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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • X.-Q. Zhou, M. Mytiliniou, J. Hilgendorf, Z. Ye, P. Panagiota, Y. Shao, M. Paradiz Dominguez, L. Zhang, M.B.S. Hesselberth, E. Bos, M.A. Siegler, F. Buda, A.M. Brouwer, A. Kros, R.I. Koning, D. Heinrich and S. Bonnet, Intracellular Dynamic Assembly of Deep‐Red Emitting Supramolecular Nanostructures Based on the Pt…Pt Metallophilic Interaction, Adv. Mater., 2008613: 1-13 (2021)

  • M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek, Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography, Phys. Chem. Chem. Phys. 23, (31), 16646-16657 (2021)

  • C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef: Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.

  • A.C.C. de Beurs, L. Loetgering, M. Herczog, K.S.E. Eikema and S. Witte: aPIE: Angle calibration algorithm for reflection ptychography In: OSA Imaging and Applied Optics Congress 2021 (3D, COSI, DH, ISA, pcAOP), paper CW6B.4, OSA Technical Digest (Optical Society of America), 2021.

  • A. Pelekanidis, L. Loetgering and S. Witte: Ptychography-based characterization of wavelength-tunable vortex beams In: Computational Optical Sensing and Imaging, COSI 2021 - Part of OSA Imaging and Applied Optics Congress 2021, paper CTu6A.1, OSA Technical Digest (Optical Society of America), 2021.

  • F. Campi, S.D.C. Roscam Abbing, Z.-Y. Zhang, M.L.S. van der Geest and P.M. Kraus: Efficient extreme-ultraviolet multi-band high-order wave mixing in silica In: Proc. SPIE 11886, International Conference on X-Ray Lasers 2020, SPIE-Intl Soc Optical Eng, 2021. - pp. 117-124

  • C. Sfiligoj, Towards stable nanolayers for EUV optics, University of Amsterdam, 2021-06-30

  • C.D. Dieleman, Patterning Colloidal Nanocrystals with Light and Electrons, University of Amsterdam, 2021-06-30

  • R. Schupp, L. Behnke, Z. Bouza, Z. Mazzotta, Y. Mostafa, A.C. Lassise, L. Poirier, J. Sheil, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Characterization of angularly resolved EUV emission from 2-µm-wavelength laser-driven Sn plasmas using preformed liquid disk targets, J. Phys. D: Appl. Phys. 54, (36), 365103: 1-12 (2021)

  • M.V. Verweg, B. Lochocki, J.F. de Boer and L.V. Amitonova: Speckle-Based Super-Resolution Imaging via a Multimode Fiber In: Optics InfoBase Conference Papers, Part of European Conferences on Biomedical Optics, ECBO 2021, paper ES1A.4, OSA Technical Digest (Optical Society of America), 2021.

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter