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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • M. Aarts, S. van Vliet, R. Bliem and E. Alarcón-Lladó, Investigation of copper nanoscale electro-crystallization under directed and non-directed electrodeposition from dilute electrolytes, CrystEngComm 23, (20), 3648-3653 (2021)

  • J.S. van den Burgt, C.D. Dieleman, E. Johlin, J.J. Geuchies, A.J. Houtepen, B. Ehrler and E.C. Garnett, Integrating Sphere Fourier Microscopy of Highly Directional Emission, ACS Photonics 8, (4), 1143-1151 (2021)

  • V. Verrina, Laser-induced ultrasound for the detection of buried micro- and nano-structures, University of Amsterdam, 2021-04-06

  • R. Schupp, L. Behnke, J. Sheil, Z. Bouza, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato, Characterization of 1- and 2−μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light, Phys. Rev. Res. 3, (1), 013294: 1-9 (2021)

  • R. Röhrich, A.F. Koenderink, S. Witte and L. Loetgering, Spatial coherence control and analysis via micromirror-based mixed-state ptychography, New J. Phys. 23, 053016: 1-15 (2021)

  • R. Schupp, Spectral characterization of solid-state laser-driven plasma sources of EUV light, VU University Amsterdam, 2021-03-17

  • M. Du, L. Loetgering, K.S.E. Eikema and S. Witte, Ptychographic optical coherence tomography, Opt. Lett. 46, (6), 1337-1340 (2021)

  • M. Morbey, Numerical Simulations of Droplet Impact by a Laser Pulse, Eindhoven University of Technology, 2021-03-08

  • J.H. Buss, I. Grguras, S. Starosielec, M.V. Petev, T. Golz, M. Schulz, M.J. Prandolini, P.M. Kraus, F. Campi and R. Riedel: High-power OPCPAs at 1450–2400 nm wavelength In: Nonlinear Frequency Generation and Conversion: Materials and Devices, 116700 (5 March 2021), SPIE-Intl Soc Optical Eng, 2021.

  • R. Röhrich and A.F. Koenderink, Double moiré localized plasmon structured illumination microscopy, Nanophotonics 10, (3), 1107-1121 (2021)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter