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  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • Z. Mazzotta, J. Mathijssen, K.S.E. Eikema, O.O. Versolato and S. Witte: TI-REX: A Tunable Infrared laser for Experiments in nanolithography In: , IEEE, 2021.

  • Z. Lyu, M.C. Velsink, P.W.H. Pinkse and L.V. Amitonova: Superiority of a Square-core Multimode Fiber for Imaging and Spectroscopy In: Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2021, pp. 1-1, IEEE, 2021.

  • R. Hahury, An Investigation of Repulsive Capillary Forces, De Haagse Hogeschool, 2021-09-29

  • G. de Haan, T.J. van den Hooven and P.C.M. Planken, Ultrafast laser-induced strain waves in thin ruthenium layers, Opt. Express 29, (20), 32051-32067 (2021)

  • J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, UV and VUV-induced fragmentation of tin-oxo cage ions, Phys. Chem. Chem. Phys. 23, (37), 20909-20918 (2021)

  • R. Géneaux, I. Timrov, C.J. Kaplan, A.D. Ross, P.M. Kraus and S.R. Leone, Coherent energy exchange between carriers and phonons in Peierls-distorted bismuth unveiled by broadband XUV pulses, Phys. Rev. Res. 3, (3), 033210: 1-12 (2021)

  • O.C.M. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers, ACS Appl. Mater. Interfaces 13, (36), 43777-43786 (2021)

  • V. Benning, Substrate Wear Accompanying Vibration Induced Friction Reduction by ƒartz Crystal Microbalances: Minimizing the friction between theory and experiment, , 2021-08-28

  • R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte, Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets, Phys. Rev. Appl. 16, (2), 024026: 1-11 (2021)

  • G. de Haan, V. Verrina, A.J.L. Adam, H. Zhang and P.C.M. Planken, Plasmonic enhancement of photo-acoustic inducedreflection changes, Appl. Opt. 60, (24), 7304-7313 (2021)

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
      • Support vacancies
    • Career
      • How to apply
      • Coming from abroad
      • Candidate portal
  • More
    • More

      • People
      • News
      • Events
      • Repository
      • Contact
      • ARCNL Newsletter