrich and A.F. Koenderink,
Phase-retrieval Fourier microscopy of partially temporally coherent nanoantenna radiation patterns
, Opt. Express
28
, (25), 37844-37859 (2020)
C. Messinis, T.T.M. van Schaijk, N. Pandey, V.T. Tenner, S. Witte, J.F. de Boer and A.J. den Boef,
Diffraction-based overlay metrology using angular-multiplexed acquisition of dark-field digital holograms
, Opt. Express
28
, (25), 37419-37435 (2020)
J.H. Buss, S. Starosielec, I. Grguras, T. Golz, M.J. Prandolini, M. Schulz, P.M. Kraus and R. Riedel:
Few-cycle OPCPA at 2 µm with up to 100 W average power
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper HF1B.3, OSA Technical Digest (Optical Society of America), 2020.
L. Wu,
Metal oxo clusters: molecular design for extreme ultraviolet lithography
, University of Amsterdam, 2020-11-18
A. Schulte, J. Mathijssen, K.S.E. Eikema and S. Witte:
Towards High Harmonic Generation in Laser-Produced Plasma
In:
OSA High-brightness Sources and Light-driven Interactions Congress 2020 (EUVXRAY, HILAS, MICS), paper ETh3A.4, OSA Technical Digest (Optical Society of America), 2020.
J. Scheers,
Charge-state-resolved spectroscopy of multiply-charged tin ions
, VU University Amsterdam, 2020-11-10
S. Rai, K. Bijlsma, S. Koeleman, Tjepkema, A.W. Noordam, H.T. Jonkman, O.O. Versolato and R. Hoekstra,
Single-collision scattering of keV-energy Kr ions off a polycrystalline Cu surface
, Nucl. Instrum. Methods. Phys. Res., Sect B
482
, 58-63 (2020)
A. Antoncecchi, H. Zhang, S. Edward, V. Verrina, P.C.M. Planken and S. Witte,
High-resolution microscopy through optically opaque media using ultrafast photoacoustics
, Opt. Express
28
, (23), 33937-33947 (2020)
V. Verrina, S. Edward, H. Zhang, A. Antoncecchi, S. Witte and P.C.M. Planken,
Role of scattering by surface roughness in the photoacoustic detection of hidden micro-structures
, Appl. Opt.
59
, (30), 9499-9509 (2020)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter