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EUV Plasma Processes
Oscar Versolato
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John Sheil
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Ronnie Hoekstra
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Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
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M. Aarts, S. van Vliet, R. Bliem and E. Alarcón-Lladó,
Investigation of copper nanoscale electro-crystallization under directed and non-directed electrodeposition from dilute electrolytes
, CrystEngComm
23
, (20), 3648-3653 (2021)
J.S. van den Burgt, C.D. Dieleman, E. Johlin, J.J. Geuchies, A.J. Houtepen, B. Ehrler and E.C. Garnett,
Integrating Sphere Fourier Microscopy of Highly Directional Emission
, ACS Photonics
8
, (4), 1143-1151 (2021)
V. Verrina,
Laser-induced ultrasound for the detection of buried micro- and nano-structures
, University of Amsterdam, 2021-04-06
R. Schupp, L. Behnke, J. Sheil, Z. Bouza, M. Bayraktar, W.M.G. Ubachs, R. Hoekstra and O.O. Versolato,
Characterization of 1- and 2−μm-wavelength laser-produced microdroplet-tin plasma for generating extreme-ultraviolet light
, Phys. Rev. Res.
3
, (1), 013294: 1-9 (2021)
R. Röhrich, A.F. Koenderink, S. Witte and L. Loetgering,
Spatial coherence control and analysis via micromirror-based mixed-state ptychography
, New J. Phys.
23
, 053016: 1-15 (2021)
R. Schupp,
Spectral characterization of solid-state laser-driven plasma sources of EUV light
, VU University Amsterdam, 2021-03-17
M. Du, L. Loetgering, K.S.E. Eikema and S. Witte,
Ptychographic optical coherence tomography
, Opt. Lett.
46
, (6), 1337-1340 (2021)
M. Morbey,
Numerical Simulations of Droplet Impact by a Laser Pulse
, Eindhoven University of Technology, 2021-03-08
J.H. Buss, I. Grguras, S. Starosielec, M.V. Petev, T. Golz, M. Schulz, M.J. Prandolini, P.M. Kraus, F. Campi and R. Riedel:
High-power OPCPAs at 1450–2400 nm wavelength
In:
Nonlinear Frequency Generation and Conversion: Materials and Devices, 116700 (5 March 2021), SPIE-Intl Soc Optical Eng, 2021.
R. Röhrich and A.F. Koenderink,
Double moiré localized plasmon structured illumination microscopy
, Nanophotonics
10
, (3), 1107-1121 (2021)
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Mission
Research
Source department
EUV Plasma Processes
Oscar Versolato
Plasma Theory and Modeling
John Sheil
Ion Interactions
Ronnie Hoekstra
Metrology department
EUV Generation & Imaging
Stefan Witte
Kjeld Eikema
Light-Matter Interaction
Paul Planken
Computational Imaging
Arie den Boef
High-Harmonic Generation and EUV Science
Peter Kraus
Nanoscale Imaging and Metrology
Lyuba Amitonova
Materials department
Contact Dynamics
Bart Weber
Materials & Surface Science for EUVL
Roland Bliem
Materials Theory and Modeling
Emilia Olsson
Career
Career
All vacancies
Postdoc vacancies
PhD vacancies
Scientific internships
Support vacancies
Career
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Coming from abroad
Candidate portal
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More
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Repository
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