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    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • S.K. Cushing, M. Zürch, P.M. Kraus, L.M. Carneiro, A. Lee, H.-T. Chang, C.J. Kaplan and S.R. Leone, Hot phonon and carrier relaxation in Si(100) determined by transient extreme ultraviolet spectroscopy, Struct. Dyn. 5, (5), 054302: 1-21 (2018)

  • A. Stodolna, T. de Faria Pinto, F. Ali, A. Bayerle, D. Kurilovich, J. Mathijssen, R. Hoekstra, O.O. Versolato, K.S.E. Eikema and S. Witte, Controlling ion kinetic energy distributions in laser produced plasma sources by means of a picosecond pulse pair, J. Appl. Phys. 124, (5), 053303: 1-7 (2018)

  • G.C. Dong, Y. Zhang and J.W.M. Frenken, Formation of a monolayer h-BN nanomesh on Rh (111) studied using in-situ STM, Sci. China-Phys. Mech. Astron. 61, (7), 076811: 1-6 (2018)

  • S.A. Reijers, D. Kurilovich, F. Torretti, H. Gelderblom and O.O. Versolato, Laser-to-droplet alignment sensitivity relevant for laser-produced plasma sources of extreme ultraviolet light, J. Appl. Phys. 124, (1), 013102: 1-7 (2018)

  • P.M. Kraus, M. Zürch, S.K. Cushing, D.M. Neumark and S.R. Leone, The ultrafast X-ray spectroscopic revolution in chemical dynamics, Nat. Rev. Chem. 2, (6), 82-94 (2018)

  • J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, Photo-Induced Fragmentation of a Tin-Oxo Cage Compound, J. Photopolymer. Sci.Tec. 31, (2), 243-247 (2018)

  • Y. Zhang, J. Haitjema, M. Baljozovic, M. Vockenhuber, D. Kazazis, T. Jung, Y. Ekinci and A.M. Brouwer, Dual-tone Application of a Tin-Oxo Cage Photoresist Under E-beam and EUV Exposure, J. Photopolymer. Sci.Tec. 31, (2), 249-255 (2018)

  • G.S.M. Jansen, A.C.C. de Beurs, X. Liu, K.S.E. Eikema and S. Witte, Diffractive shear interferometry for extreme ultraviolet high-resolution lensless imaging, Opt. Express 26, (10), 12479-12489 (2018)

  • R. Fallica, J. Haitjema, L. Wu, S. Castellanos Ortega, A.M. Brouwer and Y. Ekinci, Absorption coefficient of metal-containing photoresists in the extreme ultraviolet, J. of Micro/Nanolithography. MEMS and MOEMS 17, (2), 023505: 1-7 (2018)

  • B. Weber, Y. Nagata, S. Ketzetzi, F. Tang, W.J. Smit, H.J. Bakker, E.H.G. Backus, D. Bonn and M. Bonn, Molecular Insight into the Slipperiness of Ice, J. Phys. Chem. Lett. 9, (11), 2838-2842 (2018)

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© ARCNL 2023

Logo Logo ARCNL
  • Mission
    • Mission and vision
      • Mission
      • About
  • Research
    • Source department
      • EUV Plasma Processes Oscar Versolato Wim Ubachs
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department
      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department
      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career
      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
      • How to apply
      • Coming from abroad
  • More
    • More
      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • Newsletter