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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • T.T.M. van Schaijk, C. Messinis, N. Pandey, V.T. Tenner, A. Koolen, S. Witte, J.F. de Boer and A.J. den Boef: Fast and robust diffraction based overlay metrology using dark-field digital holographic microscopy In: Optical Measurement Systems for Industrial Inspection XII, in Proceedings of SPIE, vol 11782, SPIE-Intl Soc Optical Eng, 2021.

  • E. Sauzeau, Characterization of topography across the scales, Université de Limoges, 2021-06-14

  • M. Du, Computational Depth-resolved Imaging and Metrology, VU University Amsterdam, 2021-06-09

  • O.C.M. Lugier, Surface-Mounted Metal-Organic Frameworks for Extreme Ultraviolet Lithography, University of Amsterdam, 2021-06-03

  • K.J. Flanagan, M. Paradiz Dominguez, Z. Melissari, H.-G. Eckhardt, R.M. Williams, D. Gibbons, C. Prior, G.M. Locke, A. Meindl, A.A. Ryan and M.O. Senge, Structural effects of meso-halogenation on porphyrins, Beilstein J. Org. Chem 17, 1149-1170 (2021)

  • J. Kirschner, A.H.A. Gomes, R.R.T. Marinho, O. Björneholm, H. Ågren, V. Carravetta, N. Ottosson, A.N. de Brito and H.J. Bakker, The molecular structure of the surface of water–ethanol mixtures, Phys. Chem. Chem. Phys. 23, 11568-11578 (2021)

  • F.-C. Hsia, F.M. Elam, D. Bonn, B. Weber and S.E. Franklin, Tracing single asperity wear in relation to macroscale friction during running-in, Tribol.Int. 162, 107108: 1-9 (2021)

  • Y. Zhang, J. Haitjema, S. Castellanos Ortega, O.C.M. Lugier, N. Sadegh, R. Ovsyannikov, E. Giangrisostomi, F.O.L. Johansson, E. Berggren, A. Lindblad and A.M. Brouwer, Extreme ultraviolet photoemission of a tin-based photoresist, Appl. Phys. Lett. 118, (17), 171903: 1-6 (2021)

  • F.M. Elam, F.-C. Hsia, S. van Vliet, R. Bliem, L. Yang, B. Weber and S.E. Franklin, The influence of corrosion on diamond-like carbon topography and friction at the nanoscale, Carbon 179, 590-599 (2021)

  • M. Aarts, S. van Vliet, R. Bliem and E. Alarcón-Lladó, Investigation of copper nanoscale electro-crystallization under directed and non-directed electrodeposition from dilute electrolytes, CrystEngComm 23, (20), 3648-3653 (2021)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact & Directions
      • ARCNL Newsletter