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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
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      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • B. Lochocki, K. Abrashitova, J.F. de Boer and L.V. Amitonova: Resolution limits of compressive imaging via a multimode fiber In: European Conferences on Biomedical Optics 2021 (ECBO), ESIA.5, OSA Technical Digest (Optical Society of America), 2021.

  • M.C. Velsink, L.V. Amitonova and P.W.H. Pinkse: Towards Multimode-fiber-based Two-photon Endoscopy In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • J. Mathijssen, K.S.E. Eikema and S. Witte: Towards High-Order Harmonic Generation in Laser Produced Plasmas In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef: Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy In: Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE-Intl Soc Optical Eng, 2021.

  • E. Sauzeau, Characterization of topography across the scales, Université de Limoges, 2021-06-14

  • M. Du, Computational Depth-resolved Imaging and Metrology, VU University Amsterdam, 2021-06-09

  • O.C.M. Lugier, Surface-Mounted Metal-Organic Frameworks for Extreme Ultraviolet Lithography, University of Amsterdam, 2021-06-03

  • K.J. Flanagan, M. Paradiz Dominguez, Z. Melissari, H.-G. Eckhardt, R.M. Williams, D. Gibbons, C. Prior, G.M. Locke, A. Meindl, A.A. Ryan and M.O. Senge, Structural effects of meso-halogenation on porphyrins, Beilstein J. Org. Chem 17, 1149-1170 (2021)

  • J. Kirschner, A.H.A. Gomes, R.R.T. Marinho, O. Björneholm, H. Ågren, V. Carravetta, N. Ottosson, A.N. de Brito and H.J. Bakker, The molecular structure of the surface of water–ethanol mixtures, Phys. Chem. Chem. Phys. 23, 11568-11578 (2021)

  • F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin, Tracing single asperity wear in relation to macroscale friction during running-in, Tribol.Int. 162, 107108: 1-9 (2021)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter