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Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
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Paul Planken
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Arie den Boef
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Peter Kraus
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Lyuba Amitonova
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Contact Dynamics
Bart Weber
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Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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G. de Haan, T.J. van den Hooven and P.C.M. Planken,
Ultrafast laser-induced strain waves in thin ruthenium layers
, Opt. Express
29
, (20), 32051-32067 (2021)
J. Haitjema, L. Wu, A. Giuliani, L. Nahon, S. Castellanos Ortega and A.M. Brouwer,
UV and VUV-induced fragmentation of tin-oxo cage ions
, Phys. Chem. Chem. Phys.
23
, (37), 20909-20918 (2021)
R. Géneaux, I. Timrov, C.J. Kaplan, A.D. Ross, P.M. Kraus and S.R. Leone,
Coherent energy exchange between carriers and phonons in Peierls-distorted bismuth unveiled by broadband XUV pulses
, Phys. Rev. Res.
3
, (3), 033210: 1-12 (2021)
O.C.M. Lugier, N. Thakur, L. Wu, M. Vockenhuber, Y. Ekinci and S. Castellanos Ortega,
Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal–Organic Frameworks on Patterned Monolayers
, ACS Appl. Mater. Interfaces
13
, (36), 43777-43786 (2021)
V. Benning,
Substrate Wear Accompanying Vibration Induced Friction Reduction by ƒartz Crystal Microbalances: Minimizing the friction between theory and experiment
, , 2021-08-28
R.A. Meijer, R. Schupp, J. Sheil, M.M. Basko, K.S.E. Eikema, O.O. Versolato and S. Witte,
Spall-Velocity Reduction in Double-Pulse Impact on Tin Microdroplets
, Phys. Rev. Appl.
16
, (2), 024026: 1-11 (2021)
G. de Haan, V. Verrina, A.J.L. Adam, H. Zhang and P.C.M. Planken,
Plasmonic enhancement of photo-acoustic inducedreflection changes
, Appl. Opt.
60
, (24), 7304-7313 (2021)
X.-Q. Zhou, M. Mytiliniou, J. Hilgendorf, Z. Ye, P. Panagiota, Y. Shao, M. Paradiz Dominguez, L. Zhang, M.B.S. Hesselberth, E. Bos, M.A. Siegler, F. Buda, A.M. Brouwer, A. Kros, R.I. Koning, D. Heinrich and S. Bonnet,
Intracellular Dynamic Assembly of Deep‐Red Emitting Supramolecular Nanostructures Based on the Pt…Pt Metallophilic Interaction
, Adv. Mater., 2008613: 1-13 (2021)
M. Rohdenburg, N. Thakur, R. Cartaya, S. Castellanos Ortega and P. Swiderek,
Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography
, Phys. Chem. Chem. Phys.
23
, (31), 16646-16657 (2021)
C. Messinis, T.T.M. van Schaijk, N. Pandey, A. Koolen, J.F. de Boer, S. Witte and A.J. den Boef:
Lens Aberration Calibration and Correction with Plasmonic Nanoparticles in Off-Axis Dark-Field Digital Holographic Microscope for Semiconductor Metrology
In:
Computational Optical Sensing and Imaging 2021 (COSI), Part of OSA Imaging and Applied Optics Congress 2021, paper CF2E.7, OSA Technical Digest (Optical Society of America), 2021.
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
How to apply
Coming from abroad
Candidate portal
More
More
People
News
Events
Repository
Contact & Directions
ARCNL Newsletter