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EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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S. Edward, H. Zhang, I. Setija, V. Verrina, A. Antoncecchi, S. Witte and P.C.M. Planken,
Detection of hidden gratings through multilayer nanostructures using light and sound
, Phys. Rev. Appl.
14
, (1), 014015-1-16 (2020)
F. Holtrop, A.R. Jupp, N.P. van Leest, M. Paradiz Dominguez, R.M. Williams, A.M. Brouwer, B. de Bruin, A.W. Ehlers and J.C. Slootweg,
Photoinduced and Thermal Single‐Electron Transfer to Generate Radicals from Frustrated Lewis Pairs
, Chem. Eur. J.
26
, (41), 9005-9011 (2020)
O.C.M. Lugier, A. Troglia, N. Sadegh, L. van Kessel, R. Bliem, N. Mahne, S. Nannarone and S. Castellanos Ortega,
Extreme Ultraviolet Photoelectron Spectroscopy on Fluorinated Monolayers: towards Nanolithography on Monolayers
, J. Photopolym. Sci. Technol.
33
, (2), 229-234 (2020)
N. Sadegh, M.L.S. van der Geest, J. Haitjema, F. Campi, S. Castellanos Ortega, P.M. Kraus and A.M. Brouwer,
XUV Induced Bleaching of a Tin Oxo Cage Photoresist Studied by High Harmonic Absorption Spectroscopy
, J. Photopolymer. Sci.Tec.
33
, (2), 145-151 (2020)
N. Thakur, A. Giuliani, L. Nahon and S. Castellanos Ortega,
Photon-induced Fragmentation of Zinc-based Oxoclusters for EUV Lithography Applications
, J. Photopolym. Sci. Technol.
33
, (2), 153-158 (2020)
C. Messinis, T.T.M. van Schaijk, V.T. Tenner, J.F. de Boer, S. Witte and A.J. den Boef:
Parallel Acquisition of Multiple Images Using Coherence Gating in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Imaging and Applied Optics Congress, paper CF4C.6, OSA Technical Digest (Optical Society of America), 2020.
L. Helmbrecht, M. Tan, R. Röhrich, M.H. Bistervels, B.O. Kessels, A.F. Koenderink, B. Kahr and W.L. Noorduin,
Directed Emission from Self‐Assembled Microhelices
, Adv. Funct. Mater.
30
, (26), 1908218: 1-5 (2020)
H. Zhang, J.-P. Colombier and S. Witte,
Laser-induced periodic surface structures: Arbitrary angles of incidence and polarization states
, Phys. Rev. B
101
, (24), 245430: 1-15 (2020)
O.C.M. Lugier, U. Pokharel and S. Castellanos Ortega,
Impact of the synthetic conditions on the morphology and crystallinity of FDMOF-1(Cu) thin films.
, Cryst. Growth Des.
20
, (8), 5302-5309 (2020)
S. Edward,
Detection of hidden gratings using light and sound
, University of Amsterdam, 2020-06-18
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter