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    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
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  • G. de Haan, T.J. van den Hooven and P.C.M. Planken, Ultrafast laser-induced strain waves in thin ruthenium layers, Opt. Express 29, (20), 32051-32067 (2021)

  • J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer, UV and VUV-induced fragmentation of tin-oxo cage ions, Phys. Chem. Chem. Phys. 23, (37), 20909-20918 (2021)

  • R. Géneaux, I. Timrov, C.J. Kaplan, A.D. Ross, P.M. Kraus and S.R. Leone, Coherent energy exchange between carriers and phonons in Peierls-distorted bismuth unveiled by broadband XUV pulses, Phys. Rev. Res. 3, (3), 033210: 1-12 (2021)

  • O.C.M. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega, Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers, ACS Appl. Mater. Interfaces 13, (36), 43777-43786 (2021)

  • V. Benning, Substrate Wear Accompanying Vibration Induced Friction Reduction by ƒartz Crystal Microbalances: Minimizing the friction between theory and experiment, , 2021-08-28

  • R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte, Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets, Phys. Rev. Appl. 16, (2), 024026: 1-11 (2021)

  • G. de Haan, V. Verrina, A.J.L. Adam, H. Zhang and P.C.M. Planken, Plasmonic enhancement of photo-acoustic inducedreflection changes, Appl. Opt. 60, (24), 7304-7313 (2021)

  • X.-Q. Zhou, M. Mytiliniou, J. Hilgendorf, Z. Ye, P. Panagiota, Y. Shao, M. Paradiz Dominguez, L. Zhang, M.B.S. Hesselberth, E. Bos, M.A. Siegler, F. Buda, A.M. Brouwer, A. Kros, R.I. Koning, D. Heinrich and S. Bonnet, Intracellular Dynamic Assembly of Deep‐Red Emitting Supramolecular Nanostructures Based on the Pt…Pt Metallophilic Interaction, Adv. Mater., 2008613: 1-13 (2021)

  • M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek, Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography, Phys. Chem. Chem. Phys. 23, (31), 16646-16657 (2021)

  • C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef: Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology In: Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.

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© ARCNL 2025

Logo Logo ARCNL
  • Mission
  • Research
    • Source department

      • EUV Plasma Processes Oscar Versolato
      • Plasma Theory and Modeling John Sheil
      • Ion Interactions Ronnie Hoekstra
    • Metrology department

      • EUV Generation & Imaging Stefan Witte Kjeld Eikema
      • Light-Matter Interaction Paul Planken
      • Computational Imaging Arie den Boef
      • High-Harmonic Generation and EUV Science Peter Kraus
      • Nanoscale Imaging and Metrology Lyuba Amitonova
    • Materials department

      • Contact Dynamics Bart Weber
      • Materials & Surface Science for EUVL Roland Bliem
      • Materials Theory and Modeling Emilia Olsson
  • Career
    • Career

      • All vacancies
      • Postdoc vacancies
      • PhD vacancies
      • Scientific internships
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    • Career
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      • Coming from abroad
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  • More
    • More

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      • ARCNL Newsletter